Abstract: A system for managing a processing system and/or a processing system component is described. The system may include a wear-out module configured to provide a wear-out signal, the wear-out signal indicating a remaining amount of useful life of the component; a health module configured to provide a health signal, the health signal indicating an extent to which operational and environmental factors affect a failure rate of the component during a useful life of the component; and a mission module configured to provide a mission signal, the mission signal indicative of whether an operating condition is approaching a threshold that would adversely affect the system's ability to meet at least one performance objective.

Abstract: An approach for stabilizing the interactions between a plasma and the generator powering the plasma is provided. Reactive elements disposed between the power generator and plasma operate to modify the apparent impedance characteristics of the plasma such that the trajectory of the plasma load impedance as a function of power is substantially aligned locally with the contours of constant power output in impedance space. In this way, instabilities in the generator and plasma system are avoided because reinforcement or amplification of fluctuations in plasma impedance due to interactions between the generator and the plasma are reduced or eliminated. The reactive elements may be variable in order to align plasma trajectories and generator power contours under a range of process conditions.

Abstract: A probe to be inserted in-line in an AC plasma processing system allows accurate, real time determination of plasma parameters such as power and complex impedance over a broad dynamic range. Any need to know power output from a source is avoided and signals are selected to optimize accuracy such that only two alternating signals need be sensed for many applications. Signals are selected such that magnitudes of simple alternating signals can be easily measured as scalar values in a fashion that affords the use of these values to completely characterize the power actually delivered to the processing plasma and its complex impedance in real time. Plasma characterization can be limited to only specific frequencies for more accurate determination. Microstrip directional couplers are used to sense signals from the power transmission. These signals are then utilized to derive simple alternating signals representative of power or voltage.