Patents by Inventor Rani Narayan
Rani Narayan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140019931Abstract: Approaches are provided for fixing pin mismatches from swapping library cells in layout migration. Specifically, a method is provided that includes collecting information about a first technology pin from a library cell in a first technology. The method further includes swapping the library cell in the first technology with a library cell in a second technology. The method further includes collecting information about a second technology pin from the library cell in the second technology. The method further includes building a pin-mapping table that is configured to map the first technology pin to the second technology pin. The method further includes scaling a layout from the first technology to the second technology. The method further includes modifying the layout based on the pin-mapping table to match the at least one first technology pin to the at least one second technology pin while satisfying ground rules of the second technology.Type: ApplicationFiled: July 11, 2012Publication date: January 16, 2014Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Kevin W. MCCULLEN, Matthew T. GUZOWSKI, Rani NARAYAN, Xiaoping TANG, Xin YUAN
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Patent number: 8627247Abstract: Approaches are provided for fixing pin mismatches from swapping library cells in layout migration. Specifically, a method is provided that includes collecting information about a first technology pin from a library cell in a first technology. The method further includes swapping the library cell in the first technology with a library cell in a second technology. The method further includes collecting information about a second technology pin from the library cell in the second technology. The method further includes building a pin-mapping table that is configured to map the first technology pin to the second technology pin. The method further includes scaling a layout from the first technology to the second technology. The method further includes modifying the layout based on the pin-mapping table to match the at least one first technology pin to the at least one second technology pin while satisfying ground rules of the second technology.Type: GrantFiled: July 11, 2012Date of Patent: January 7, 2014Assignee: International Business Machines CorporationInventors: Kevin W. McCullen, Matthew T. Guzowski, Rani Narayan, Xiaoping Tang, Xin Yuan
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Patent number: 8464189Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.Type: GrantFiled: March 18, 2010Date of Patent: June 11, 2013Assignee: International Business Machines CorporationInventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
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Publication number: 20120233576Abstract: Method, system, computer, etc., embodiments receive an original integrated circuit design into a computerized device. The methods herein automatically replace at least some of the original cells within the original integrated circuit design with replacement cells using the computerized device. Each of the replacement cells has an initial cell size that is unassociated with any specific design size. The methods herein automatically change the original design size of the integrated circuit design to a changed design size, and automatically individually change the initial cell size of each of the replacement cells to different sizes. At least two different replacement cells are changed from the initial cell size by different size reduction amounts based on different amounts of space required within the changed design size for each of the replacement cells.Type: ApplicationFiled: March 9, 2011Publication date: September 13, 2012Applicant: International Business Machines CorporationInventors: Geoffrey R. Barrows, Derick G. Behrends, William J. Craig, Michael S. Gray, Matthew T. Guzowski, Kevin W. McCullen, Rani Narayan, Robert F. Walker
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Publication number: 20100185997Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.Type: ApplicationFiled: March 18, 2010Publication date: July 22, 2010Applicant: International Business Machines CorporationInventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
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Patent number: 7761821Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.Type: GrantFiled: August 13, 2007Date of Patent: July 20, 2010Assignee: International Business Machines CorporationInventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
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Patent number: 7610565Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.Type: GrantFiled: April 9, 2007Date of Patent: October 27, 2009Assignee: International Business Machines CorporationInventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
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Patent number: 7568173Abstract: Methods of independently migrating a hierarchical design are disclosed. A method for migrating a macro in an integrated circuit comprises: determining an interface strategy between a base cell in the macro and the macro, the base cell including an interface element involved in the interface strategy; migrating the base cell independently with respect to the macro based on the interface strategy; initially scaling the macro; swapping the migrated base cell into the macro; and legalizing content of the initially scaled macro.Type: GrantFiled: June 14, 2007Date of Patent: July 28, 2009Assignee: International Business Machines CorporationInventors: Veit Gernhoefer, Matthew T. Guzowski, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Stephen L. Runyon, Leon J. Sigal, Robert F. Walker, Pieter J. Woeltgens, Xiaoyun K. Wu, Xin Yuan
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Publication number: 20080313581Abstract: Methods of independently migrating a hierarchical design are disclosed. A method for migrating a macro in an integrated circuit comprises: determining an interface strategy between a base cell in the macro and the macro, the base cell including an interface element involved in the interface strategy; migrating the base cell independently with respect to the macro based on the interface strategy; initially scaling the macro; swapping the migrated base cell into the macro; and legalizing content of the initially scaled macro.Type: ApplicationFiled: June 14, 2007Publication date: December 18, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Veit Gernhoefer, Matthew T. Guzowski, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Stephen L. Runyon, Leon J. Sigal, Robert F. Walker, Pieter J. Woeltgens, Xiaoyun K. Wu, Xin Yuan
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Patent number: 7454721Abstract: A method, apparatus, and computer program product for optimizing the layout of an integrated circuit design. Base ground rules and recommended ground rules are prioritized according to the impact they have on the yield of the integrated circuit design. The layout is optimized according to the prioritized base ground rules and recommended ground rules.Type: GrantFiled: February 27, 2006Date of Patent: November 18, 2008Assignee: International Business Machines CorporationInventors: Jason D. Hibbeler, Rani Narayan, Robert F. Walker
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Publication number: 20070277129Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.Type: ApplicationFiled: August 13, 2007Publication date: November 29, 2007Inventors: Robert Allen, Cam Endicott, Fook-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Robert Walker, Xin Yuan
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Patent number: 7302651Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.Type: GrantFiled: October 29, 2004Date of Patent: November 27, 2007Assignee: International Business Machines CorporationInventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
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Publication number: 20070245283Abstract: A method comprises extracting a hierarchical grid constraint set and modeling one or more critical objects of at least one cell as a variable set. The method further comprises solving a linear programming problem based on the hierarchical grid constraint set with the variable set to provide initial locations of the critical objects of the at least one cell and determining target on-grid locations of the one or more critical objects in the at least one cell using the results of the linear programming solution.Type: ApplicationFiled: April 14, 2006Publication date: October 18, 2007Inventors: Robert Allen, Michael Gray, Fuok-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Robert Walker
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Publication number: 20070198961Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.Type: ApplicationFiled: April 9, 2007Publication date: August 23, 2007Applicant: International Business Machines CorporationInventors: Robert Allen, Cam Endicott, Fook-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Robert Walker, Xin Yuan
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Patent number: 7257783Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.Type: GrantFiled: December 9, 2004Date of Patent: August 14, 2007Assignee: International Business Machines CorporationInventors: Robert J. Allen, Cam V. Endicott, Fook-Luen Heng, Jason D. Hibbeler, Kevin W. McCullen, Rani Narayan, Robert F. Walker, Xin Yuan
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Publication number: 20060101356Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.Type: ApplicationFiled: October 29, 2004Publication date: May 11, 2006Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert Allen, Cam Endicott, Fook-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Robert Walker, Xin Yuan
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Publication number: 20060101357Abstract: A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. Also, a method, system and program product for migrating an integrated circuit design from a source technology without RDR to a target technology with RDR in which space may be reserved for late insertion of a feature and in which migration first occurs in a primary compaction direction having less tolerant ground rules.Type: ApplicationFiled: December 9, 2004Publication date: May 11, 2006Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert Allen, Cam Endicott, Fook-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Robert Walker, Xin Yuan
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Publication number: 20060085768Abstract: Methods, systems and program products are disclosed for selectively scaling an integrated circuit (IC) design: by layer, by unit, or by ground rule, or a combination of these. The selective scaling technique can be applied in a feedback loop with the manufacturing system with process and yield feedback, during the life of a design, to increase yield in early processes in such a way that hierarchy is preserved. The invention removes the need to involve designers in improving yield where new technologies such as maskless fabrication are implemented.Type: ApplicationFiled: October 15, 2004Publication date: April 20, 2006Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Fook-Luen Heng, Jason Hibbeler, Kevin McCullen, Rani Narayan, Stephen Runyon, Robert Walker
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Patent number: 6189132Abstract: A method of modifying a layout of a plurality of objects in accordance with a plurality of predetermined criteria is presented. An objective function is defined for measuring a location perturbation and a separation perturbation of the objects in the layout. A linear system is defined using linear constraints in terms of design rules and the objective function to describe separations between layout objects. The linear system is solved to simultaneously remove violations of the design rules, and shapes and positions of objects in the layout are modified in accordance with the solution of the linear system such that a total perturbation of the objects in the layout is reduced. A system for implementing the present invention is also presented.Type: GrantFiled: April 9, 1998Date of Patent: February 13, 2001Assignee: International Business Machines CorporationInventors: Fook-Luen Heng, Zhan Chen, Gustavo E. Tellez, John Cohn, Rani Narayan