Patents by Inventor Rard Willem De Leeuw

Rard Willem De Leeuw has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic processing cell, lithographic apparatus, track and device manufacturing method
    Patent number: 7679715
    Abstract: A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: March 16, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Geerte Kruijswijk, Rard Willem De Leeuw, Paul Frank Luehrmann, Wim Tjibbo Tel, Paul Jacques Van Wijnen, Kars Zeger Troost
  • Lithographic processing cell, lithographic apparatus, track and device manufacturing method
    Publication number: 20080266538
    Abstract: A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.
    Type: Application
    Filed: June 18, 2008
    Publication date: October 30, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Stefan Geerte Kruijswijk, Rard Willem De Leeuw, Paul Frank Luehrmann, Wim Tjibbo Tel, Paul Jacques Van Wijnen, Kars Zeger Troost
  • Lithographic processing cell, lithographic apparatus, track and device manufacturing method
    Patent number: 7403259
    Abstract: A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: July 22, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Geerte Kruijswijk, Rard Willem De Leeuw, Paul Frank Luehrmann, Wim Tjibbo Tel, Paul Jacques Van Wijnen, Kars Zeger Troost
  • Lithographic projection apparatus
    Patent number: 6348303
    Abstract: A lithographic apparatus of the scanning type in which reticle masking blades 7 are opened at the beginning of a scan. Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control means 10 for controlling a compensating decrease in the lamp intensity. The reticle masking blades 70 may be manufactured of, e.g., quartz and provided with a reflective rear coating, e.g. of aluminum, so that portions of the illumination beam intercepted by the reticle masking blades are totally internally reflected.
    Type: Grant
    Filed: April 12, 1999
    Date of Patent: February 19, 2002
    Assignee: ASM Lithography B.V.
    Inventors: Sijbe A. H. Van Der Lei, Rard Willem De Leeuw, Gerrit Maarten Bonnema, Wilhelmus Maria Corbeij