Patents by Inventor Ravi Bhardwaj

Ravi Bhardwaj has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230051982
    Abstract: Various methods and systems are provided for longitudinal presentation of patient information. In one example, a computing device comprises a display screen, the computing device being configured to display on the screen a timeline of patient medical information including a plurality of symbols representing the patient medical information, wherein a symbol of the plurality of symbols is selectable to launch a details panel and enable a report that references the displayed patient medical information to be seen within the timeline, and wherein the symbol is displayed while the details panel is in an un-launched state.
    Type: Application
    Filed: August 12, 2022
    Publication date: February 16, 2023
    Inventors: Sanand Sasidharan, Ravi Bhardwaj, Anuradha Kanamarlapudi, Raghu Prasad
  • Publication number: 20230048252
    Abstract: Various methods and systems are provided for display of recommended treatment based on a patient's medical history and standardized guidelines. In one example, a computing system includes a display screen configured to display a patient medical path listing one or more of treatment guidelines and patient medical history, and to display abbreviated representations of at least one of the treatment guidelines and the patient medical history that can be reached directly from the displayed patient medical path. The abbreviated representations each display a limited list of data that is selectable to launch the treatment guidelines and/or the patient medical history and enable the selected data to be seen.
    Type: Application
    Filed: August 11, 2022
    Publication date: February 16, 2023
    Inventors: Sanand Sasidharan, Ravi Bhardwaj, Anuradha Kanamarlapudi, Sundararaj Mani
  • Patent number: 7800367
    Abstract: A method for generating a susceptibility (or T2*) weighted magnetic resonance (MR) image includes defining a pulse sequence having a plurality of gradient echoes and acquiring MR data for each of the plurality of gradient echoes. A weighting function is applied to image data for each gradient echo such as MR data (e.g., k-space data) or magnitude images associated with each gradient echo. A susceptibility weighted image is generated by combining the image data for each gradient echo based on at least the application of the weighting function.
    Type: Grant
    Filed: April 2, 2008
    Date of Patent: September 21, 2010
    Assignee: General Electric Co.
    Inventors: Ravi Bhardwaj, Anthony T. Vu, Ramesh Venkatesan
  • Publication number: 20090251140
    Abstract: A method for generating a susceptibility (or T2*) weighted magnetic resonance (MR) image includes defining a pulse sequence having a plurality of gradient echoes and acquiring MR data for each of the plurality of gradient echoes. A weighting function is applied to image data for each gradient echo such as MR data (e.g., k-space data) or magnitude images associated with each gradient echo. A susceptibility weighted image is generated by combining the image data for each gradient echo based on at least the application of the weighting function.
    Type: Application
    Filed: April 2, 2008
    Publication date: October 8, 2009
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Ravi Bhardwaj, Anthony T. Vu, Ramesh Venkatesan
  • Patent number: 7438824
    Abstract: To make high quality long-range periodic nanostructures in a transparent or semi-transparent substrate, the transparent or semi-transparent substrate is scanned with a linearly polarized laser beam generated by a femtosecond laser and exceeding a predetermined energy/pulse threshold along a scanning path. Sub-diffraction limit structures are formed as periodic planes of modified material in the transparent or semi-transparent substrate extending along the scanning path. The modified material can then be chemically etched to form cavities.
    Type: Grant
    Filed: March 24, 2006
    Date of Patent: October 21, 2008
    Assignee: National Research Council of Canada
    Inventors: Rod Taylor, Paul Corkum, Ravi Bhardwaj Vedula, Eli Simova, David Rayner, Cyril Hnatovsky
  • Patent number: 7033519
    Abstract: A sub-micron structure is fabricated in a transparent dielectric material by focusing femtosecond laser pulses into the dielectric to create a highly tapered modified zone with modified etch properties. The dielectric material is then selectively etched into the modified zone from the direction of the narrow end of the tapered zone so that as the selective etching proceeds longitudinally into the modified zone, the progressively increasing width of the modified zone compensates for lateral etching occurring closer to the narrow end so as to produce steep-walled holes. The unetched portion of the modified zone produced by translating the laser beam close to and parallel to the bottom surface of the dielectric can serve as an optical waveguide to collect light from or deliver light to the etched channel which can contain various biological, optical, or chemical materials for sensing applications.
    Type: Grant
    Filed: May 8, 2003
    Date of Patent: April 25, 2006
    Assignee: National Research Council of Canada
    Inventors: Rod Taylor, Cyril Hnatovsky, Paul Corkum, David Rayner, Ravi Bhardwaj
  • Publication number: 20040258359
    Abstract: A method of making connections between arrays of optical components such as waveguides, fibers and diode lasers, by linking them with optical waveguides written directly in three-dimensional blocks or wafers of a transparent dielectric material such as glass. If arrays are to be connected, any element can be connected to any other element, providing the flexibility to make cross-connects. In a particular embodiment, femtosecond laser dielectric modification is employed to manufacture the optical connector.
    Type: Application
    Filed: April 19, 2004
    Publication date: December 23, 2004
    Inventors: Paul B. Corkum, David M. Rayner, V. Ravi Bhardwaj, Orson L. Bourne, Rod Taylor, Cyril Hnatovsky
  • Publication number: 20030235385
    Abstract: A sub-micron structure is fabricated in a transparent dielectric material by focusing femtosecond laser pulses into the dielectric to create a highly tapered modified zone with modified etch properties. The dielectric material is then selectively etched into the modified zone from the direction of the narrow end of the tapered zone so that as the selective etching proceeds longitudinally into the modified zone, the progressively increasing width of the modified zone compensates for lateral etching occurring closer to the narrow end so as to produce steep-walled holes. The unetched portion of the modified zone produced by translating the laser beam close to and parallel to the bottom surface of the dielectric can serve as an optical waveguide to collect light from or deliver light to the etched channel which can contain various biological, optical, or chemical materials for sensing applications.
    Type: Application
    Filed: May 8, 2003
    Publication date: December 25, 2003
    Inventors: Rod Taylor, Cyril Hnatovsky, Paul Corkum, David Rayner, Ravi Bhardwaj