Patents by Inventor Raymond Ellis
Raymond Ellis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240066433Abstract: The present disclosure relates to multistep chromatographic methods for preparing extracellular vesicles (EVs). The methods were demonstrated to be effective in preparing high-quality EVs in a large scale. The methods enable preparation of EVs for therapeutic and diagnostic applications, and isolation and/or sub-fractionation of EVs with desired properties for specific use.Type: ApplicationFiled: September 27, 2023Publication date: February 29, 2024Applicant: LONZA SALES AGInventors: Aaron NOYES, Michael DOHERTY, Kimberly ELLIS, Raymond BOURDEAU, Kayla DESANTY
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Patent number: 10910874Abstract: A mobile power supply unit includes a base and a housing including at least one housing member secured to the base and movable relative to the base. The mobile power supply unit further includes a generator disposed within the housing, and a battery disposed within the housing. The mobile power supply unit further includes an inverter electrically connected to the generator and the battery, and an electronics enclosure including an electrical port, and a transfer switch electrically connected to the inverter and adapted to provide power through the electrical port. The mobile power supply unit further includes a portable transfer switch having a first electrical cable selectively electrically connectable to the electrical port and a second electrical cable selectively electrically connectable with a power receptacle of a building.Type: GrantFiled: December 21, 2018Date of Patent: February 2, 2021Assignee: Worldwide Energy LLCInventor: Raymond Ellis
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Patent number: 10468290Abstract: The wafer chuck apparatus has a chuck body that includes an interior and a top surface. A plurality of micro-channel regions is formed in the top surface. Each micro-channel region is defined by an array of micro-channel sections that are in pneumatic communication with each other. The micro-channel regions are pneumatically isolated from each other. One or more vacuum manifold regions are defined in the interior of the chuck body and are in pneumatic communication with corresponding micro-channel regions through respective vacuum holes. The configuration of the micro-channel regions makes the wafer chuck apparatus particularly useful in chucking wafers that have a substantial amount of warp.Type: GrantFiled: October 11, 2017Date of Patent: November 5, 2019Assignee: Ultratech, Inc.Inventors: Raymond Ellis, A. J. Crespin
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Publication number: 20190207416Abstract: A mobile power supply unit includes a base and a housing including at least one housing member secured to the base and movable relative to the base. The mobile power supply unit further includes a generator disposed within the housing, and a battery disposed within the housing. The mobile power supply unit further includes an inverter electrically connected to the generator and the battery, and an electronics enclosure including an electrical port, and a transfer switch electrically connected to the inverter and adapted to provide power through the electrical port. The mobile power supply unit further includes a portable transfer switch having a first electrical cable selectively electrically connectable to the electrical port and a second electrical cable selectively electrically connectable with a power receptacle of a building.Type: ApplicationFiled: December 21, 2018Publication date: July 4, 2019Applicant: Worldwide Energy LLCInventor: Raymond ELLIS
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Patent number: 10269662Abstract: A method of processing a reconstituted wafer that supports IC chips includes operably disposing the reconstituted wafer in a lithography tool that has a depth of focus and a focus plane and that defines exposure fields on the reconstituted wafer, wherein each exposure field includes at least one of the IC chips. The method also includes scanning the reconstituted wafer with a line scanner to measure a surface topography of the reconstituted wafer as defined by the IC chips. The method also includes, for each exposure field: i) adjusting a position and/or an orientation of the reconstituted wafer so that a photoresist layers of the IC chips within the given exposure field fall within the depth of focus; and ii) performing an exposure with the lithography tool to pattern the photoresist layers of the IC chips in the given exposure field.Type: GrantFiled: December 7, 2017Date of Patent: April 23, 2019Assignee: Ultratech, Inc.Inventors: Paul M. Bischoff, Emily M. True, Raymond Ellis, A. J. Crespin
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Publication number: 20180166314Abstract: A wafer chuck apparatus includes a chuck with a body and a vacuum line system formed within the body. The wafer chuck apparatus has sealing devices each operably disposed in respective recesses formed in the body at an upper surface of the chuck. Each sealing device is contractible between an expanded operating position and a contracted operating position. The top end of each sealing device is configured to form a vacuum seal with a corresponding portion of a backside of a wafer. The sealing devices extend above the upper surface of the chuck higher than typical seals and guide the wafer down to the upper surface of the chuck where it can be engaged by vacuum features that chuck the wafer to the upper surface of the chuck. The sealing devices are particularly useful for chucking warped wafers.Type: ApplicationFiled: December 7, 2017Publication date: June 14, 2018Inventors: Raymond Ellis, A.J. Crespin, Konrad Heinle, Charles Hu
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Publication number: 20180166348Abstract: A method of processing a reconstituted wafer that supports IC chips includes operably disposing the reconstituted wafer in a lithography tool that has a depth of focus and a focus plane and that defines exposure fields on the reconstituted wafer, wherein each exposure field includes at least one of the IC chips. The method also includes scanning the reconstituted wafer with a line scanner to measure a surface topography of the reconstituted wafer as defined by the IC chips. The method also includes, for each exposure field: i) adjusting a position and/or an orientation of the reconstituted wafer so that a photoresist layers of the IC chips within the given exposure field fall within the depth of focus; and ii) performing an exposure with the lithography tool to pattern the photoresist layers of the IC chips in the given exposure field.Type: ApplicationFiled: December 7, 2017Publication date: June 14, 2018Inventors: Paul M. Bischoff, Emily M. True, Raymond Ellis, A.J. Crespin
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Publication number: 20180122681Abstract: The wafer chuck apparatus has a chuck body that includes an interior and a top surface. A plurality of micro-channel regions is formed in the top surface. Each micro-channel region is defined by an array of micro-channel sections that are in pneumatic communication with each other. The micro-channel regions are pneumatically isolated from each other. One or more vacuum manifold regions are defined in the chuck body interior and are in pneumatic communication with corresponding micro-channel regions through respective vacuum holes. The configuration of the micro-channel regions makes the wafer chuck apparatus particularly useful in chucking wafers that have a substantial amount of warp.Type: ApplicationFiled: October 11, 2017Publication date: May 3, 2018Inventors: Raymond Ellis, A.J. Crespin
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Patent number: 9436103Abstract: A Wynne-Dyson projection lens for use in an ultraviolet optical lithography system is disclosed, wherein the projection lens is configured to have reduced susceptibility to damage from ultraviolet radiation. The projection lens utilizes lens elements that are made of optical glasses that are resistant to damage from ultraviolet radiation, but that also provide sufficient degrees of freedom to correct aberrations. The glass types used for the lens elements are selected from the group of optical glasses consisting of: fused silica, S-FPL51Y, S-FSL5Y, BSM51Y and BAL15Y.Type: GrantFiled: May 19, 2014Date of Patent: September 6, 2016Assignee: Ultratech, Inc.Inventors: Peiqian Zhao, Emily M. True, Raymond Ellis, Andrew M. Hawryluk
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Publication number: 20150331326Abstract: A Wynne-Dyson projection lens for use in an ultraviolet optical lithography system is disclosed, wherein the projection lens is configured to have reduced susceptibility to damage from ultraviolet radiation. The projection lens utilizes lens elements that are made of optical glasses that are resistant to damage from ultraviolet radiation, but that also provide sufficient degrees of freedom to correct aberrations. The glass types used for the lens elements are selected from the group of optical glasses consisting of: fused silica, S-FPL51Y, S-FSL5Y, BSM51Y and BAL15Y.Type: ApplicationFiled: May 19, 2014Publication date: November 19, 2015Applicant: Ultratech, Inc.Inventors: Peiqian Zhao, Emily M. True, Raymond Ellis, Andrew M. Hawryluk
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Patent number: 9029809Abstract: A movable microchamber system with a gas curtain is disclosed. The microchamber system has a top member with a light-access feature and a stage assembly that supports a substrate to be processed. The stage assembly is disposed relative to the top member to define a microchamber and a peripheral microchamber gap. An inert gas is flowed into the peripheral microchamber gap to form the gas curtain just outside of the microchamber. The gas curtain substantially prevents reactive gas in the ambient environment from entering the microchamber when the stage assembly moves relative to the top member.Type: GrantFiled: November 30, 2012Date of Patent: May 12, 2015Assignee: Ultratech, Inc.Inventors: Digby Pun, Ali Shajii, Andrew B. Cowe, Raymond Ellis, James T. McWhirter
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Patent number: 8898306Abstract: A method for dynamically provisioning a machine with applications to assist with work is a cloud computing environment is described. In one embodiment, such a method includes identifying a machine available for provisioning with at least one application. The method identifies work associated with a cloud computing environment. Responsive to identifying the work, the method determines how the machine can most optimally assist with the work. The method then dynamically provisions the machine with at least one application selected to enable the machine to most optimally assist with the work. A corresponding apparatus and computer program product are also disclosed.Type: GrantFiled: March 28, 2012Date of Patent: November 25, 2014Assignee: International Business Machines CorporationInventors: Richard Raymond Ellis, Matthew William Leming, Timothy James Ward
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Publication number: 20140151344Abstract: A movable microchamber system with a gas curtain is disclosed. The microchamber system has a top member with a light-access feature and a stage assembly that supports a substrate to be processed. The stage assembly is disposed relative to the top member to define a microchamber and a peripheral microchamber gap. An inert gas is flowed into the peripheral microchamber gap to form the gas curtain just outside of the microchamber. The gas curtain substantially prevents reactive gas in the ambient environment from entering the microchamber when the stage assembly moves relative to the top member.Type: ApplicationFiled: November 30, 2012Publication date: June 5, 2014Applicant: Ultratech, Inc.Inventors: Digby PUN, Ali SHAJII, Andrew B. COWE, Raymond ELLIS, James T. McWHIRTER
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Publication number: 20080034376Abstract: A system, computer program product and method for automated tool management in a multi-protocol environment. A user may issue a message in accordance with an object-oriented interapplication communication protocol to a corresponding application interface unit. The message may be a request to perform a particular action on a selected tool. The content of the message may be extracted by the corresponding application interface unit which may comprise data required by the requested action and a pointer to the object representing the tool. The application interface unit may invoke a method of the object pointed to by the pointers in the message. A value may then be procured by an equipment model where the value may be associated with particular information requested in the message about a tool or a notification informing the user that an event occurred. The equipment model may transfer the value to the appropriate user.Type: ApplicationFiled: October 11, 2007Publication date: February 7, 2008Applicant: ASYST TECHNOLOGIES, INC.Inventors: Raymond Ellis, Mark Pendleton, Charles Baylis
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Publication number: 20060277289Abstract: A method and apparatus are disclosed for improving the implementation of automated job management for equipment in a factory. A multi-protocol multi-client equipment server is provided for communicating with equipment and clients utilizing multiple protocols. The equipment server incorporates an object model of each tool and communicates directly in real- time with factory equipment. By providing a multi-protocol multi-client platform, data consumer clients are effectively decoupled from job management clients, allowing next generation station controllers for monitoring and controlling equipment processing to be easily implemented.Type: ApplicationFiled: January 26, 2006Publication date: December 7, 2006Inventors: Charles Bayliss, Raymond Ellis, Toni Guckert, Timothy Yoas
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Patent number: 5888818Abstract: The invention provides a modified tubulin comprising a tubulin polypeptide which confers resistance to an anti-tubulin agent when expressed within a biological organism, said polypeptide having at least one amino acid substitution such that hydrophobicity is increased at one or more positions in the polypeptide. DNA sequences encoding such modified tubulins may be used to confer resistance on organisms which otherwise would be susceptible to one or more anti-tubulin agents. For example, a plant which is resistant to a herbicide that disrupts microtubule structure or function may be produced.Type: GrantFiled: November 25, 1994Date of Patent: March 30, 1999Assignee: Zeneca LimitedInventors: Kathryn Elizabeth Cronin, John Raymond Ellis, deceased, Patrick Joseph Hussey, John Anthony Ray, Teresa Ruth Waldin
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Patent number: 4140937Abstract: In an electroluminescent device comprising a layer of electroluminescent material disposed between a pair of electrodes, and a transparent substrate, the electrode between the substrate and the layer of electroluminescent material is transparent and has a surface portion remote from the substrate having properties substantially confining current flow therethrough to discrete regions thereof. In one form the transparent electrode has a first layer adjacent the substrate of electrically-conductive material and a second layer of semiconducting or insulating material. In another form of the transparent electrode this electrode is of a metal oxide and the discrete regions are in a substantially pure form of that metal.Type: GrantFiled: July 22, 1976Date of Patent: February 20, 1979Inventors: Aron Vecht, Raymond Ellis
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Patent number: 3930403Abstract: A transfer compressor for transmitting pressure from one fluid to another comprising a cylinder, a piston slidable within the cylinder, a space within the cylinder at each end of the piston, means for admitting fluid to each of the spaces, a tell-tale rod mounted on one end of the piston passing slidably and sealingly through an end of the cylinder, one end of the piston presenting a different area presented by the other end of the piston to the fluid in contact with said other end whereby the pressure exerted on the fluid at one end of the piston may be different from the pressure existing in the fluid at the other end of the piston.Type: GrantFiled: July 23, 1974Date of Patent: January 6, 1976Assignee: Imperial Chemical Industries LimitedInventors: William Telford Cross, Stephen Alexander Gaydon, Andrew Gilchrist, Ernest Raymond Ellis