Abstract: This invention pertains to slurries, methods and systems that can be used in chemical mechanical planarization (CMP) of tungsten containing semiconductor device. Using the CMP slurries with additives to counter lowering of pH by tungsten polishing byproducts and maintain pH 4 or higher, the erosion of dense metal (such as tungsten) structures can be greatly diminished.

Abstract: Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.

Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent performance using soft polishing pad.

Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent performance using soft polishing pad.

Abstract: This invention pertains to slurries, methods and systems that can be used in chemical mechanical planarization (CMP) of tungsten containing semiconductor device. Using the CMP slurries with additives to counter lowering of pH by tungsten polishing byproducts and maintain pH 4 or higher, the erosion of dense metal (such as tungsten) structures can be greatly diminished.

Abstract: Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.

Abstract: Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.

Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent performance using soft polishing pad.

Abstract: Composite particles with lower mean particle size and smaller size distribution are obtained through refining treatments. The refined composite particles, such as ceria coated silica particles are used in Chemical Mechanical Planarization (CMP) compositions to offer higher removal rate; very low within wafer (WWNU) for removal rate, low dishing and low defects for polishing oxide films.

Abstract: This invention is an apparatus and a method for continuously generating a hydride gas of M1 which is substantially free of oxygen in a divided electrochemical cell. An impermeable partition or a combination of an impermeable partition and a porous diaphragm can be used to divide the electrochemical cell. The divided electrochemical cell has an anode chamber and a cathode chamber, wherein the cathode chamber has a cathode comprising M1, the anode chamber has an anode comprising M2 and is capable of generating oxygen, an aqueous electrolyte solution comprising a hydroxide M3OH partially filling the divided electrochemical cell. Hydride gas generated in the cathode chamber and oxygen generated in the anode chamber are removed through independent outlets. M1 can be selenium, phosphorous, silicon, metal or metal alloy, M2 is metal or metal alloy suitable for anionic oxygen generation, and M3 is NH4 or an alkali or alkaline earth metal.

Abstract: An electrolytic cell which is partitioned into one or more anode chambers and cathode chambers by one or more partition walls between each anode chamber and cathode chamber, wherein each anode chamber comprises one or more anodes comprising an inner surface and an outer surface, and each cathode chamber comprises one or more cathodes, wherein the anode chamber and the cathode chamber are configured such that any one of the one or more cathodes is adjacent to the outer surface of the one or more anodes and there is no cathode adjacent to the inner surface of the one or more anodes; a molten salt electrolyte surrounding the one or more anodes and the one or more cathodes; at least one anode gas outlet for withdrawing gas from the anode chamber; and at least one cathode gas outlet for withdrawing gas from the cathode chamber.

Abstract: Chemical Mechanical Planarization (CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Planarization (CMP) polishing compositions have shown excellent performance using soft polishing pad.

Abstract: This invention is an apparatus and a method for continuously generating a hydride gas of M1 which is substantially free of oxygen in a divided electrochemical cell. An impermeable partition or a combination of an impermeable partition and a porous diaphragm can be used to divide the electrochemical cell. The divided electrochemical cell has an anode chamber and a cathode chamber, wherein the cathode chamber has a cathode comprising M1, the anode chamber has an anode comprising M2 and is capable of generating oxygen, an aqueous electrolyte solution comprising a hydroxide M3OH partially filling the divided electrochemical cell. Hydride gas generated in the cathode chamber and oxygen generated in the anode chamber are removed through independent outlets. M1 can be selenium, phosphorous, silicon, metal or metal alloy, M2 is metal or metal alloy suitable for anionic oxygen generation, and M3 is NH4 or an alkali or alkaline earth metal.

Abstract: An electrolytic cell which is partitioned into one or more anode chambers and cathode chambers by one or more partition walls between each anode chamber and cathode chamber, wherein each anode chamber comprises one or more anodes comprising an inner surface and an outer surface, and each cathode chamber comprises one or more cathodes, wherein the anode chamber and the cathode chamber are configured such that any one of the one or more cathodes is adjacent to the outer surface of the one or more anodes and there is no cathode adjacent to the inner surface of the one or more anodes; a molten salt electrolyte surrounding the one or more anodes and the one or more cathodes; at least one anode gas outlet for withdrawing gas from the anode chamber; and at least one cathode gas outlet for withdrawing gas from the cathode chamber.

Abstract: An electrolytic cell and system used for making nitrogen trifluoride consisting of a computer and an electrolytic cell having a body, an electrolyte, at least one anode chamber that produces an anode product gas, at least one cathode chamber, and one or more fluorine adjustment means to maintain fluorine or hydrogen in the anode product gas within a target amount by adjusting the concentration of fluorine in said anode product gas, and the process that controls the system.

Abstract: A process and an anode for the production of nitrogen trifluoride or fluorine where the anode in the electrolytic cell is made primarily from mesocarbon microbeads. The mesocarbon microbead anodes minimize the production of CF4 and improve the purity of the nitrogen trifluoride or fluorine gas produced. Additionally, the anodes may be molded, instead of extruded or machined, providing for improved dimensional and mechanical integrity of the anode.

Abstract: A process and an anode for the production of nitrogen trifluoride or fluorine where the anode in the electrolytic cell is made primarily from parallel ordered anisotropic carbon, including needle coke and/or mesocarbon microbeads. The parallel ordered anisotropic carbon anodes minimize the production of CF4 and improve the purity of the nitrogen trifluoride or fluorine gas produced. Additionally, the anodes may be molded, instead of extruded or machined, providing for improved dimensional and mechanical integrity of the anode.

Abstract: A method for generating hydride gas of metal M1 in electrochemical cell comprising cathode comprising metal M1, sacrificial anode comprising metal M2, an initial concentration of aqueous electrolyte solution comprising metal hydroxide M3OH, wherein the sacrificial metal anode electrochemically oxidizes in the presence of the aqueous electrolyte solution to form metal salt, and hydride gas of metal M1 is formed by reducing the metal M1 of the cathode. The method also comprises steps of determining solubility profile curves of metal salt as M3OH is consumed and metal oxide is formed by oxidation reaction at various concentrations of M3OH; determining the maximum concentration of M3OH that does not yield a concentration of metal salt that precipitates out of the electrolyte solution; and choosing a concentration of M3OH that is in the range of at and within 5% less than the maximum concentration of M3OH to be the initial concentration of M3OH.

Abstract: The invention relates to the electrolysis of aqueous electrolyte solutions containing GeO2; hydroxide and water with metal alloy electrodes, such as, copper or tin rich alloy electrodes with alloying elements such as Sn, Pb, Zn, Cu etc, to generate Germane (GeH4). Cu-rich alloy electrodes have been demonstrated to increase the GeH4 current efficiency by almost 20% compared to Cu metal electrodes. Germanium deposition has been found to be either absent or minimal by using Cu-rich alloy electrodes. Several different methods for maintaining the cell performance or restoring the cell performance after a reduction in current efficiency over time, have been identified. A titration-based method for the analysis of the electrolyte, to obtain the concentration of GeO2 and the concentration of hydroxide has also been disclosed.

Abstract: A method for generating hydride gas of metal M1 in electrochemical cell comprising cathode comprising metal M1, sacrificial anode comprising metal M2, an initial concentration of aqueous electrolyte solution comprising metal hydroxide M3OH, wherein the sacrificial metal anode electrochemically oxidizes in the presence of the aqueous electrolyte solution to form metal salt, and hydride gas of metal M1 is formed by reducing the metal M1 of the cathode. The method also comprises steps of determining solubility profile curves of metal salt as M3OH is consumed and metal oxide is formed by oxidation reaction at various concentrations of M3OH; determining the maximum concentration of M3OH that does not yield a concentration of metal salt that precipitates out of the electrolyte solution; and choosing a concentration of M3OH that is in the range of at and within 5% less than the maximum concentration of M3OH to be the initial concentration of M3OH.