Patents by Inventor Remco Yuri Van De Moesdijk
Remco Yuri Van De Moesdijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11320751Abstract: An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.Type: GrantFiled: January 18, 2019Date of Patent: May 3, 2022Assignee: ASML Netherlands B.V.Inventors: Güneş Nakibo{hacek over (g)}lu, Dries Vaast Paul Hemschoote, Remco Yuri Van de Moesdijk
-
Patent number: 11009800Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.Type: GrantFiled: January 26, 2017Date of Patent: May 18, 2021Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Güneş Nakiboğlu, Rita Marguerite Albin Lambertine Petit, Hermen Folken Pen, Remco Yuri Van De Moesdijk, Frank Johannes Jacobus Van Boxtel, Borgert Kruizinga
-
Publication number: 20210041794Abstract: An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.Type: ApplicationFiled: January 18, 2019Publication date: February 11, 2021Applicant: ASML Netherlands B.V.Inventors: Güne NAKIBOGLU, Dries Vaast Paul HEMSCHOOTE, Remco Yuri VAN DE MOESDIJK
-
Publication number: 20200379360Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.Type: ApplicationFiled: January 26, 2017Publication date: December 3, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Han-Kwang Nienhuys, Gunes Nakiboglu, Rita Marguerite Albin Lambertine Petit, Hermen Folken Pen, Remco Yuri Van de Moesdijk, Frank Johannes Jacobus Van Boxtel, Borgert Kruizinga
-
Patent number: 9249965Abstract: There is provided a lighting device 100 comprising a light source, a driver arranged for powering the light source, which is separated in space from the light source. The lighting device has two separate heat sinks, a light source heat sink 112 to which the light source is thermally coupled, and a driver heat sink 115 to which the driver is thermally coupled. The light source heat sink and the driver heat sink are separated by an air gap 114 to provide thermal decoupling of the light source heat sink and the driver heat sink.Type: GrantFiled: January 11, 2012Date of Patent: February 2, 2016Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Berend Jan Willem Ter Weeme, Remco Yuri Van De Moesdijk, Marcus Joannes Van Den Bosch, Yan Xiong, Xiaoqing Duan
-
Patent number: 9097416Abstract: This invention relates to a lighting device having a light source (102, 103), a light output unit, a drive unit (106a) arranged to drive the light source, an electrical connection unit connected with the drive unit and arranged to receive input power, and a heat sink (112), which has been provided with multiple reception portions (115, 116). At least the light source and the drive unit are mounted at a first respectively a second reception portion of the heat sink. The heat sink is a formed sheet structure, which has been formed into a predetermined shape from a sheet shaped heat sink blank.Type: GrantFiled: January 6, 2012Date of Patent: August 4, 2015Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Remco Yuri Van De Moesdijk, Marcus Joannes Van Den Bosch
-
Publication number: 20140001956Abstract: There is provided a lighting device 100 comprising a light source, a driver arranged for powering the light source, which is separated in space from the light source. The lighting device has two separate heat sinks, a light source heat sink 112 to which the light source is thermally coupled, and a driver heat sink 115 to which the driver is thermally coupled. The light source heat sink and the driver heat sink are separated by an air gap 114 to provide thermal decoupling of the light source heat sink and the driver heat sink.Type: ApplicationFiled: January 11, 2012Publication date: January 2, 2014Applicant: KONINKLIJKE PHILIPS N.V.Inventors: Berend Jan Willem Ter Weeme, Remco Yuri Van De Moesdijk, Marcus Joannes Van Den Bosch, Yan Xiong, Xiaoqing Duan
-
Publication number: 20130301277Abstract: This invention relates to a lighting device having a light source (102, 103), a light output unit, a drive unit (106a) arranged to drive the light source, an electrical connection unit connected with the drive unit and arranged to receive input power, and a heat sink (112), which has been provided with multiple reception portions (115, 116). At least the light source and the drive unit are mounted at a first respectively a second reception portion of the heat sink. The heat sink is a formed sheet structure, which has been formed into a predetermined shape from a sheet shaped heat sink blank.Type: ApplicationFiled: January 6, 2012Publication date: November 14, 2013Applicant: KONINKLIJKE PHILIPS N.V.Inventors: Remco Yuri Van De Moesdijk, Marcus Joannes Van Den Bosch