Abstract: A lamp for a photochemical reactor, including: a support member made of a material having a thermal conductivity greater than or equal to 100W/mK at 20° C. and including at least one channel configured to contain a coolant fluid; at least one printed circuit mounted on the support member; and at least one light-emitting diode mounted on the printed circuit. A photochemical reactor including such a lamp, and a method for preparing a cycloalkanone oxime or a lactam using such a lamp.

Abstract: A lamp for a photochemical reactor, including: a support member made of a material having a thermal conductivity greater than or equal to 100W/mK at 20° C. and including at least one channel configured to contain a coolant fluid; at least one printed circuit mounted on the support member; and at least one light-emitting diode mounted on the printed circuit. A photochemical reactor including such a lamp, and a method for preparing a cycloalkanone oxime or a lactam using such a lamp.

Abstract: The present invention relates to zeolitic compositions of at least one A, X, Y zeolite and/or chabazite and at least one clinoptilolite type of zeolite. These zeolitic compositions can be used in adsorption methods for removing H2O and/or CO2 and/or H2S present in gas or liquid mixtures, particularly for purifying natural gas, acid gases, alcohols and mercaptans.

Abstract: The present invention relates to a process for purifying a syngas of the CO/H2 or N2/H2 type, which consists in removing CO2 and possibly other gaseous impurities (water, etc.) before the gas undergoes a cryogenic process. These impurities are adsorbed by the gas stream to be purified passing over an NaLSX-type zeolite and then desorbed during a regeneration step which may be performed by raising the temperature (TSA) and/or reducing the pressure (PSA or VSA).

Abstract: The present invention relates to zeolitic compositions of at least one A, X, Y zeolite and/or chabazite and at least one clinoptilolite type of zeolite. These zeolitic compositions can be used in adsorption methods for removing H2O and/or CO2 and/or H2S present in gas or liquid mixtures, particularly for purifying natural gas, acid gases, alcohols and mercaptans.

Abstract: The present invention relates to a process for purifying a syngas of the CO/H2 or N2/H2 type, which consists in removing CO2 and possibly other gaseous impurities (water, etc.) before the gas undergoes a cryogenic process. These impurities are adsorbed by the gas stream to be purified passing over an NaLSX-type zeolite and then desorbed during a regeneration step which may be performed by raising the temperature (TSA) and/or reducing the pressure (PSA or VSA).

Abstract: The present invention relates to a process for the recovery of a fluorosurfactant present in an aqueous solution, in a gaseous effluent or in both involving a) obtaining an aqueous solution or gaseous effluent comprising 1 to 1,000 ppm of surfactant, b) removing any suspended solids, c) optionally concentrating the solution, d) passing the aqueous solution over a stationary bed of granular active charcoal such that all the surfactant is adsorbed without any solvents being adsorbed, e) halting the passage of the solution and gaseous effluent over the beds of activated charcoal which are eluted with a solution comprising a solvent and an inorganic acid, and then f) treating the solution recovered in stage e) to regenerate the fluorosurfactant.

Abstract: Conducting a PSA process for the purification of gaseous hydrogen contaminated at least with CO and N2 of the H1 where the gas stream to be purified is passed through an adsorption region comprising at least one adsorbent based on zeolite 5A and one adsorbent based on zeolite X exchanged with calcium.

Abstract: The present invention relates to a process for the recovery of a fluorosurfactant present in an aqueous solution, in a gaseous effluent or in both involving a) obtaining an aqueous solution or gaseous elffluent comprising 1 to 1,000 ppm of surfactant, b) removing any suspended solids, c) optionally concentrating the solution, d) passing the aqueous solution over a stationary bed of granular active charcoal such that all the surfactant is adsorbed without any solvents being adsorbed, e) halting the passage of the solution over (B1) and the passage of the gaseous effluent over (B2), and (B1) and (B2) are eluted with a solution comprising a solvent and an inorganic acid, and then f) treating the solution recovered in stage e) to regenerate the fluorosurfactant.

Abstract: The present invention relates to a process for the purification of gaseous hydrogen contaminated at least with CO and N2 of the H2 PSA type, where the gas stream to be purified is passed through an adsorption region comprising at least one adsorbent based on zeolite 5A and one adsorbent based on zeolite X exchanged with calcium.

Abstract: The present invention relates to a process for purifying a syngas of the CO/H2 or N2/H2 type, which consists in removing CO2 and possibly other gaseous impurities (water, etc.) before the gas undergoes a cryogenic process. These impurities are adsorbed by the gas stream to be purified passing over an NaLSX-type zeolite and then desorbed during a regeneration step which may be performed by raising the temperature (TSA) and/or reducing the pressure (PSA or VSA).