Patents by Inventor Remy Marmoret

Remy Marmoret has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for obtaining an extreme ultraviolet radiation source, radiation source and use in lithography
    Patent number: 6927405
    Abstract: Method for obtaining extreme ultraviolet radiation and a source thereof, application in lithography. According to the invention, at least a solid target (28) is used, emitting extreme ultraviolet radiation by interaction with a laser beam focussed on a face (30) of the target. This target is able to emit a portion of the radiation from the opposite face (37) and this portion is collected and transmitted.
    Type: Grant
    Filed: November 14, 2000
    Date of Patent: August 9, 2005
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Laurence Bonnet, Danièle Babonneau, Rémy Marmoret
  • Lithography device which uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range
    Patent number: 6724465
    Abstract: Lithography device using a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band within this range. Each mirror (24, 26, 29) includes a stack of layers of a first material and layers of a second material alternating with the first material. The first material has an atomic number greater than that of the second material. The thickness of pairs of adjacent layers is a monotonic function of the depth in the stack. The source (22) comprises at least one target (28) which emits the radiation by interAction with a laser beam focused on one of its faces. A part (36) of the radiation emitted from the other face is used. The invention is applicable to the manufacture of integrated circuits with a high degree of integration.
    Type: Grant
    Filed: May 20, 2002
    Date of Patent: April 20, 2004
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Danièle Babonneau, Rémy Marmoret, Laurence Bonnet
  • Lithography device wich uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range
    Publication number: 20020171817
    Abstract: Lithography device using a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band within this range.
    Type: Application
    Filed: May 20, 2002
    Publication date: November 21, 2002
    Inventors: Daniele Babonneau, Remy Marmoret, Laurence Bonnet