Patents by Inventor Rens Sanderse

Rens Sanderse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic appararus and method
    Patent number: 8094287
    Abstract: A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: January 10, 2012
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse
  • Lithographic appararus and method
    Publication number: 20090027638
    Abstract: A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.
    Type: Application
    Filed: September 25, 2008
    Publication date: January 29, 2009
    Applicants: ASML NETHERLANDS B.V., Carl Zeiss SMT AG
    Inventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse
  • Lithographic apparatus and device manufacturing method
    Patent number: 7446849
    Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.
    Type: Grant
    Filed: July 22, 2004
    Date of Patent: November 4, 2008
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernard Gellrich, Bauke Jansen, Rens Sanderse
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060017894
    Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.
    Type: Application
    Filed: July 22, 2004
    Publication date: January 26, 2006
    Applicant: ASML NETHERLAND B.V.
    Inventors: Tjarko Adriaan Van Empel, Erik Loopstra, Antonius Van Der Net, Yuri Johannes Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse