Patents by Inventor Reybert L. TRINIDAD

Reybert L. TRINIDAD has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180355490
    Abstract: The present invention relates to a method for preserving a mark on a metallic workpiece prior to a chemical etching process to remove a surface material from a surface of the workpiece carrying the mark, the method comprising the steps of: deepening the mark relative to the surface to form a first depth; and depositing a filling material into the first depth, wherein the filling material is adapted to be removed during the chemical process, such that a second depth is obtained at the mark after the chemical process.
    Type: Application
    Filed: April 22, 2018
    Publication date: December 13, 2018
    Inventors: Reybert L. TRINIDAD, Jose Mari I. OMNI-ON, Orville T. PADAON
  • Patent number: 10060037
    Abstract: The present invention relates to a method for preserving a mark on a metallic workpiece prior to a chemical etching process to remove a surface material from a surface of the workpiece carrying the mark, the method comprising the steps of: deepening the mark relative to the surface to form a first depth; and depositing a filling material into the first depth, wherein the filling material is adapted to be removed during the chemical process, such that a second depth is obtained at the mark after the chemical process.
    Type: Grant
    Filed: April 25, 2016
    Date of Patent: August 28, 2018
    Inventors: Reybert L. Trinidad, Jose Mari I. Omni-On, Orville T. Padaon
  • Publication number: 20170107628
    Abstract: The present invention relates to a method for preserving a mark on a metallic workpiece prior to a chemical etching process to remove a surface material from a surface of the workpiece carrying the mark, the method comprising the steps of: deepening the mark relative to the surface to form a first depth; and depositing a filling material into the first depth, wherein the filling material is adapted to be removed during the chemical process, such that a second depth is obtained at the mark after the chemical process.
    Type: Application
    Filed: April 25, 2016
    Publication date: April 20, 2017
    Inventors: Reybert L. TRINIDAD, Jose Mari I. OMNI-ON, Orville T. PADAON