Abstract: The catalyst thin layer consists of electronically conductive catalyst nano-particles embedded in a polymeric matrix. The ratio number of catalyst atoms/total number of atoms in the catalyst layer is comprised between 40% and 90%, more preferably between 50% and 60%.

Abstract: The catalyst thin layer consists of electronically conductive catalyst nano-particles embedded in a polymeric matrix. The ratio number of catalyst atoms/total number of atoms in the catalyst layer is comprised between 40% and 90%, more preferably between 50% and 60%.

Abstract: One embodiment of the invention provides a method of manufacturing a filter material such as carbon suitable for use in a smoking article. The method includes modifying the filtration properties of the filter by altering the surface of the filter material. The surface alteration is performed by plasma processing and can be used, for example, to increase the acidic or basic properties of the surface. Another embodiment of the invention provides a filter produced by such a method.

Abstract: A method for treating substrates including the steps of: providing a substrate; exposing said substrate to a plasma glow discharge in the presence of a fluorocarbon gas; maintaining said gas at a pressure between about 50 mTorr and about 400 mTorr; generating said plasma as a modulated glow discharge; pulsing said discharge at an on time of 1-500 milliseconds; pulsing said glow at an off time of 1-1000 milliseconds; maintaining said plasma glow discharge at a power density of 0.02-10 watts/cm2; and applying a hydrophobic coating to said substrate.

Abstract: The present invention refers to the deposition of thin film coatings produced by plasma-activated chemical vapor deposition of volatile fluorinated cyclic siloxanes of the structure [RR'SiO].sub.x, in which R is a hydrocarbon radical with 1-6 carbon atoms, R' is a fluorinated hydrocarbon radical with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4.

Abstract: The present invention refers to coatings produced by means of the deposit of thin films formed by plasma-activated chemical vapor deposition of volatile fluoridated cyclic siloxanes having the structure [RR'SiO].sub.x, where R is an alkyl group with 1-6 carbon atoms, R' is a fluorinated alkyl group with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4. These particular coatings are useful because of their properties of protection and insulation.

Abstract: Films, layers, tapes, plates, and similar structures of metal or of plastic materials, coated with thin polyfluorocarbon films. These films, tapes, etc., are characterized in that no other materials are interposed; the polyfluorocarbon films are adherent and not porous, and have controlled wettability characteristics. The polyfluorocarbons have the formula (CF.sub.x).sub.n, wherein x is within the range of from 0.3 to 2.0, and are directly obtained on the substrate by the plasma-polymerization of gaseous streams of C.sub.2 F.sub.6 and H.sub.2 ; C.sub.2 F.sub.6 and C.sub.2 F.sub.4 ; CF.sub.4 and H.sub.2 ; CF.sub.4 and C.sub.2 F.sub.4 ; or of C.sub.2 F.sub.4. The metal substrate may be, e.g., Al, Cu, Fe, tin-coated Fe, Si, noble metals and alloys thereof. The substrate of plastic materials may be constituted, e.g., by polytetrafluoroethylene, polypropylene, polyethylene, polyphenyloxide, polycarbonate, and neoprene.

Abstract: Films, layers, tapes, plates, and similar structures of metal or of plastic materials, coated with thin polyfluorocarbon films. These films, tapes, etc., are characterized in that no other materials are interposed; the polyfluorocarbon films are adherent and not porous, and have controlled wettability characteristics. The polyfluorocarbons have the formula (CF.sub.x).sub.n, wherein x is within the range of from 0.3 to 2.0, and are directly obtained on the substrate by the plasma-polymerization of gaseous streams of C.sub.2 F.sub.6 and H.sub.2 ; C.sub.2 F.sub.6 and C.sub.2 F.sub.4 ; CF.sub.4 and H.sub.2 ; CF.sub.4 and C.sub.2 F.sub.4 ; or of C.sub.2 F.sub.4. The metal substrate may be, e.g., Al, Cu, Fe, tin-coated Fe, Si, noble metals and alloys thereof. The substrate of plastic materials may be constituted, e.g., by polytetrafluoroethylene, polypropylene, polyethylene, polyphenyloxide, polycarbonate, and neoprene.