Patents by Inventor Richard Bryan LEWIS

Richard Bryan LEWIS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, substrate table, and non-uniform coating method
    Patent number: 11887881
    Abstract: A method of fabricating a substrate table includes supporting a table base and disposing a coating on a surface of the table base. The surface of the table base is substantially flat. The coating has a non-uniform thickness. The coating exerts a stress on the table so as to bend the table base. The non-uniform thickness causes a surface of the coating to become substantially flat after the bending.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: January 30, 2024
    Assignee: ASML HOLDING N.V.
    Inventors: Bruce Tirri, Ping Zhou, Elizabeth Mary Stone, David Hart Peterson, Mehmet Ali Akbas, Ryan Mayer, Richard Bryan Lewis
  • LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE, AND NON-UNIFORM COATING METHOD
    Publication number: 20220216092
    Abstract: A method of fabricating a substrate table includes supporting a table base and disposing a coating on a surface of the table base. The surface of the table base is substantially flat. The coating has a non-uniform thickness. The coating exerts a stress on the table so as to bend the table base. The non-uniform thickness causes a surface of the coating to become substantially flat after the bending.
    Type: Application
    Filed: April 21, 2020
    Publication date: July 7, 2022
    Applicant: ASML HOLDING N.V.
    Inventors: Bruce TIRRI, Ping ZHOU, Elizabeth Mary STONE, David Hart PETERSON, Mehmet Ali AKBAS, Ryan MAYER, Richard Bryan LEWIS
  • Burls with altered surface topography for holding an object in lithography applications
    Patent number: 11270906
    Abstract: Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.
    Type: Grant
    Filed: October 4, 2018
    Date of Patent: March 8, 2022
    Assignee: ASML Holding N.V.
    Inventors: Mehmet Ali Akbas, David Hart Peterson, Tammo Uitterdijk, Michael Perry, Richard Bryan Lewis, Iliya Sigal
  • BURLS WITH ALTERED SURFACE TOPOGRAPHY FOR HOLDING AN OBJECT IN LITHOGRAPHY APPLICATIONS
    Publication number: 20210202293
    Abstract: Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.
    Type: Application
    Filed: October 4, 2018
    Publication date: July 1, 2021
    Applicant: ASML HOLDING N.V.
    Inventors: Mehmet Ali AKBAS, David Hart PETERSON, Tammo UITTERDIJK, Michael PERRY, Richard Bryan LEWIS, Iliya SIGAL