Patents by Inventor Richard Franciscus Van Haren
Richard Franciscus Van Haren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20070224525Abstract: A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a base layer for forming an alignment mark; depositing a pattern receiving layer on the base layer; in a first lithographic process, aligning, by using the main mark, a first mask that includes a first pattern and a local mark pattern, and transferring the first pattern and the local mark pattern to the pattern receiving layer; aligning, by using the local mark pattern, a second mask including a second pattern relative to the pattern receiving layer; and in a second lithographic process, transferring the second pattern to the pattern receiving layer; the first and second patterns being configured to form an assembled pattern.Type: ApplicationFiled: March 21, 2006Publication date: September 27, 2007Applicant: ASML Netherlands B.V.Inventors: Maurits Schaar, Richard Franciscus Van Haren
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Publication number: 20070190762Abstract: A method of forming features, e.g. contact holes, at a higher density than is possible with conventional lithographic techniques involves forming an array of sacrificial positive features, conformally depositing a sacrificial layer so that negative features are formed interleaved with the positive features, directionally etching the sacrificial layer and removing the sacrificial features. The result is an array of holes at a higher density than the original sacrificial features. These may then be transferred into the underlying substrate using a desired process.Type: ApplicationFiled: February 13, 2006Publication date: August 16, 2007Applicant: ASML Netherlands B.V.Inventors: Richard Franciscus Van Haren, Maurits Schaar, Ewoud Vreugdenhil
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Publication number: 20070176128Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 22, 2006Publication date: August 2, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Y Koren, Hoite Theodoor Tolsma, Hubertus Gertrudus Simons, Johny Schuurhuis, Sicco Schets, Brian Bok Lee, Allan Dunbar
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Publication number: 20060086910Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 6, 2005Publication date: April 27, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Maria Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Y. Koren, Hoite Theodoor Tolsma, Hubertus Gertrudus Simons, Johny Schuurhuis, Sicco Schets, Brian Bok Lee, Allan Dunbar
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Publication number: 20060081791Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 6, 2005Publication date: April 20, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Tolsma, Hubertus Gertrudus Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar
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Publication number: 20060081790Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 6, 2005Publication date: April 20, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Tolsma, Hubertus Gertrudus Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar
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Publication number: 20060081792Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.Type: ApplicationFiled: December 6, 2005Publication date: April 20, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Van Bilsen, Jacobus Burghoorn, Richard Franciscus Van Haren, Paul Hinnen, Hermanus Van Horssen, Jeroen Huijbregtse, Andre Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Tolsma, Hubertus Simons, Johny Schuurhuis, Sicco Schets, Brian Lee, Allan Dunbar
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Publication number: 20060012763Abstract: A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.Type: ApplicationFiled: July 13, 2004Publication date: January 19, 2006Inventors: Paul Hinnen, Richard Franciscus Van Haren, Hubertus Gertrudus Simons
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Publication number: 20060012779Abstract: A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.Type: ApplicationFiled: February 4, 2005Publication date: January 19, 2006Applicant: ASML Netherlands B.V.Inventors: Paul Hinnen, Richard Franciscus Van Haren, Hubertus Gertrudus Simons
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Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method
Publication number: 20060008714Abstract: A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.Type: ApplicationFiled: June 25, 2004Publication date: January 12, 2006Applicant: ASML Netherlands, B.V.Inventors: Maurits Van Der Schaar, Jacobus Burghoorn, Richard Franciscus Van Haren, Everhardus Mos, Rene Monshouwer -
Publication number: 20060003540Abstract: A method for manufacturing a marker structure including line elements and trench elements arranged in a repetitive order includes filling the trench elements with silicon dioxide and leveling the marker structure. A sacrificial oxide layer is grown on the semiconductor surface, and a first subset of the line elements is exposed to an ion implantation beam including a dopant species to dope and change an etching rate of the first subset. The substrate is annealed to activate the dopant species, and the semiconductor surface is etched to remove the sacrificial oxide layer and to level the first subset to a first level and to create a topology such that the first subset has a first level differing from a second level of a surface portion of the marker structure different from the first subset .Type: ApplicationFiled: June 30, 2004Publication date: January 5, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Richard Franciscus Van Haren, Sanjaysingh Lalbahadoersing, Henry Megens