Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a front end system including at least one resin tank configured to contain an ion exchange resin configured to target a particular metal. The at least one resin tank may be configured to receive an output from an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process. The system may further include a central processing system configured to receive a saturated resin tank from the at least one resin tank. The central processing system may further include a vacuum filter band system configured to receive a slurry from the saturated resin tank and to provide a cascading resin rinse to the slurry. The central processing system may further include a repetitive stripping system configured to receive a metal-filled purification unit from a metal specific purification system.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process. The oxidation reactor may be further configured to oxidize a chemical associated with the flow of wastewater with an oxidation agent. The oxidation reactor may include at least one reaction member configured to pressurize at least a portion of the oxidation reactor. The system may further include at least one resin tank configured to contain an ion exchange resin configured to target a particular metal, the at least one resin tank configured to receive an output from the oxidation reactor. Numerous other embodiments are also within the scope of the present disclosure.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a vacuum filter band system configured to receive a saturated resin tank from a front end system, the vacuum filter band system configured to generate a slurry from the saturated resin tank and to provide a cascading resin rinse to the slurry. The system may further include a repetitive stripping system configured to receive a metal-filled purification unit from a metal specific purification system. The repetitive stripping system may be further configured to sequentially apply the contents of a plurality of acid tanks to the metal-filled purification unit to generate a metal salt. Numerous other embodiments are also within the scope of the present disclosure.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a vacuum filter band system configured to receive a saturated ion exchange resin tank and to apply a water rinse to the resin to generate a resin slurry. The vacuum filter band system may further include a vacuum filter band configured to receive the resin slurry. The vacuum filter band system may also be configured to generate a mixed metal solution. The system may further include a metal specific purification system including a plurality of purification units configured to receive a continuous flow of the mixed metal solution, each of the purification units configured to target a particular metal from the mixed metal solution. Numerous other embodiments are also within the scope of the present disclosure.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a vacuum filter band system configured to receive a saturated ion exchange resin tank and to apply a water rinse to the resin to generate a resin slurry. The vacuum filter band system may further include a vacuum filter band configured to receive the resin slurry. The vacuum filter band system may also be configured to generate a mixed metal solution. The system may further include a metal specific purification system including a plurality of purification units configured to receive a continuous flow of the mixed metal solution, each of the purification units configured to target a particular metal from the mixed metal solution. Numerous other embodiments are also within the scope of the present disclosure.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process. The oxidation reactor may be further configured to oxidize a chemical associated with the flow of wastewater with an oxidation agent. The oxidation reactor may include at least one reaction member configured to pressurize at least a portion of the oxidation reactor. The system may further include at least one resin tank configured to contain an ion exchange resin configured to target a particular metal, the at least one resin tank configured to receive an output from the oxidation reactor. Numerous other embodiments are also within the scope of the present disclosure.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include at least one resin tank including an ion exchange resin configured to target a particular metal. The at least one resin tank may be configured to receive an output from an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process. The system may further include a vacuum filter band system configured to receive a saturated resin tank and to apply a water rinse to the resin to generate a resin slurry, the vacuum filter band system including a vacuum filter band configured to receive the resin slurry. Numerous other embodiments are also within the scope of the present disclosure.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a front end system including at least one resin tank having an ion exchange resin configured to target a particular metal. The at least one resin tank may be configured to receive an output from an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process. The system may further include a radio frequency identification (RFID) system associated with the front end system, the at least one resin tank including one or more radio frequency identification (RFID) tags configured to record at least one characteristic associated with the at least one resin tank. Numerous other embodiments are also within the scope of the present disclosure.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a front end system including at least one resin tank configured to contain an ion exchange resin configured to target a particular metal. The at least one resin tank may be configured to receive an output from an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process. The system may further include a central processing system configured to receive a saturated resin tank from the at least one resin tank. The central processing system may further include a vacuum filter band system configured to receive a slurry from the saturated resin tank and to provide a cascading resin rinse to the slurry. The central processing system may further include a repetitive stripping system configured to receive a metal-filled purification unit from a metal specific purification system.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a vacuum filter band system configured to receive a saturated resin tank from a front end system, the vacuum filter band system configured to generate a slurry from the saturated resin tank and to provide a cascading resin rinse to the slurry. The system may further include a repetitive stripping system configured to receive a metal-filled purification unit from a metal specific purification system. The repetitive stripping system may be further configured to sequentially apply the contents of a plurality of acid tanks to the metal-filled purification unit to generate a metal salt. Numerous other embodiments are also within the scope of the present disclosure.