Abstract: An electroplating apparatus for electroplating a plurality of items. The apparatus includes a tank having a bottom wall and side walls and adapted to hold a predetermined quantity of an electrolytic plating solution. A sparger system at the bottom of the tank directs the electrolytic plating solution in an upward direction. A cathode rack supporting the items to be electroplated extends intermediate to anode plates and upwardly from the sparger system. Strategically placed openings in the anodes and an anode screen in conjunction with the sparger system act to reduce the plating thickness variance over the rack.

Abstract: A support device for an earring which includes a back support. A back ear clamping member carried by the back support is adjustable to a forward and rearward position with respect to a front ear clamping member. The back ear clamping member is free to move limitedly in both a horizontal and vertical direction when either in forward or rearward adjusted position, but when in an intermediate position is substantially restrained from movement.