Patents by Inventor Richard Joseph Bruls
Richard Joseph Bruls has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230063156Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.Type: ApplicationFiled: December 24, 2020Publication date: March 2, 2023Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ronald Peter ALBRIGHT, Kursat BAL, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Sjoerd Frans DE VRIES, Olav Waldemar Vladimir FRIJNS, Yang-Shan HUANG, Zhuangxiong HUANG, Johannes Henricus Wilhelmus JACOBS, Johannes Hubertus Josephina MOORS, Georgi Nanchev NENCHEV, Andrey NIKIPELOV, Thomas Maarten RAASVELD, Manish RANJAN, Edwin TE SLIGTE, Karl Robert UMSTADTER, Eray UZGÖREN, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
-
Patent number: 11333984Abstract: Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.Type: GrantFiled: February 4, 2019Date of Patent: May 17, 2022Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Richard Joseph Bruls, Ronald Peter Albright, Peter Conrad Kochersperger, Victor Antonio Perez-Falcon
-
Patent number: 11137694Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.Type: GrantFiled: July 18, 2018Date of Patent: October 5, 2021Assignees: ASML Netherlands B.V., ASML Holding N V.Inventors: Yang-Shan Huang, Marcel Joseph Louis Boonen, Han-Kwang Nienhuys, Jacob Brinkert, Richard Joseph Bruls, Peter Conrad Kochersperger
-
Publication number: 20210173315Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.Type: ApplicationFiled: July 18, 2018Publication date: June 10, 2021Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Yang-Shan HUANG, Marcel Joseph Louis BOONEN, Han-Kwang NIENHUYS, Jacob BRINKERT, Richard Joseph BRULS, Peter Conrad KOCHERSPERGER
-
Patent number: 11009803Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: GrantFiled: September 30, 2019Date of Patent: May 18, 2021Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
-
Publication number: 20210041795Abstract: Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.Type: ApplicationFiled: February 4, 2019Publication date: February 11, 2021Applicants: ASML Netherlands B..V., ASML Holding N.V.Inventors: Richard Joseph BRULS, Ronald Peter ALBRIGHT, Peter Conrad KOCHERSPERGER, Victor Antonio PEREZ-FALCON
-
Patent number: 10613445Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: GrantFiled: March 25, 2019Date of Patent: April 7, 2020Assignee: ASML Netherlands B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
-
Publication number: 20200057394Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: ApplicationFiled: September 30, 2019Publication date: February 20, 2020Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François SylvainVirgile VAN LOO, Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
-
Patent number: 10558129Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: GrantFiled: November 16, 2015Date of Patent: February 11, 2020Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Matthias Kruizinga, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Erik Willem Bogaart, Derk Servatius Gertruda Brouns, Marc Bruijn, Richard Joseph Bruls, Jeroen Dekkers, Paul Janssen, Mohammad Reza Kamali, Ronald Harm Gunther Kramer, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Matthew Lipson, Erik Roelof Loopstra, Joseph H. Lyons, Stephen Roux, Gerrit Van Den Bosch, Sander Van Den Heijkant, Sandra Van Der Graaf, Frits Van Der Meulen, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge
-
Publication number: 20190324374Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: July 2, 2019Publication date: October 24, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
-
Patent number: 10429741Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: GrantFiled: November 19, 2018Date of Patent: October 1, 2019Assignee: ASML Netherlands B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Publication number: 20190219929Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high- resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: ApplicationFiled: March 25, 2019Publication date: July 18, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
-
Patent number: 10345712Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: March 12, 2018Date of Patent: July 9, 2019Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
-
Patent number: 10241418Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: GrantFiled: September 21, 2015Date of Patent: March 26, 2019Assignee: ASML Netherlands B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
-
Publication number: 20190086814Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: ApplicationFiled: November 19, 2018Publication date: March 21, 2019Applicant: ASML Netherlands B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentinus Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Patent number: 10222701Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.Type: GrantFiled: September 18, 2014Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Chuangxin Zhao, Sander Baltussen, Pär Mårten Lukas Broman, Richard Joseph Bruls, Cristian Bogdan Craus, Jan Groenewold, Dzmitry Labetski, Kerim Nadir, Hendrikus Gijsbertus Schimmel, Christian Felix Wählisch
-
Patent number: 10151984Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: GrantFiled: October 30, 2015Date of Patent: December 11, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Publication number: 20180329314Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.Type: ApplicationFiled: November 16, 2015Publication date: November 15, 2018Inventors: Matthias KRUIZINGA, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Erik Willem BOGAART, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Richard Joseph BRULS, Jeroen DEKKERS, Paul JANSSEN, Mohammad Reza KAMALI, Ronald Harm Gunther KRAMER, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Matthew LIPSON, Erik Roelof LOOPSTRA, Joseph H. LYONS, Stephen ROUX, Gerrit VAN DEN BOSCH, Sander VAN DEN HEIJKANT, Sandra VAN DER GRAAF, Frits VAN DER MEULEN, Jérôme François Sylvain Virgile VAN LOO, Beatrijs Louise Marie-Joseph Katrien VERBRUGGE
-
Publication number: 20180203364Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: March 12, 2018Publication date: July 19, 2018Applicant: ASMLNETHERLANDS B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sofia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
-
Patent number: 9952515Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: August 28, 2015Date of Patent: April 24, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers