Patents by Inventor Richard Reim

Richard Reim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Conformal electromagnetic (EM) detector
    Patent number: 8947889
    Abstract: A conformal electro-magnetic (EM) detector and a method of applying such a detector are provided herein as well as variations thereof Variations include, but are not limited to, single-element, area detectors; an array of multiple active elements.
    Type: Grant
    Filed: August 16, 2011
    Date of Patent: February 3, 2015
    Assignee: Lockheed Martin Corporation
    Inventors: Matthew Kelley, Christian Adams, Richard Reim
  • CONFORMAL ELECTROMAGNETIC SENSOR (FOR DETECTION OF NON-DESTRUCTIVE IMAGING AND INVESTIGATION)
    Publication number: 20120091456
    Abstract: A conformal electro-magnetic (EM) detector and a method of applying such a detector are provided herein as well as variations thereof Variations include, but are not limited to, single-element, area detectors; an array of multiple active elements.
    Type: Application
    Filed: August 16, 2011
    Publication date: April 19, 2012
    Applicant: LOCKHEED MARTIN CORPORATION
    Inventors: Matthew KELLEY, Christian Adams, Richard Reim
  • Method and apparatus for inspecting a structure using X-rays
    Patent number: 6567497
    Abstract: The present invention is directed to an apparatus and method for examining small structures such as micro circuit structures. Exemplary embodiments can generate narrow electron beams for examining the micro circuits, and can eliminate the traversing of the x-rays through materials other than a target material and the sample structure. Exemplary embodiments eliminate having the x-rays traverse both a wafer and a plating target on the wafer being examined, by using a target material placed closer to the sample structure. Exemplary embodiments provide adequate magnification to perform fault analysis of small structures and provide an adequate contrast pattern for viewing images of the micro circuit being examined.
    Type: Grant
    Filed: April 20, 2001
    Date of Patent: May 20, 2003
    Assignee: Lockheed Martin Corporation
    Inventor: Richard Reim
  • Method and apparatus for inspecting a structure using X-rays
    Publication number: 20020154734
    Abstract: The present invention is directed to an apparatus and method for examining small structures such as micro circuit structures. Exemplary embodiments can generate narrow electron beams for examining the micro circuits, and can eliminate the traversing of the x-rays through materials other than a target material and the sample structure. Exemplary embodiments eliminate having the x-rays traverse both a wafer and a plating target on the wafer being examined, by using a target material placed closer to the sample structure. Exemplary embodiments provide adequate magnification to perform fault analysis of small structures and provide an adequate contrast pattern for viewing images of the micro circuit being examined.
    Type: Application
    Filed: April 20, 2001
    Publication date: October 24, 2002
    Inventor: Richard Reim