Abstract: A method of making an oriented fluoride crystal blank for transmitting below 250 nm ultraviolet light includes irradiating a fluoride crystal blank with an x-ray beam, detecting the x-ray beams diffracted from the fluoride crystal blank, generating a diffraction pattern from the x-ray beam diffracted from the fluoride crystal blank, determining an angular deviation of an optical axis of the fluoride crystal blank from a specific crystallographic direction, and, if the angular deviation is not within a predefined range, modifying the fluoride crystal blank in a manner such that that the resultant angular deviation between the optical axis of the fluoride crystal blank from the specific crystallographic direction after modifying falls within the predefined range.

Abstract: A method for automating measurement of an optical property of a sample includes selecting a measurement aperture around a reference point on the sample (38), generating a set of grid nodes that fall within the measurement aperture (68), calculating the radial distance of each node with respect to a reference point within the measurement aperture, and calculating the angular position of each node with respect to the vertical. The method also includes moving a light source (32) and a light detector along the vertical and rotating the sample to measurement positions in which the light source and the light detector are aligned with one of the nodes in the measurement aperture, and measuring the optical property at the measurement position by energizing the light source and interrogating the detector. The calculated radial distances and angular positions are used to control positioning of the light source and the light detector and rotation of the sample.

Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.

Abstract: A method for automating measurement of an optical property of a sample includes selecting a measurement aperture around a reference point on the sample (38), generating a set of grid nodes that fall within the measurement aperture (68), calculating the radial distance of each node with respect to a reference point within the measurement aperture, and calculating the angular position of each node with respect to the vertical. The method also includes moving a light source (32) and a light detector along the vertical and rotating the sample to measurement positions in which the light source and the light detector are aligned with one of the nodes in the measurement aperture, and measuring the optical property at the measurement position by energizing the light source and interrogating the detector. The calculated radial distances and angular positions are used to control positioning of the light source and the light detector and rotation of the sample.

Abstract: A method of making an oriented fluoride crystal blank for transmitting below 250 nm ultraviolet light includes irradiating a fluoride crystal blank with an x-ray beam, detecting the x-ray beams diffracted from the fluoride crystal blank, generating a diffraction pattern from the x-ray beam diffracted from the fluoride crystal blank, determining an angular deviation of an optical axis of the fluoride crystal blank from a specific crystallographic direction, and, if the angular deviation is not within a predefined range, modifying the fluoride crystal blank in a manner such that that the resultant angular deviation between the optical axis of the fluoride crystal blank from the specific crystallographic direction after modifying falls within the predefined range.

Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.

Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.

Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.

Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.

Abstract: An apparatus for making automated measurements of an optical property of a sample includes a first stage which is movable along a predetermined line, a second stage for holding the sample, and a third stage which is movable along a predetermined line, correspondingly to the motion of the first stage. A light source is mounted on the first stage, and a light detector is mounted on the third stage. The second stage rotates the sample to a selected rotary position. The apparatus also includes a controller for coordinating movement of the first, second, and third stages such that the light source, the sample, and the light detector are optically aligned.