Abstract: The present invention discloses the improvements to a vacuum swing adsorption (VSA) process used for Xe recovery. By only collecting the recovered gas mixture after the initial evacuation of N2 from the adsorbent vessel and void space, the recovered Xe is not diluted by N2 contained in the adsorbent vessel and void space. The concentration of the recovered Xe can by increased (high purity), simultaneously little Xenon is lost. During the initial evacuation of N2, the vessel has been evacuated to a pressure less than 1 atmospheric pressure, for example, from 100 to 1 torr.

Abstract: The present invention discloses the improvements to a vacuum swing adsorption (VSA) process used for Xe recovery. By only collecting the recovered gas mixture after the initial evacuation of N2 from the adsorbent vessel and void space, the recovered Xe is not diluted by N2 contained in the adsorbent vessel and void space. The concentration of the recovered Xe can by increased (high purity), simultaneously little Xenon is lost. During the initial evacuation of N2, the vessel has been evacuated to a pressure less than 1 atmospheric pressure, for example, from 100 to 1 torr.

Abstract: A gas sampling and inlet device for a mass spectrometer has a hollow housing sleeve with an open inside region and a hollow inner sleeve with an open inside region, with the inner sleeve coaxial to the housing sleeve. One end of the housing sleeve and one end of the inner sleeve are connected with a single first end cap. The second end of the housing sleeve has a second end cap, but the second end of the inner sleeve is open such that the inside of the inner sleeve is open to the inside of the housing sleeve. The first end cap has a small diameter orifice adapted to receive a gaseous fluid. The second end cap is connected to a mass spectrometer. The second end cap has an orifice adapted to receive a gaseous fluid into the mass spectrometer that is substantially smaller in diameter than the orifice in the first end cap. The housing sleeve has a vacuum pump port to allow a vacuum to be created in the interior of the inlet device.

Abstract: A method for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with a thermally activated source of fluorine, such as nitrogen trifluoride, at an elevated temperature, typically at the process operation temperature, wherein the cleaning is terminated prior to complete cleaning and removal of undesired substances allowing rapid restart of fabrication equipment so cleaned.

Abstract: An apparatus for generating a low concentration calibration gas mixture containing percent, ppm, ppb or ppt amounts of a desired analyte from a high concentration gas mixture and a high purity diluent using a series of source gas containing vessels and a series of parallel gas or chemical conduits controlled by mass flow controllers in a purged enclosure with conduits to purge gas conduits of residual gases or corrosive gases.