Patents by Inventor Richard Wells PLAVIDAL

Richard Wells PLAVIDAL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hyperbaric clean method and apparatus for cleaning semiconductor chamber components
    Patent number: 11710647
    Abstract: Embodiments of a methods and cleaning systems for cleaning components for use in substrate processing equipment are provided herein. In some embodiments, a cleaning system includes a boiler having a heater configured to heat a fluid; a clean chamber fluidly coupled to the boiler via at least one of a gas line and a liquid line, wherein the clean chamber includes one or more fixtures in an interior volume therein for holding at least one component to be cleaned, and wherein the clean chamber includes a heater for heating the interior volume; and an expansion chamber fluidly coupled to the clean chamber via a release line for evacuating the clean chamber, wherein the release line includes a release valve to selectively open or close a flow path between the expansion chamber and the clean chamber, and wherein the expansion chamber includes a chiller and a vacuum port.
    Type: Grant
    Filed: January 28, 2021
    Date of Patent: July 25, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Richard Wells Plavidal, Scott Osterman, David W. Groechel, Gang Grant Peng, John Z. Smith
  • HYPERBARIC CLEAN METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR CHAMBER COMPONENTS
    Publication number: 20220238355
    Abstract: Embodiments of a methods and cleaning systems for cleaning components for use in substrate processing equipment are provided herein. In some embodiments, a cleaning system includes a boiler having a heater configured to heat a fluid; a clean chamber fluidly coupled to the boiler via at least one of a gas line and a liquid line, wherein the clean chamber includes one or more fixtures in an interior volume therein for holding at least one component to be cleaned, and wherein the clean chamber includes a heater for heating the interior volume; and an expansion chamber fluidly coupled to the clean chamber via a release line for evacuating the clean chamber, wherein the release line includes a release valve to selectively open or close a flow path between the expansion chamber and the clean chamber, and wherein the expansion chamber includes a chiller and a vacuum port.
    Type: Application
    Filed: January 28, 2021
    Publication date: July 28, 2022
    Inventors: Richard Wells PLAVIDAL, Scott OSTERMAN, David W. GROECHEL, Gang Grant PENG, John Z. SMITH