Patents by Inventor Richika Kato

Richika Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for protecting layer by forming hydrocarbon-based extremely thin film
    Patent number: 10043661
    Abstract: A method for protecting a layer includes: providing a substrate having a target layer; depositing a protective layer on the target layer, which protective layer contacts and covers the target layer and is constituted by a hydrocarbon-based layer; and depositing an oxide layer on the protective layer so that the protective layer in contact with the oxide layer is oxidized. The hydrocarbon-based layer is formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant.
    Type: Grant
    Filed: September 1, 2016
    Date of Patent: August 7, 2018
    Assignee: ASM IP Holding B.V.
    Inventors: Richika Kato, Ryu Nakano
  • SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    Publication number: 20180102247
    Abstract: A substrate processing apparatus includes a substrate support having a central first upper surface and a second upper surface surrounding the first upper surface and formed higher than the first upper surface, and an exhaust duct surrounding the substrate support, wherein a first through hole and a second through hole are formed in the substrate support, the first through hole being formed through the substrate support from the first upper surface, the second through hole connecting the first through hole and a side surface of the substrate support.
    Type: Application
    Filed: October 6, 2016
    Publication date: April 12, 2018
    Applicant: ASM IP Holding B.V.
    Inventors: Richika KATO, Kensuke HABA
  • Method for protecting layer by forming hydrocarbon-based extremely thin film
    Patent number: 9899291
    Abstract: A method for protecting a layer includes: providing a substrate having a target layer and forming a protective layer on the target layer, said protective layer contacting and covering the target layer and containing a hydrocarbon-based layer constituting at least an upper part of the protective layer, which hydrocarbon-based layer is formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: February 20, 2018
    Assignee: ASM IP HOLDING B.V.
    Inventors: Richika Kato, Seiji Okuro, Kunitoshi Namba, Yuya Nonaka, Akinori Nakano
  • METHOD FOR PROTECTING LAYER BY FORMING HYDROCARBON-BASED EXTREMELY THIN FILM
    Publication number: 20170018477
    Abstract: A method for protecting a layer includes: providing a substrate having a target layer and forming a protective layer on the target layer, said protective layer contacting and covering the target layer and containing a hydrocarbon-based layer constituting at least an upper part of the protective layer, which hydrocarbon-based layer is formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant.
    Type: Application
    Filed: July 13, 2015
    Publication date: January 19, 2017
    Inventors: Richika Kato, Seiji Okuro, Kunitoshi Namba, Yuya Nonaka, Akinori Nakano
  • METHOD FOR PROTECTING LAYER BY FORMING HYDROCARBON-BASED EXTEMELY THIN FILM
    Publication number: 20170018420
    Abstract: A method for protecting a layer includes: providing a substrate having a target layer; depositing a protective layer on the target layer, which protective layer contacts and covers the target layer and is constituted by a hydrocarbon-based layer; and depositing an oxide layer on the protective layer so that the protective layer in contact with the oxide layer is oxidized. The hydrocarbon-based layer is formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant.
    Type: Application
    Filed: September 1, 2016
    Publication date: January 19, 2017
    Inventors: Richika Kato, Ryu Nakano