Abstract: A wet scrubber (1) useful for cleaning a process gas comprises at least a first spray level system (20) and a second spray level system (26) arranged vertically above the first spray level system (20) in a wet scrubber tower (2). The first spray level system (20) comprises at least one gas-liquid contacting plate (38) which is operative for deflecting absorption liquid, that has been atomized by means of the second spray level system (26) and flowing downward in the wet scrubber tower (2), so deflected absorption liquid (AL) may contact process gas (F) contacted by absorption liquid atomized by the first spray level system (20).

Abstract: A gas sparger (30) is operative for supplying an oxidation gas containing oxygen to a tank (18) of a wet scrubber which is operative for removing sulphur dioxide from a process gas by means of a slurry (S). The gas sparger (30) is provided with at least a first liquid supply nozzle (38), which is located inside an oxidation gas supply duct (32) and is operative for spraying a liquid containing water towards a first oxidation gas supply nozzle (44). The oxidation gas supply duct (32) has a characteristic cross-sectional measure, such as a diameter (D), at said first oxidation gas supply nozzle (44). The first liquid supply nozzle (38) is located a distance (L1) of maximum 5 times said characteristic cross-sectional measure (D) from said first oxidation gas supply nozzle (44).

Abstract: A wet electrostatic precipitator (1) includes an inlet (2) for receiving a gas (4) containing a pollutant, and an outlet (6) for discharging therefrom the gas (8) from which said pollutant has been at least partially removed. Nozzles (24) are operative for purposes of spraying liquid onto at least one first vertical collecting surface (30) of at least one collecting electrode (18). A liquid distributor (42) is provided for purposes of pouring liquid onto at least one second vertical collecting surface (44), said at least one second vertical collecting surface (44) being located on a further collecting electrode (36), with said further collecting electrode (36) being located downstream of said at least one collecting electrode (18). The nozzles (24) are located upstream of the liquid distributor (42), as viewed with reference to the direction of flow of the gas.

Abstract: A wet scrubber (1) and a method of using the wet scrubber to clean a process gas containing sulphur dioxide comprising at least one spray level system (20) with atomizing nozzles (38) to which an absorption liquid is supplied for atomization by the nozzles (38). The method comprises operating the spray level system (20) in at least a first operating mode with an active nozzle density of at least 0.7 nozzles/m2, an absorption liquid flow of at least 10 m3/hour per nozzle and a Total Flow of at least 30 m3/hour/m2.

Abstract: A device useful for separating gaseous pollutants, such as sulphur dioxide, from a gas by means of an absorption liquid is disclosed. The device includes a horizontal apertured plate mounted between an inlet and an outlet arranged for passage of a gas containing a gaseous pollutant therethrough. On an upper surface of the horizontal apertured plate is a flowing layer of absorption liquid. The separation of the gaseous pollutant from the gas is adjustable by varying the thickness of the flowing layer of absorption liquid by moving a throttle means to a position that provides the desired amount of resistance to the following layer of absorption liquid.

Abstract: A gas sparger (30) is operative for supplying an oxidation gas containing oxygen to a tank (18) of a wet scrubber which is operative for removing sulphur dioxide from a process gas by means of a slurry (S). The gas sparger (30) is provided with at least a first liquid supply nozzle (38), which is located inside an oxidation gas supply duct (32) and is operative for spraying a liquid containing water towards a first oxidation gas supply nozzle (44). The oxidation gas supply duct (32) has a characteristic cross-sectional measure, such as a diameter (D), at said first oxidation gas supply nozzle (44). The first liquid supply nozzle (38) is located a distance (L1) of maximum 5 times said characteristic cross-sectional measure (D) from said first oxidation gas supply nozzle (44).

Abstract: A wet electrostatic precipitator (1) comprises an inlet (2) for receiving a gas (4) containing a pollutant, and an outlet (6) for discharging therefrom the gas (8) from which said pollutant has been at least partially removed. Nozzles (24) are operative for purposes of spraying liquid onto at least one first vertical collecting surface (30) of at least one collecting electrode (18). A liquid distributor (42) is provided for purposes of pouring liquid onto at least one second vertical collecting surface (44), said at least one second vertical collecting surface (44) being located on a further collecting electrode (36), with said further collecting electrode (36) being located downstream of said at least one collecting electrode (18). The nozzles (24) are located upstream of the liquid distributor (42), as viewed with reference to the direction of flow of the gas.

Abstract: A device for separating at least one gaseous pollutant from a gas comprising an apertured plate (8) which permits the passage from below the apertured plate of the gas containing the at least one gaseous pollutant and wherein on the upper surface (12) of the apertured plate (8) a layer (14) of absorption liquid is made to flow. A fixed barrier (76) being positioned within an outlet zone (68) so as to extend vertically upwards from the apertured plate (8). A controllable throttle means (80) is positioned above the fixed barrier (76) so as to be operable to control the amount of resistance that the flowing layer (14) of the absorption liquid has to overcome in order to flow past the fixed barrier (76).

Abstract: A device (1) for separating sulphur dioxide from a gas (4) by means of an absorption liquid has an inlet (2) for gas (4) containing sulphur dioxide, an outlet (18) for gas (16), from which sulphur dioxide has been separated, and as essentially horizontal apertured plate (8), which is arranged to allow passage from below of sulphur dioxide containing gas (4) and to carry, on its upper side (12), a flowing layer (14) of the absorption liquid. An outlet box (20) beside the apertured plate (8) is arranged to be passed by liquid, which is distributed in the gas (4) coming from the inlet (2). A first pumping means is arranged to feed a coolant flow to the outlet box (20) and a second pumping means is arranged to feed an absorption liquid flow, which is essentially independent of the coolant flow, to the apertured plate (8) to form the flowing layer (14). In a method of separating sulphur dioxide, the above-described device (1) can be used.

Abstract: A device (1) for separating sulphur dioxide from a gas (4) by means of an absorption liquid has an inlet (2) for gas (4) containing sulphur dioxide, an outlet (18) for gas (16), from which sulphur dioxide has been separated, and as essentially horizontal apertured plate (8), which is arranged to allow passage from below of sulphur dioxide containing gas (4) and to carry, on its upper side (12), a flowing layer (14) of the absorption liquid. An outlet box (20) beside the apertured plate (8) is arranged to be passed by liquid, which is distributed in the gas (4) coming from the inlet (2). A first pumping means is arranged to feed a coolant flow to the outlet box (20) and a second pumping means is arranged to feed an absorption liquid flow, which is essentially independent of the coolant flow, to the apertured plate (8) to form the flowing layer (14). In a method of separating sulphur dioxide, the above-described device (1) can be used.