Patents by Inventor Risa Tsuruta

Risa Tsuruta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230069963
    Abstract: The present invention provides a novel compound that has anti-RSV activity and that is useful in the prevention or treatment of an infection in which viruses of the subfamily Pneumovirinae, including respiratory syncytial virus (RSV), are involved, or a pharmaceutically acceptable salt thereof. Specifically, the present invention provides a compound represented by formula (I): or a pharmaceutically acceptable salt thereof.
    Type: Application
    Filed: December 24, 2019
    Publication date: March 9, 2023
    Applicant: TAISHO PHARMACEUTICAL CO., LTD.
    Inventors: Takanori KAWAGUCHI, Yuya OGATA, Nozomi TANAKA, Tomoki TAKEUCHI, Toru SASAKI, Ryo TAKAHASHI, Kanako HATANAKA, Risa TSURUTA, Tomokazu TAMAOKI
  • Publication number: 20220002279
    Abstract: The present invention provides a new imidazole derivative represented by the following formula or a pharmaceutically acceptable salt thereof which exhibits potent antimicrobial activity based on a LpxC-inhibiting action against gram-negative bacteria such as Pseudomonas aeruginosa, Escherichia coli, and Klebsiella pneumoniae, and their drug-resistant strains. General formula [1] or [2].
    Type: Application
    Filed: November 20, 2019
    Publication date: January 6, 2022
    Applicant: TAISHO PHARMACEUTICAL CO., LTD.
    Inventors: Hajime TAKASHIMA, Yohei MATSUDA, Yuya OGATA, Naoki SASAMOTO, Risa TSURUTA, Fumihito USHIYAMA, Kaori UEKI, Nozomi TANAKA
  • Patent number: 9499477
    Abstract: Provided is a novel compound which is useful as a pharmaceutical composition by inhibiting an LpxC activity, thereby exhibiting potent antimicrobial activity against gram-negative bacteria including Pseudomonas aeruginosa and its drug resistant bacteria. Provided is a hydroxamic acid derivative represented by the following general formula [1] or a pharmaceutically acceptable salt thereof.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: November 22, 2016
    Assignees: TOYAMA CHEMICAL CO., LTD., TAISHO PHARMACEUTICAL CO., LTD
    Inventors: Hajime Takashima, Risa Tsuruta, Tetsuya Yabuuchi, Yusuke Oka, Hiroki Urabe, Yoichiro Suga, Masato Takahashi, Fumito Uneuchi, Hironori Kotsubo, Muneo Shoji, Yasuko Kawaguchi
  • Publication number: 20150225335
    Abstract: Provided is a novel compound which is useful as a pharmaceutical composition by inhibiting an LpxC activity, thereby exhibiting potent antimicrobial activity against gram-negative bacteria including Pseudomonas aeruginosa and its drug resistant bacteria.
    Type: Application
    Filed: April 21, 2015
    Publication date: August 13, 2015
    Applicants: TAISHO PHARMACEUTICAL CO., LTD., TOYAMA CHEMICAL CO., LTD.
    Inventors: Hajime TAKASHIMA, Risa TSURUTA, Tetsuya YABUUCHI, Yusuke OKA, Hiroki URABE, Yoichiro SUGA, Masato TAKAHASHI, Fumito UNEUCHI, Hironori KOTSUBO, Muneo SHOJI, Yasuko KAWAGUCHI
  • Patent number: 9073821
    Abstract: Provided is a novel compound which is useful as a pharmaceutical composition by inhibiting an LpxC activity, thereby exhibiting potent antimicrobial activity against gram-negative bacteria including Pseudomonas aeruginosa and its drug resistant bacteria.
    Type: Grant
    Filed: April 20, 2011
    Date of Patent: July 7, 2015
    Assignees: TAISHO PHARMACEUTICAL CO., LTD, TOYAMA CHEMICAL CO., LTD.
    Inventors: Hajime Takashima, Risa Tsuruta, Tetsuya Yabuuchi, Yusuke Oka, Hiroki Urabe, Yoichiro Suga, Masato Takahashi, Fumito Uneuchi, Hironori Kotsubo, Muneo Shoji, Yasuko Kawaguchi
  • Patent number: 9045466
    Abstract: An amidine compound represented by formula (I) (wherein A1 represents a nitrogen atom or a group represented by formula CR6; A2 and A3 are the same as or different from each other and independently represent a nitrogen atom or a group represented by formula CH; R1 represents an aryl group which may be substituted by 1 to 5 substituents independently selected from a substituent group (2) or the like; R2 and R3 are the same as or different from each other and independently represent a hydrogen atom, a halogen atom, a C1-6 alkyl group, a C1-6 haloalkyl group or a C1-6 alkoxy group; and R4 and R5 are the same as or different from each other and independently represent a hydrogen atom, a C1-6 haloalkyl group, a C1-6 alkyl group or the like) or a salt thereof. The compound is useful as an anti-fungal agent.
    Type: Grant
    Filed: July 27, 2012
    Date of Patent: June 2, 2015
    Assignees: TAISHO PHARMACEUTICAL CO., LTD, TOYAMA CHEMICAL CO., LTD.
    Inventors: Tetsuya Tanikawa, Yasunobu Ushiki, Fumihito Ushiyama, Toru Yamaguchi, Naoya Ono, Keiko Yamamoto, Risa Tsuruta, Yasuhiro Tsutsui, Noritomo Fujino, Ayumu Mori
  • Publication number: 20140155597
    Abstract: The purpose of the present invention is to provide a novel compound which has an anti-fungal activity on pathogenic fungi including fungi belonging to the genus Candida, the genus Aspergillus and the genus Trichophyton and is useful as a medicinal agent.
    Type: Application
    Filed: July 27, 2012
    Publication date: June 5, 2014
    Applicants: TOYAMA CHEMICAL CO., LTD., TAISHO PHARMACEUTICAL CO., LTD.
    Inventors: Tetsuya Tanikawa, Yasunobu Ushiki, Fumihito Ushiyama, Toru Yamaguchi, Naoya Ono, Keiko Yamamoto, Risa Tsuruta, Yasuhiro Tsutsui, Noritomo Fujino, Ayumu Mori
  • Publication number: 20130072677
    Abstract: Provided is a novel compound which is useful as a pharmaceutical composition by inhibiting an LpxC activity, thereby exhibiting potent antimicrobial activity against gram-negative bacteria including Pseudomonas aeruginosa and its drug resistant bacteria.
    Type: Application
    Filed: April 20, 2011
    Publication date: March 21, 2013
    Applicants: TOYAMA CHEMICAL CO., LTD., TAISHO PHARMACEUTICAL CO., LTD
    Inventors: Hajime Takashima, Risa Tsuruta, Tetsuya Yabuuchi, Yusuke Oka, Hiroki Urabe, Yoichiro Suga, Masato Takahashi, Fumito Uneuchi, Hironori Kotsubo, Muneo Shoji, Yasuko Kawaguchi