Abstract: A ground treatment apparatus for loosening the ground, in particular in the case of ground with grass growth, comprising a support device and a holding device that is movably held thereon, on which a plurality of injection elements are held, a lifting device, by way of which the injection elements are insertable into the ground and are extractable therefrom, and a fluid provisioning device that comprises at least one reservoir for fluid, which can be supplied with fluid for intermediate storage and which is directly or indirectly in fluidic connection with a plurality of injection elements. In order to provide such a ground treatment apparatus that has a more compact design, it is proposed, in accordance with the invention, that the support device and/or the holding device comprise at least one frame made of interconnected structural elements, wherein the at least one reservoir forms a structural element of the frame.

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system for transferring a thermally conditioned substrate to the substrate table, wherein the substrate table and the thermal conditioning unit are arranged inside the compartment of the lithographic apparatus, at least during a transfer of the thermally conditioned substrate from the thermal conditioning unit to the substrate table.

Abstract: A system for data entry includes a form module, where the form module includes at least one form having multiple fields and the form module is configured to receive data into the fields. Each of the fields is user selectable to set a default value and each of the fields is user selectable for removal from display in a form view. The system includes a default value module, where the default value module includes a default value list, which includes the user selected fields having both a default value and user selected for removal from display in the form view. The system includes a display module that is configured to display the form view, where the form view displays the fields for data entry and collapses the list of displayed fields to remove the fields on the default value list from display in the form view.

Abstract: A system for data entry includes a form module, where the form module includes at least one form having multiple fields and the form module is configured to receive data into the fields. Each of the fields is user selectable to set a default value and each of the fields is user selectable for removal from display in a form view. The system includes a default value module, where the default value module includes a default value list, which includes the user selected fields having both a default value and user selected for removal from display in the form view. The system includes a display module that is configured to display the form view, where the form view displays the fields for data entry and collapses the list of displayed fields to remove the fields on the default value list from display in the form view.

Abstract: A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate; a compartment configured to receive the substrate table; a thermal conditioning unit arranged to receive a substrate to be exposed and thermally condition the substrate; and a transfer system for transferring a thermally conditioned substrate to the substrate table, wherein the substrate table and the thermal conditioning unit are arranged inside the compartment of the lithographic apparatus, at least during a transfer of the thermally conditioned substrate from the thermal conditioning unit to the substrate table.

Abstract: A breath-actuated inhaler for delivery of a medicament by inhalation from a canister (2) which is compressible to deliver a dose of medicament. The inhaler comprises a housing (1) for holding a canister (2) and including a mouthpiece (5) for delivery of a dose of medicament from a canister (2) held in the housing; and an actuation mechanism (6) for compressing a canister (2) held in the housing (1) in response to inhalation at the mouthpiece (5). The housing includes two separable portions (19, 20). The first housing portion (19) mounts the actuation mechanism (6). The second housing portion (20) houses the mouthpiece (5) and a duct (24) shaped to direct an inhalation flow from the mouthpeice (5) to the first housing portion (19) for triggering the actuation mechanism (6). The duct (24) and the mouthpiece (5) are integrally formed and separable from the second housing portion (20).

Abstract: An installation and method for the conversion of thermal energy into mechanical energy. The installation includes at least two closed containers, a converter for the conversion of flow energy into mechanical energy, a switching system as well as a supply line, a discharge line and a heat supply system. Each time, the converter is supplied with a fluid under high pressure and temperature from one container and the temperature-reduced fluid is then collected in another container. As soon as the other container is filled and the first container becomes empty, these containers are exchanged or replaced by other containers.

Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.

Abstract: A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Abstract: The invention relates to a tourbillon mechanism comprising at least one platform, a balance arranged on the face of the platform(s), an escapement mechanism being arranged on the other face.

Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.

Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.

Abstract: A breath-actuated inhaler for delivery of a medicament by inhalation from a canister (2) which is compressible to deliver a dose of medicament. The inhaler comprises a housing (1) for holding a canister (2) and including a mouthpiece (5) for delivery of a dose of medicament from a canister (2) held in the housing; and an actuation mechanism (6) for compressing a canister (2) held in the housing (1) in response to inhalation at the mouthpiece (5). The housing includes two separable portions (19, 20). The first housing portion (19) mounts the actuation mechanism (6). The second housing portion (20) houses the mouthpiece (5) and a duct (24) shaped to direct an inhalation flow from the mouthpeice (5) to the first housing portion (19) for triggering the actuation mechanism (6). The duct (24) and the mouthpiece (5) are integrally formed and separable from the second housing portion (20).