Abstract: A composite for the cathode of Li-ion battery is disclosed and comprises: a base active material represented by Li1+a(N1?b?cCobMnc)O2 wherein 0?a?0.5, 0?b?0.4, 0?c?0.6, with b+c<1; and a coating on the base active material comprising a phase containing the components B2O3 or SnBxO2+3x/2?y/2Fy; wherein 0?x?5, 0<y<4+3x; wherein relative to the total amount of the base active material, the weight percentage of B element is not more than 2 wt %, the weight percentage of Sn element is not more than 5 wt %. A method for making a composite is disclosed and includes: mixing the base active material with the phase components and/or a precursor for the phase components; and firing the mixture obtained. The application provides a high capacity, long cycle life cathode material that is stabilized at high voltages.

Abstract: The present invention relates to Li-ion cells area, particularly relates to lithium source material and preparation method thereof and use in Li-ion cells. Wherein the lithium source material which is represented by a formula LiyFe1-xMxO4Rz, wherein M represents one or more of transition metal elements, R represents halogen element, 0?x?0.9, 0<z?0.2, 3.5<y?[5(1?x)+6x]. The lithium source material of the present invention which is lithium deficient relative to its stoichiometric lithium formulation, is a lithium source additive material to the cathode material for Li-ion cells, and exhibits high capacity and high stability.

Abstract: A composite for the cathode of Li-ion battery is disclosed and comprises: a base active material represented by Li1+a(N1-b-cCobMnc)O2 wherein 0?a?0.5, 0?b?0.4, 0?c?0.6, with b+c<1; and a coating on the base active material comprising a phase containing the components B2O3 or SnBxO2+3x/2-y/2Fy; wherein 0?x?5, 0<y<4+3x; wherein relative to the total amount of the base active material, the weight percentage of B element is not more than 2 wt %, the weight percentage of Sn element is not more than 5 wt %. A method for making a composite is disclosed and includes: mixing the base active material with the phase components and/or a precursor for the phase components; and firing the mixture obtained. The application provides a high capacity, long cycle life cathode material that is stabilized at high voltages.

Abstract: The present invention relates to Li-ion cells area, particularly relates to lithium source material and preparation method thereof and use in Li-ion cells. Wherein the lithium source material which is represented by a formula LiyFe1-xMxO4Rz, wherein M represents one or more of transition metal elements, R represents halogen element, 0?x?0.9, 0<z?0.2, 3.5<y?[5(1?x)+6x]. The lithium source material of the present invention which is lithium deficient relative to its stoichiometric lithium formulation, is a lithium source additive material to the cathode material for Li-ion cells, and exhibits high capacity and high stability.

Abstract: A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust conduit which is an operative responsive to the monitoring system, and a source of second gas to be mixed with the effluent gas diverted from the abatement unit when the bypass valve is operating in a bypass mode to provide a mixed gas having a flammability lower than the effluent gas. Methods of the invention as well as numerous other aspects are provided.

Abstract: A method for abating effluent from an electronic device manufacturing process is provided, including abating the effluent in a thermal abatement tool to form abated effluent; determining whether the abated effluent contains one or more chemical species of interest; and changing one or more operating parameters of the thermal abatement tool based upon the determination. Numerous other embodiments are provided.

Abstract: A method for operating one or more electronic device manufacturing systems is provided, including the steps 1) performing a series of electronic device manufacturing process steps with a process tool, wherein the process tool produces effluent as a byproduct of performing the series of process steps; 2) abating the effluent with an abatement tool; 3) supplying an abatement resource to the abatement tool from a first abatement resource supply; 4) changing an abatement resource supply from the first abatement resource supply to a second abatement resource supply, wherein changing the abatement resource supply comprises: i) interrupting a flow of the abatement resource from the first abatement resource supply; and ii) beginning a flow of the abatement resource from the second abatement resource supply; and 5) continuing to perform the series of process steps with the process tool, while changing, and after changing, the abatement resource supply.

Abstract: A flame sensor apparatus for use with a flame heated thermal abatement reactor is provided, including a flame sensor adapted to sense a flame within the thermal abatement reactor; and a shutter adapted to selectively block the transmission of radiation from the flame to the flame sensor.

Abstract: A thermal reactor for use during the abatement of a semiconductor manufacturing process is provided, including a thermal reaction unit having: an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked porous sections; at least one gas inlet in fluid communication with the central chamber and adapted to introduce gaseous waste stream to the central chamber; a thermal mechanism positioned within the central chamber and adapted to decompose the gaseous waste stream within the central chamber, thereby forming reaction products; and a fluid delivery system adapted to provide a fluid to the central chamber through the interior porous wall at a sufficient force to reduce deposition of reaction products on an inner surface of the interior porous wall of the central chamber; wherein at least one of the porous sections has one or more of: a property that varies within the porous section; and a property that differs from a property of at least one other porous se

Abstract: Systems, apparatus and methods are provided involving a reduced-temperature wet scrubbing system adapted to scrub effluent gases within an abatement system. The reduced-temperature wet scrubbing system may include a wet scrubber adapted to be operated within a range of reduced temperatures and a cooling system adapted to maintain the wet scrubber within the range of reduced temperatures, which is below 23° C. The cooling system may include a coolant, preferably chilled water, adapted to cool the wet scrubber. The wet scrubbing system further may include an indication device, such as a temperature sensor, to indicate whether the wet scrubber is within the temperatures range. A controller in communication with the indication device may be provided to control the cooling system. In addition, the wet scrubbing system may include baffles and nozzles spraying chilled mist along a path of the effluent gas between an abatement tool and the wet scrubber.

Abstract: In some aspects, an apparatus for abating effluent from an electronic device manufacturing process tool is provided, including: a reaction chamber adapted to receive an effluent; and a reagent heating apparatus in fluid connection with the reaction chamber; wherein the reagent heating apparatus is adapted to heat a reagent and to introduce the heated reagent into a heated reagent reaction zone of the reaction chamber; and wherein the reaction chamber is further adapted to mix the effluent and the heated reagent in the heated reagent reaction zone. Other apparatus and methods are disclosed.

Abstract: In one aspect, a method of forming a silicon layer on a substrate is provided, including the steps providing a substrate; and introducing hydrogen and silane into a chamber containing the substrate such that a layer of silicon is deposited on the substrate; wherein the silane is less than about 99.999% pure. Numerous other aspects are provided.

Abstract: A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust conduit which is an operative responsive to the monitoring system, and a source of second gas to be mixed with the effluent gas diverted from the abatement unit when the bypass valve is operating in a bypass mode to provide a mixed gas having a flammability lower than the effluent gas. Methods of the invention as well as numerous other aspects are provided.

Abstract: An abatement apparatus for introducing fuel into an electronic device manufacturing effluent abatement tool, including: a manifold; a fuel source adapted to supply fuel to the manifold through a fuel conduit; and a plurality of nozzles adapted to receive fuel from the manifold; wherein the manifold is adapted to supply fuel to the nozzles at a fuel velocity greater than a flame velocity.

Abstract: An abatement system is provided, including an abatement unit adapted to abate effluent using ambient air; and an ambient air delivery system in fluid communication with the abatement unit and adapted to deliver ambient air to the abatement unit; wherein the ambient air delivery system allows sufficient ambient air to flow into the abatement unit to abate the effluent without compressed air. Numerous other aspects are provided.

Abstract: A method for abating effluent from an electronic device manufacturing process is provided, including abating the effluent in a thermal abatement tool to form abated effluent; determining whether the abated effluent contains one or more chemical species of interest; and changing one or more operating parameters of the thermal abatement tool based upon the determination. Numerous other embodiments are provided.

Abstract: A flame sensor apparatus for use with a flame heated thermal abatement reactor is provided, including a flame sensor adapted to sense a flame within the thermal abatement reactor; and a shutter adapted to selectively block the transmission of radiation from the flame to the flame sensor.

Abstract: An electronic device manufacturing tool effluent abatement system is provided, including a thermal abatement reactor adapted to abate an effluent stream, and an eductor adapted to receive the effluent stream from the thermal abatement reactor. Numerous other embodiments are provided.

Abstract: A method of developing an integrated abatement system is provided, including the steps: a) determining whether an integrated abatement system meets a destruction removal efficiency standard wherein the determination includes the steps: i) operating an electronic device manufacturing process tool using a best known method, whereby effluent containing a target species is produced; ii) abating the target species to form abated effluent, using an abatement system which is coupled to the process tool; and iii) calculating a destruction removal efficiency for the target species; and b) modifying the abatement system by altering at least one of a design parameter and an operating parameter of the abatement system to improve the destruction removal efficiency. Numerous other aspects are provided.

Abstract: The present invention provides systems, methods, and apparatus for abating effluent from an electronic device manufacturing system using cogeneration. The invention includes a pump adapted to couple to a processing chamber and adapted to draw effluent from the processing chamber; a reaction chamber coupled to the pump and adapted to receive the effluent from the pump; and a turbine coupled to the reaction chamber and adapted to be driven by combustion gases from the reaction chamber. The turbine is adapted to generate power which is applied to operate the pump. Numerous additional aspects are disclosed.