Patents by Inventor Robert Allen David

Robert Allen David has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-topcoating resist for photolithography
    Patent number: 8945808
    Abstract: Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the resist composition is also disclosed.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: February 3, 2015
    Assignee: International Business Machines Corporation
    Inventors: Robert Allen David, Phillip Joe Brock, Carl E Larson, Daniel Paul Sanders, Ratnam Sooriyakumaran, Linda Karin Sundberg, Hoa D Truong, Gregory Michael Wallraff
  • Topcoat material and use thereof in immersion lithography processes
    Patent number: 7521172
    Abstract: Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 ?/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip. Also disclosed is a method of forming a pattern in the material layer of the coated substrate.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: April 21, 2009
    Assignee: International Business Machines Corporation
    Inventors: Robert Allen David, Phillip Joe Brock, Sean David Burns, Dario Leonardo Goldfarb, David Medeiros, Dirk Pfeiffer, Matt Pinnow, Ratnam Sooriyakumaran, Linda Karin Sundberg