Abstract: A method includes adding a coating on a substrate, wherein the coating is a protective coating for the substrate and adding a chemistry to an outer portion or surface of the coating on the substrate. The chemistry is configured to better facilitate a creation of a chemical bond between the coating and a second layer to be applied to the coating.

Abstract: An automated masking system includes a substrate loading apparatus designed to hold a plurality of substrates, a first masking material application station designed to automatically apply a first masking material to a portion of the substrate, and a second masking material application station designed to automatically apply a second masking material to a portion of the substrate, the second masking material being different than the first masking material. The system includes a first dispensing apparatus and a second dispensing apparatus that move relative to the substrate in a repeatable motion. The substrate moves automatically from the first masking material application station to the second masking material application station.

Abstract: A system for plasma etching or ashing a coating on a substrate includes a plasma chamber, a second electrode, a plasma source coupled to the plasma chamber, a substrate including a coating, and a plasma mask including at least one aperture. The plasma chamber includes a first electrode. The plasma mask is configured to cover the substrate while exposing selected surfaces of the substrate and coating through the at least one aperture. The first electrode and the second electrode are configured to initiate and maintain a plasma within the plasma chamber. The plasma source includes a gas.

Abstract: An automated masking system includes a substrate loading apparatus designed to hold a plurality of substrates, a first masking material application station designed to automatically apply a first masking material to a portion of the substrate, and a second masking material application station designed to automatically apply a second masking material to a portion of the substrate, the second masking material being different than the first masking material. The system includes a first dispensing apparatus and a second dispensing apparatus that move relative to the substrate in a repeatable motion. The substrate moves automatically from the first masking material application station to the second masking material application station.