Patents by Inventor Robert C. Carr

Robert C. Carr has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100025955
    Abstract: A foldable stair assembly for a vehicle which is carried by a trailer hitch receiver in the vehicle and wherein the stairs include independently retractable stair riser extender portions which serve to contact the ground to stabilize the stairs against the ground, and wherein the retractable stair portions can adjust for uneven or sloping ground. A piston or other assistance member aids in raising and lowering the stairs.
    Type: Application
    Filed: July 30, 2009
    Publication date: February 4, 2010
    Inventor: Robert C. Carr, JR.
  • Patent number: 5891107
    Abstract: A personal hygiene system includes a cabinet, a cover hingedly attached to said cabinet, a fluid bottle removably attachable to the cabinet, a hose attached to the fluid bottle, and at least one personal hygiene accessory attached to said hose. A plurality of flexible tabs are formed on the back side of the interior of the cabinet for releasably holding the fluid bottle. Optionally, a quick-connector release may be used to connect the hose and the fluid bottle. A plurality of tabs are provided in an array about the fluid bottle for releasably receiving the tube. One or more holders are preferably formed on the back wall of the cabinet for releasably receiving a personal hygiene accessory.
    Type: Grant
    Filed: April 18, 1997
    Date of Patent: April 6, 1999
    Inventor: Robert C. Carr
  • Patent number: 5167762
    Abstract: A method to anisotropically etch an oxide/poly/oxide or an oxide/poly/oxide sandwich structure on a silicon wafer substrate in situ, that is, using a single parallel plate plasma reactor chamber and a single inert cathode, with a variable gap between cathode and anode. This method has an oxide etch step and a silicide/poly etch step. In the poly removal step, helium is added to improve etch uniformity. The pressure, power, and various gas quantities are balanced to produce the fastest etch rates while preserving selectivity. The fully etched sandwich structure has a vertical profile at or near 90.degree. from horizontal.
    Type: Grant
    Filed: January 2, 1991
    Date of Patent: December 1, 1992
    Assignee: Micron Technology, Inc.
    Inventors: Robert C. Carr, David A. Cathey