Patents by Inventor Robert F. Antrim

Robert F. Antrim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical mechanical polishing pad
    Patent number: 7438636
    Abstract: A chemical mechanical polishing pad is suitable for polishing at least one of semiconductor, optical and magnetic substrates. The polishing pad has a high modulus component forming a continuous polymeric matrix and an impact modifier within the continuous polymeric matrix. The high modulus component has a modulus of at least 100 MPa. The impact modifier includes a low modulus component having a modulus of at least one order of magnitude less than the high modulus component that increases the impact resistance of the polishing pad.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: October 21, 2008
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Mary Jo Kulp, David B. James, Robert F. Antrim
  • Chemical mechanical polishing pad
    Publication number: 20080153395
    Abstract: A chemical mechanical polishing pad is suitable for polishing at least one of semiconductor, optical and magnetic substrates. The polishing pad has a high modulus component forming a continuous polymeric matrix and an impact modifier within the continuous polymeric matrix. The high modulus component has a modulus of at least 100 MPa. The impact modifier includes a low modulus component having a modulus of at least one order of magnitude less than the high modulus component that increases the impact resistance of the polishing pad.
    Type: Application
    Filed: December 21, 2006
    Publication date: June 26, 2008
    Inventors: Mary Jo Kulp, David B. James, Robert F. Antrim