Patents by Inventor Robert FINLAY

Robert FINLAY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Uniformity control of metal-based photoresists
    Patent number: 10996564
    Abstract: An EUV photoresist composition includes paramagnetic particles that are adapted to block EUV radiation. The magnetic manipulation of the paramagnetic particles within a deposited layer of EUV photoresist can beneficially impact focus control and the achievable line width roughness during subsequent photolithographic processing. A spin-coating apparatus for dispensing the EUV photoresist composition onto a substrate includes a plurality of concentric electromagnets located beneath the substrate that influence the distribution of the paramagnetic particles in the photoresist layer.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: May 4, 2021
    Assignee: GLOBALFOUNDRIES U.S. INC.
    Inventors: Robert Finlay, Erik Robert Hosler, Sheldon Meyers, Scott Kenny
  • UNIFORMITY CONTROL OF METAL-BASED PHOTORESISTS
    Publication number: 20190212651
    Abstract: An EUV photoresist composition includes paramagnetic particles that are adapted to block EUV radiation. The magnetic manipulation of the paramagnetic particles within a deposited layer of EUV photoresist can beneficially impact focus control and the achievable line width roughness during subsequent photolithographic processing. A spin-coating apparatus for dispensing the EUV photoresist composition onto a substrate includes a plurality of concentric electromagnets located beneath the substrate that influence the distribution of the paramagnetic particles in the photoresist layer.
    Type: Application
    Filed: January 11, 2018
    Publication date: July 11, 2019
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Robert FINLAY, Erik Robert HOSLER, Sheldon MEYERS, Scott KENNY