Patents by Inventor Robert-Han Munnig Schmidt
Robert-Han Munnig Schmidt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20080057440Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.Type: ApplicationFiled: August 30, 2006Publication date: March 6, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Catharinus Hubertus Mulkens, Robert-Han Munnig Schmidt
-
Publication number: 20070242246Abstract: A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.Type: ApplicationFiled: April 10, 2007Publication date: October 18, 2007Applicant: ASML Netherlands B.V.Inventors: Cheng-Qun GUI, Pieter De Jager, Robert-Han Munnig Schmidt
-
Patent number: 7248339Abstract: A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.Type: GrantFiled: July 1, 2004Date of Patent: July 24, 2007Assignee: ASML Netherlands B.V.Inventors: Gerard Van Schothorst, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters
-
Patent number: 7242458Abstract: A system and method allow for more than one substrate to be simultaneously moved and/or positioned on a support table. In one example, this is accomplished through use of a frame that either supports or separates one or more substrates for either transport or positioning on a support table. In another example, this is accomplished through use of spacers on a support table, which are used to properly position one or more substrates. In yet another example, this is accomplished through use of a robot placing one or more substrates on the support table.Type: GrantFiled: March 1, 2005Date of Patent: July 10, 2007Assignee: ASML Netherlands B.V.Inventor: Robert-Han Munnig Schmidt
-
Publication number: 20070133007Abstract: A lithographic apparatus comprises a topography measurement device, a patterning device, and a corrective device. The topography measurement device measures a topography of at least one mechanical element of a patterning device. The patterning device comprises an array of individually controllable mechanical elements that are arranged to impart a pattern to a radiation beam. The corrective device corrects a mechanical property of the at least one mechanical element on the basis of information obtained by the topography measurement device.Type: ApplicationFiled: December 14, 2005Publication date: June 14, 2007Applicant: ASML Netherlands B.V.Inventor: Robert-Han Munnig Schmidt
-
Patent number: 7202939Abstract: A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.Type: GrantFiled: December 22, 2004Date of Patent: April 10, 2007Assignee: ASML Netherlands B.V.Inventors: Cheng-Qun Gui, Pieter Willem Herman De Jager, Robert-Han Munnig Schmidt
-
Patent number: 7110086Abstract: A movable stage system capable of operating in a lithographic apparatus, is presented. The movable stage system includes a base, a platform that is movable relative to the base, a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform, and a drive mechanism configured to move the platform and the balance mass relative to the base. The drive mechanism comprises at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction, and a driving device configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.Type: GrantFiled: June 10, 2004Date of Patent: September 19, 2006Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Robert-Han Munnig Schmidt
-
Publication number: 20060139609Abstract: A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.Type: ApplicationFiled: December 29, 2004Publication date: June 29, 2006Applicant: ASML Netherlands BVInventors: Johannes Baselmans, Anastasius Bruinsma, Pieter De Jager, Robert-Han Munnig Schmidt, Henri Vink
-
Publication number: 20060139602Abstract: A system and method allow for more than one substrate to be simultaneously moved and/or positioned on a support table. In one example, this is accomplished through use of a frame that either supports or separates one or more substrates for either transport or positioning on a support table. In another example, this is accomplished through use of spacers on a support table, which are used to properly position one or more substrates. In yet another example, this is accomplished through use of a robot placing one or more substrates on the support table.Type: ApplicationFiled: March 1, 2005Publication date: June 29, 2006Inventor: Robert-Han Munnig Schmidt
-
Publication number: 20060132750Abstract: A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.Type: ApplicationFiled: December 22, 2004Publication date: June 22, 2006Applicant: ASML Netherlands B.V.Inventors: Cheng-Qun Gui, Pieter De Jager, Robert-Han Munnig Schmidt
-
Publication number: 20060119825Abstract: A lithographic apparatus for reducing the visibility of artifacts in the pattern is provided. The apparatus comprises an illumination system, a patterning device, a projecting system, and a modulating device. The illumination system supplies a beam of radiation. The patterning device patterns the beam. The projection system projects the beam onto a target portion of a substrate. The modulating device modulates the beam to impart the pattern with a modulation scheme.Type: ApplicationFiled: December 2, 2004Publication date: June 8, 2006Inventor: Robert-Han Munnig Schmidt
-
Patent number: 7016020Abstract: A positioning device for positioning an object is presented. The positioning device includes a first drive unit and a second drive unit for positioning the object. The first drive unit has a first part connected to the object and a second part connected to a first part of the second drive unit. The positioning device further includes a permanent magnet system constructed and arranged to provide at least part of the force for accelerating or decelerating the object.Type: GrantFiled: May 17, 2004Date of Patent: March 21, 2006Assignee: ASML Netherlands B.V.Inventor: Robert-Han Munnig Schmidt
-
Patent number: 7016016Abstract: A lithographic apparatus patterns a projection beam of radiation using a patterning system. A substrate is supported on a substrate table and the patterned beam is projected onto the substrate on the table. A substrate displacement control system displaces the substrate relative to the table and the projection system in a predetermined direction, such that the patterned beam is scanned across the substrate. The position of the substrate relative to the table and the patterned beam is determined by the displacement control system. The displacement control system comprises at least one component that is displaceable with the substrate and a positioning apparatus to place that component in contact with the substrate, such that the component is displaced with the substrate as the projection beam is scanned across the substrate and such that the component is lifted from the substrate after the projection beams has been scanned across the substrate.Type: GrantFiled: June 25, 2004Date of Patent: March 21, 2006Assignee: ASML Netherlands BVInventors: Robert-Han Munnig Schmidt, Pieter Willem Herman De Jager, Theodorus Leonardus Van Den Akker
-
Patent number: 7006199Abstract: A positioning device for positioning an object inside a lithographic apparatus is described. The positioning device includes a first drive unit and a second drive unit for positioning the object. The first drive unit has a first part connected to the object and a second part connected to a first part of the second drive unit. The positioning device further includes a permanent magnet system constructed and arranged to provide at least part of the force for accelerating or decelerating the object.Type: GrantFiled: March 10, 2004Date of Patent: February 28, 2006Assignee: ASML Netherlands B.V.Inventor: Robert-Han Munnig Schmidt
-
Publication number: 20050157285Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.Type: ApplicationFiled: May 19, 2004Publication date: July 21, 2005Applicant: ASML Netherlands B.V.Inventors: Gerard Schothorst, Fransiscus Van Deuren, Jan Eijk, Erik Loopstra, Robert-Han Munnig Schmidt, Felix Peters
-
Publication number: 20050083496Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.Type: ApplicationFiled: August 25, 2004Publication date: April 21, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Michel Dansberg, Sebastiaan Cornelissen, Henrikus Cox, Robert Van Diesen, Nicolaas Kemper, Robert-Han Munnig-Schmidt, Harmen Van Der Schoot, Rob Jansen
-
Publication number: 20050041233Abstract: A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.Type: ApplicationFiled: July 1, 2004Publication date: February 24, 2005Applicant: ASML Netherlands B.V.Inventors: Gerard Van Schothorst, Jan Van Eijk, Erik Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peeters
-
Patent number: 6498350Abstract: In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.Type: GrantFiled: December 19, 2000Date of Patent: December 24, 2002Assignee: ASML Netherlands B.V.Inventors: Yim Bun P. Kwan, Engelbertus A. F. van de Pasch, Andreas B. G. Ariens, Edwin J. Buis, Jan F. Hoogkamp, Robert-Han Munnig Schmidt
-
Publication number: 20010004105Abstract: In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.Type: ApplicationFiled: December 19, 2000Publication date: June 21, 2001Inventors: Yim Bun P. Kwan, Engelbertus A.F. van de Pasch, Andreas B.G. Ariens, Edwin J. Buis, Jan F. Hoogkamp, Robert-Han Munnig Schmidt