Abstract: A mask forming system for protecting a structure and a method of forming a mask for protecting the structure includes a masking material having a first layer, a second layer, and a third layer sandwiched together. The masking material is unrolled across a platform and a plurality of features are generated in the masking material, wherein the features include printing, kiss cutting, and double-kiss cutting the masking material. Data is printed on the first layer of the masking material. The first layer of the masking material is kiss cut. The second layer of the masking material is double-kiss cut. The third layer remains uncut and unprinted on during the formation of the mask. The masking material remains in the same orientation during printing and kiss cutting of the first layer, and the masking material remains in the same orientation during double-kiss cutting of the second layer.

Abstract: A wardrobe frame is described which comprises a hanging section and a shelf section formed from elongated connection pieces and poles inserted into holes at the ends thereof. The poles in the back of the shelf section have transversely disposed holes therein, and the poles in the front of the shelf section have obliquely disposed holes therein. The top shelf has a linearly extending prong at each of its back corners. The lower shelves have an upwardly extending prong at each of their back corners. All of the shelves have a downwardly extending prong at each of their front corners. The linearly extending prongs and the upwardly extending prongs fit into the transversely disposed holes, and the downwardly extending prongs fit into the obliquely disposed holes.