Patents by Inventor Robert K. Barr

Robert K. Barr has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF CLEANING AND MICRO-ETCHING SEMICONDUCTOR WAFERS
    Publication number: 20110250762
    Abstract: A method of simultaneously cleaning inorganic and organic contaminants from semiconductor wafers and micro-etching the semiconductor wafers. After the semiconductor wafers are cut or sliced from ingots, they are contaminated with cutting fluid as well as metal and metal oxides from the saws used in the cutting process. Aqueous alkaline cleaning and micro-etching solutions containing alkaline compounds and mid-range alkoxylates are used to simultaneously clean and micro-etch the semiconductor wafers.
    Type: Application
    Filed: October 14, 2010
    Publication date: October 13, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Raymond Chan
  • Imaging methods
    Patent number: 7977026
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: July 12, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • METHOD OF TEXTURING SEMICONDUCTOR SUBSTRATES
    Publication number: 20110151671
    Abstract: Semiconductor substrates are cleaned and subsequently oxidized. After the semiconductor is oxidized it is textured to reduce incident light reflectance. The textured semiconductors can be used in the manufacture of photovoltaic devices.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 23, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. BARR, Corey O' Connor
  • Texturing semiconductor substrates
    Patent number: 7955989
    Abstract: Semiconductors are textured with aqueous solutions containing non-volatile alkoxylated glycols, their ethers and ether acetate derivatives having molecular weights of 170 or greater and flash points of 75° C. or greater. The textured semiconductors can be used in the manufacture of photovoltaic devices.
    Type: Grant
    Filed: September 22, 2010
    Date of Patent: June 7, 2011
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • MELTS
    Publication number: 20110086314
    Abstract: A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition attenuates light in at least the UV range and is water-soluble or water-dispersible.
    Type: Application
    Filed: December 17, 2010
    Publication date: April 14, 2011
    Applicant: Rohm and Haas Electronic Material LLC
    Inventors: Edgardo ANZURES, Robert K. Barr
  • TEXTURING SEMICONDUCTOR SUBSTRATES
    Publication number: 20110081742
    Abstract: Semiconductors are textured with aqueous solutions containing non-volatile alkoxylated glycols, their ethers and ether acetate derivatives having molecular weights of 170 or greater and flash points of 75° C. or greater. The textured semiconductors can be used in the manufacture of photovoltaic devices.
    Type: Application
    Filed: September 22, 2010
    Publication date: April 7, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • Method of cleaning semiconductor wafers
    Publication number: 20100248494
    Abstract: A method of cleaning semiconductor wafers using an acid cleaner followed by an alkaline cleaner to clean contaminants from the materials is provided. The acid cleaner removes substantially all of the metal contaminants while the alkaline cleaner removes substantially all of the non-metal contaminants, such as organics and particulate material.
    Type: Application
    Filed: January 13, 2010
    Publication date: September 30, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Raymond Chan, Matthew L. Moynihan
  • Imaging methods
    Patent number: 7749685
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: July 6, 2010
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Inhibiting background plating
    Publication number: 20100029077
    Abstract: Methods include selectively depositing a phase change resist having high light transmittance onto a dielectric to form a pattern, etching away portions of the dielectric not covered by the resist and depositing a metal seed layer on the etched portions of the dielectric. A metal layer is then deposited on the metal seed layer by light induced plating.
    Type: Application
    Filed: July 31, 2009
    Publication date: February 4, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Hua Dong, Thomas C. Sutter
  • Mask
    Patent number: 7632621
    Abstract: A mask is described for forming an image on a substrate. The mask may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the mask. The mask and portions of the radiant energy sensitive material are removed using a suitable aqueous base developer. The mask is composed of aqueous base soluble or dispersible polymers and light-blocking agents.
    Type: Grant
    Filed: December 23, 2004
    Date of Patent: December 15, 2009
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Edgardo Anzures, Robert K. Barr, Thomas C. Sutter
  • Imaging methods
    Patent number: 7615335
    Abstract: An imaging method is disclosed. An imaging composition is coated on a work piece followed by applying a sufficient amount of energy from a 3-D imaging system to form an image on the coated work piece. The image may be a logo or marker for alignment of parts.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: November 10, 2009
    Assignee: Rohm & Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut
  • Melts
    Publication number: 20090214980
    Abstract: A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition attenuates light in at least the UV range and is water-soluble or water-dispersible.
    Type: Application
    Filed: April 28, 2009
    Publication date: August 27, 2009
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Edgardo Anzures, Robert K. Barr
  • Functional polymer
    Patent number: 7364834
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: April 29, 2008
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Dry film photoresist
    Patent number: 7323290
    Abstract: A dry film photoresist includes a functional polymer. The functional polymer has ?,?-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.
    Type: Grant
    Filed: March 18, 2003
    Date of Patent: January 29, 2008
    Assignee: Eternal Technology Corporation
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Imaging composition and method
    Patent number: 7270932
    Abstract: Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be used in methods of marking.
    Type: Grant
    Filed: February 6, 2004
    Date of Patent: September 18, 2007
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, James T. Fahey, Corey O'Connor, James G. Shelnut, John J. Piskorski
  • Imaging compositions and methods
    Patent number: 7223519
    Abstract: Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed from the work piece by peeling.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: May 29, 2007
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • Functional polymer
    Patent number: 7148265
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Grant
    Filed: March 18, 2003
    Date of Patent: December 12, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Imaging compositions and methods
    Patent number: 7144676
    Abstract: Imaging compositions and methods of using the compositions are disclosed. The imaging compositions are sensitive to low levels of energy such that upon application of the low levels of energy the compositions change color or shade. The compositions may be applied to a work piece to mark it and removed from the work piece by peeling.
    Type: Grant
    Filed: July 12, 2004
    Date of Patent: December 5, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Corey O'Connor
  • Photoresist processing aid and method
    Patent number: 6900003
    Abstract: A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: May 31, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Edgardo Anzures, Daniel E. Lundy, Robert K. Barr, Corey O'Connor
  • Residue and scum reducing composition and method
    Patent number: 6887654
    Abstract: A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.
    Type: Grant
    Filed: May 7, 2003
    Date of Patent: May 3, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Daniel E. Lundy, Robert K. Barr, Edgardo Anzures, Edward J. Brady, James G. Shelnut