Patents by Inventor Robert M. Blomquist
Robert M. Blomquist has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11858252Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: GrantFiled: September 7, 2022Date of Patent: January 2, 2024Assignee: DUPONT ELECTRONICS, INC.Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
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Patent number: 11679531Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is prepared by extruding a compounded photopolymerizable composition followed by exposure to UV light.Type: GrantFiled: October 13, 2021Date of Patent: June 20, 2023Assignees: Rohm and Haas Electronic Materials CMP Holdings, Inc., DuPont Electronics, Inc.Inventors: Bainian Qian, Robert M. Blomquist, Lyla M. El-Sayed, Michael E. Mills, Kancharla-Arun Reddy, Bradley K. Taylor, Shijing Xia
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Publication number: 20230112228Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is a photopolymerizable composition containing a block copolymer, a UV curable acrylate, and a photoinitiator.Type: ApplicationFiled: October 13, 2021Publication date: April 13, 2023Inventors: Bainian QIAN, Robert M. BLOMQUIST, Lyla M. EL-SAYED, Michael E. MILLS, Kancharla-Arun REDDY, Bradley K. TAYLOR, Shijing XIA
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Publication number: 20230112598Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is prepared by extruding a compounded photopolymerizable composition followed by exposure to UV light.Type: ApplicationFiled: October 13, 2021Publication date: April 13, 2023Inventors: Bainian Qian, Robert M. Blomquist, Lyla M. El-Sayed, Michael E. Mills, Kancharla-Arun Reddy, Bradley K. Taylor, Shijing Xia
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Publication number: 20230001684Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: ApplicationFiled: September 7, 2022Publication date: January 5, 2023Inventors: Robert M Blomquist, BRADLEY K TAYLOR, JOHN STEPHEN LOCKE, MARK A HACKLER
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Patent number: 11465402Abstract: A photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and a process of making the photosensitive element are disclosed. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: GrantFiled: April 24, 2020Date of Patent: October 11, 2022Assignee: DUPONT ELECTRONICS, INC.Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
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Publication number: 20220016879Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; and, a process of making the photosensitive element. The printing form precursor includes a cover sheet, a layer of a photosensitive composition, and a digital layer, or infrared ablation layer, that is adjacent to a side of the photosensitive layer. A microcell patterned is embossed onto the infrared ablation layer or an overcoat/barrier layer on the infrared ablation layer. Since the microcell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer. The printing form precursor having the integrated microcell pattern layer facilitates the preparation of relief printing forms to have a print surface suitable for printing solids with uniform, dense coverage of ink.Type: ApplicationFiled: December 11, 2019Publication date: January 20, 2022Inventors: Robert M. Blomquist, Adrian Lungu
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Publication number: 20200254749Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: ApplicationFiled: April 24, 2020Publication date: August 13, 2020Inventors: Robert M. Blomquist, Bradley K. Taylor, John Stephen Locke, Mark A. Hackler
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Patent number: 10668711Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: GrantFiled: May 26, 2016Date of Patent: June 2, 2020Assignee: E I DU PONT DE NEMOURS AND COMPANYInventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
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Patent number: 9713919Abstract: The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.Type: GrantFiled: July 29, 2015Date of Patent: July 25, 2017Assignee: E I DU PONT DE NEMOURS AND COMPANYInventors: Robert M Blomquist, John Stephen Locke, Chi W Chiu
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Publication number: 20160355004Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.Type: ApplicationFiled: May 26, 2016Publication date: December 8, 2016Inventors: ROBERT M BLOMQUIST, BRADLEY K TAYLOR, JOHN STEPHEN LOCKE, MARK A HACKLER
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Publication number: 20150328878Abstract: The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.Type: ApplicationFiled: July 29, 2015Publication date: November 19, 2015Inventors: ROBERT M. BLOMQUIST, JOHN STEPHEN LOCKE, CHI W. CHIU
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Patent number: 9134612Abstract: The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.Type: GrantFiled: March 7, 2013Date of Patent: September 15, 2015Assignee: E I DU PONT DE NEMOURS AND COMPANYInventors: Robert M Blomquist, John Stephen Locke, Chi W Chiu
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Publication number: 20130255513Abstract: The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.Type: ApplicationFiled: March 7, 2013Publication date: October 3, 2013Applicant: E I DU PONT DE NEMOURS AND COMPANYInventors: ROBERT M. BLOMQUIST, John Stephen Locke, Chi W. Chiu
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Publication number: 20040249081Abstract: The invention provides polymeric optical materials that can be cured in air and have low optical loss in both the C-band and the L-band of the telecommunications spectrum. The polymeric materials are made by the free radical polymerization of an at least difunctional thiol compound with an at least difunctional ethylenically unsaturated compound wherein at least one of the thiol compound and the ethylenically unsaturated compound is at least partially halogenated. The compositions of this invention may be used to fabricate planar optical waveguides with low loss and low birefringence.Type: ApplicationFiled: April 29, 2004Publication date: December 9, 2004Inventor: Robert M. Blomquist
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Patent number: 6778753Abstract: The invention provides polymeric optical materials that can be cured in air and have low optical loss in both the C-band and the L-band of the telecommunications spectrum. The polymeric materials are made by the free radical polymerization of an at least difunctional thiol compound with an at least difunctional ethylenically unsaturated compound wherein at least one of the thiol compound and the ethylenically unsaturated compound is at least partially halogenated. The compositions of this invention may be used to fabricate planar optical waveguides with low loss and low birefringence.Type: GrantFiled: July 25, 2001Date of Patent: August 17, 2004Assignee: E. I. du Pont de Nemours and CompanyInventor: Robert M. Blomquist
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Patent number: 6684019Abstract: An optical signal device which is temperature sensitive and has at least one waveguide layer and at least one material incorporated into the device having a coefficient of thermal expansion of from about 20 to 200 ppm/°K sufficient to impart tensile stress to the waveguide layers as the temperature of the optical signal device changes.Type: GrantFiled: February 22, 2000Date of Patent: January 27, 2004Assignee: E.I. du Pont de Nemours and CompanyInventors: Robert A. Norwood, Louay Eldada, Shing Yin, Cathy Glass, Robert M. Blomquist
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Publication number: 20030055120Abstract: The invention provides polymeric optical materials that can be cured in air and have low optical loss in both the C-band and the L-band of the telecommunications spectrum. The polymeric materials are made by the free radical polymerization of an at least difunctional thiol compound with an at least difunctional ethylenically unsaturated compound wherein at least one of the thiol compound and the ethylenically unsaturated compound is at least partially halogenated. The compositions of this invention may be used to fabricate planar optical waveguides with low loss and low birefringence.Type: ApplicationFiled: July 25, 2001Publication date: March 20, 2003Inventor: Robert M. Blomquist