Patents by Inventor Robert M. Blomquist

Robert M. Blomquist has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11858252
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Grant
    Filed: September 7, 2022
    Date of Patent: January 2, 2024
    Assignee: DUPONT ELECTRONICS, INC.
    Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
  • Patent number: 11679531
    Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is prepared by extruding a compounded photopolymerizable composition followed by exposure to UV light.
    Type: Grant
    Filed: October 13, 2021
    Date of Patent: June 20, 2023
    Assignees: Rohm and Haas Electronic Materials CMP Holdings, Inc., DuPont Electronics, Inc.
    Inventors: Bainian Qian, Robert M. Blomquist, Lyla M. El-Sayed, Michael E. Mills, Kancharla-Arun Reddy, Bradley K. Taylor, Shijing Xia
  • Publication number: 20230112228
    Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is a photopolymerizable composition containing a block copolymer, a UV curable acrylate, and a photoinitiator.
    Type: Application
    Filed: October 13, 2021
    Publication date: April 13, 2023
    Inventors: Bainian QIAN, Robert M. BLOMQUIST, Lyla M. EL-SAYED, Michael E. MILLS, Kancharla-Arun REDDY, Bradley K. TAYLOR, Shijing XIA
  • Publication number: 20230112598
    Abstract: The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is prepared by extruding a compounded photopolymerizable composition followed by exposure to UV light.
    Type: Application
    Filed: October 13, 2021
    Publication date: April 13, 2023
    Inventors: Bainian Qian, Robert M. Blomquist, Lyla M. El-Sayed, Michael E. Mills, Kancharla-Arun Reddy, Bradley K. Taylor, Shijing Xia
  • Publication number: 20230001684
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Application
    Filed: September 7, 2022
    Publication date: January 5, 2023
    Inventors: Robert M Blomquist, BRADLEY K TAYLOR, JOHN STEPHEN LOCKE, MARK A HACKLER
  • Patent number: 11465402
    Abstract: A photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and a process of making the photosensitive element are disclosed. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Grant
    Filed: April 24, 2020
    Date of Patent: October 11, 2022
    Assignee: DUPONT ELECTRONICS, INC.
    Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
  • Publication number: 20220016879
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; and, a process of making the photosensitive element. The printing form precursor includes a cover sheet, a layer of a photosensitive composition, and a digital layer, or infrared ablation layer, that is adjacent to a side of the photosensitive layer. A microcell patterned is embossed onto the infrared ablation layer or an overcoat/barrier layer on the infrared ablation layer. Since the microcell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer. The printing form precursor having the integrated microcell pattern layer facilitates the preparation of relief printing forms to have a print surface suitable for printing solids with uniform, dense coverage of ink.
    Type: Application
    Filed: December 11, 2019
    Publication date: January 20, 2022
    Inventors: Robert M. Blomquist, Adrian Lungu
  • Publication number: 20200254749
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Application
    Filed: April 24, 2020
    Publication date: August 13, 2020
    Inventors: Robert M. Blomquist, Bradley K. Taylor, John Stephen Locke, Mark A. Hackler
  • Patent number: 10668711
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features, and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Grant
    Filed: May 26, 2016
    Date of Patent: June 2, 2020
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Robert M Blomquist, Bradley K Taylor, John Stephen Locke, Mark A Hackler
  • Patent number: 9713919
    Abstract: The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.
    Type: Grant
    Filed: July 29, 2015
    Date of Patent: July 25, 2017
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Robert M Blomquist, John Stephen Locke, Chi W Chiu
  • Publication number: 20160355004
    Abstract: The invention pertains to a photosensitive element, particularly a photopolymerizable printing form precursor; a method of preparing the photosensitive element to form a printing form for use in relief printing; and, a process of making the photosensitive element. The printing form precursor includes a layer of a photosensitive composition, a digital layer that is adjacent to a side of the photosensitive layer, and a cell pattern layer that is disposed between the photosensitive layer and the digital layer. The cell pattern layer includes a plurality of features in which each feature an area between 5 to 750 square microns and is composed of an ink that is opaque to actinic radiation and transparent to infrared radiation. Since the cell pattern layer is integral with the printing form precursor, digital imaging can occur rapidly with relatively low resolution optics to form a mask without needing to also form a microcell pattern of the digital layer.
    Type: Application
    Filed: May 26, 2016
    Publication date: December 8, 2016
    Inventors: ROBERT M BLOMQUIST, BRADLEY K TAYLOR, JOHN STEPHEN LOCKE, MARK A HACKLER
  • Publication number: 20150328878
    Abstract: The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.
    Type: Application
    Filed: July 29, 2015
    Publication date: November 19, 2015
    Inventors: ROBERT M. BLOMQUIST, JOHN STEPHEN LOCKE, CHI W. CHIU
  • Patent number: 9134612
    Abstract: The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: September 15, 2015
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Robert M Blomquist, John Stephen Locke, Chi W Chiu
  • Publication number: 20130255513
    Abstract: The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer.
    Type: Application
    Filed: March 7, 2013
    Publication date: October 3, 2013
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: ROBERT M. BLOMQUIST, John Stephen Locke, Chi W. Chiu
  • Publication number: 20040249081
    Abstract: The invention provides polymeric optical materials that can be cured in air and have low optical loss in both the C-band and the L-band of the telecommunications spectrum. The polymeric materials are made by the free radical polymerization of an at least difunctional thiol compound with an at least difunctional ethylenically unsaturated compound wherein at least one of the thiol compound and the ethylenically unsaturated compound is at least partially halogenated. The compositions of this invention may be used to fabricate planar optical waveguides with low loss and low birefringence.
    Type: Application
    Filed: April 29, 2004
    Publication date: December 9, 2004
    Inventor: Robert M. Blomquist
  • Patent number: 6778753
    Abstract: The invention provides polymeric optical materials that can be cured in air and have low optical loss in both the C-band and the L-band of the telecommunications spectrum. The polymeric materials are made by the free radical polymerization of an at least difunctional thiol compound with an at least difunctional ethylenically unsaturated compound wherein at least one of the thiol compound and the ethylenically unsaturated compound is at least partially halogenated. The compositions of this invention may be used to fabricate planar optical waveguides with low loss and low birefringence.
    Type: Grant
    Filed: July 25, 2001
    Date of Patent: August 17, 2004
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Robert M. Blomquist
  • Patent number: 6684019
    Abstract: An optical signal device which is temperature sensitive and has at least one waveguide layer and at least one material incorporated into the device having a coefficient of thermal expansion of from about 20 to 200 ppm/°K sufficient to impart tensile stress to the waveguide layers as the temperature of the optical signal device changes.
    Type: Grant
    Filed: February 22, 2000
    Date of Patent: January 27, 2004
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Robert A. Norwood, Louay Eldada, Shing Yin, Cathy Glass, Robert M. Blomquist
  • Publication number: 20030055120
    Abstract: The invention provides polymeric optical materials that can be cured in air and have low optical loss in both the C-band and the L-band of the telecommunications spectrum. The polymeric materials are made by the free radical polymerization of an at least difunctional thiol compound with an at least difunctional ethylenically unsaturated compound wherein at least one of the thiol compound and the ethylenically unsaturated compound is at least partially halogenated. The compositions of this invention may be used to fabricate planar optical waveguides with low loss and low birefringence.
    Type: Application
    Filed: July 25, 2001
    Publication date: March 20, 2003
    Inventor: Robert M. Blomquist