Abstract: Various methods involving a sequential, dual stage cure are described. The methods utilize a first stage UV cure which is sequentially followed by a second stage electron beam cure. An array of compositions are also described, many of which are acrylate based.

Abstract: An adhesive tape comprising a core layer comprising a foam and having a first surface and a second surface opposite the first surface. The adhesive tape also comprises a first adhesive layer disposed about the first surface. And, the adhesive tape also comprises a second adhesive layer disposed about the second surface. At least one of the first and second adhesive layers comprises a radiation curable rubber based adhesive. The tapes are suitable for bonding an article to a target substrate having a low surface energy and for bonding under a variety of atmospheric conditions including at elevated temperatures.

Abstract: The invention provides a polishing composition comprising fumed alumina, alpha alumina, silica, a nonionic surfactant, a metal chelating organic acid, and a liquid carrier. The invention further provides a method of chemically-mechanically polishing a substrate comprising contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, and abrading at least a portion of the substrate to polish the substrate.

Abstract: The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing low-k dielectric materials. The composition comprises a particulate abrasive material, at least one silicone-free nonionic surfactant comprising a hydrophilic portion and a lipophilic portion, at least one silicone-containing nonionic surfactant comprising a hydrophilic portion and a lipophilic portion, and an aqueous carrier therefor. A CMP method for polishing a low-k dielectric surface utilizing the composition is also disclosed.

Abstract: The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing low-k dielectric materials. The composition comprises a particulate abrasive material, at least one silicone-free nonionic surfactant comprising a hydrophilic portion and a lipophilic portion, at least one silicone-containing nonionic surfactant comprising a hydrophilic portion and a lipophilic portion, and an aqueous carrier therefor. A CMP method for polishing a low-k dielectric surface utilizing the composition is also disclosed.

Abstract: The invention provides a polishing composition comprising fumed alumina, alpha alumina, silica, a nonionic surfactant, a metal chelating organic acid, and a liquid carrier. The invention further provides a method of chemically-mechanically polishing a substrate comprising contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, and abrading at least a portion of the substrate to polish the substrate.

Abstract: Monofunctional polyfluorooxetane oligomers, polymers, and co-polymers are prepared by the cationic polymerization of fluorooxetane monomers with a monoalcohol. In addition to serving as an initiator, the monoalcohol can also serve as a solvent for the fluorooxetane or other monomers to produce oligomers, polymers, or copolymers having low cyclic content. Suitable comonomers generally include various cyclic ethers. The polyfluorooxetane oligomer, polymer, or copolymer having a single hydroxyl end group can be functionalized with a variety of compounds so as to yield a functional end group such as an acrylate, a methacrylate, an allylic, an amine, etc., with the functionalized oligomer or polymer being suitable for use in radiation curable or thermal curable coating compositions. These functionalized polymers can be copolymerized and cured to provide improvements in wetting and surface properties.

Abstract: Monofunctional polyfluorooxetane oligomers, polymers, and copolymers are prepared by the cationic polymerization of fluorooxetane monomers with a monoalcohol. In addition to serving as an initiator, the monoalcohol can also serve as a solvent for the fluorooxetane or other monomers to produce oligomers, polymers, or copolymers having low cyclic content. Suitable comonomers generally include various cyclic ethers. The polyfluorooxetane oligomer, polymer, or copolymer having a single hydroxyl end group can be functionalized with a variety of compounds so as to yield a functional end group such as an acrylate, a methacrylate, an allylic, an amine, etc., with the functionalized oligomer or polymer being suitable for use in radiation curable or thermal curable coating compositions. These functionalized polymers can be copolymerized and cured to provide improvements in wetting and surface properties.

Abstract: A method for preparing a substrate having an adherent, durable, flexible, and stain resistant layer. The layer is formed by applying a composition that includes (i) the reaction product of a polyester and a polyoxetane having at least one carboxylic acid end group and at least one pendant —CH2—O—(CH2)n-Rf group and (ii) an amino resin curative. The substrate may be printed or embossed or both. The coated substrate has both stain resistant properties and dry erase properties.

Abstract: Monofunctional polyfluorooxetane oligomers, polymers, and copolymers are prepared by the cationic polymerization of fluorooxetane monomers with a monoalcohol. In addition to serving as an initiator, the monoalcohol can also serve as a solvent for the fluorooxetane or other monomers to produce oligomers, polymers, or copolymers having low cyclic content. Suitable comonomers generally include various cyclic ethers. The polyfluorooxetane oligomer, polymer, or copolymer having a single hydroxyl end group can be functionalized with a variety of compounds so as to yield a functional end group such as an acrylate, a methacrylate, an allylic, an amine, etc., with the functionalized oligomer or polymer being suitable for use in radiation curable or thermal curable coating compositions. These functionalized polymers can be copolymerized and cured to provide improvements in wetting and surface properties.

Abstract: Monofunctional polyfluorooxetane oligomers, polymers, and copolymers are prepared by the cationic polymerization of fluorooxetane monomers with a monoalcohol. In addition to serving as an initiator, the monoalcohol can also serve as a solvent for the fluorooxetane or other monomers to produce oligomers, polymers, or copolymers having low cyclic content. Suitable comonomers generally include various cyclic ethers. The polyfluorooxetane oligomer, polymer, or copolymer having a single hydroxyl end group can be functionalized with a variety of compounds so as to yield a functional end group such as an acrylate, a methacrylate, an allylic, an amine, etc., with the functionalized oligomer or polymer being suitable for use in radiation curable or thermal curable coating compositions. These functionalized polymers can be copolymerized and cured to provide improvements in wetting and surface properties.