Abstract: Disclosed is a stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition:(a) from about 0.5 parts to 10 parts of a crystalline, hydroxyl-containing stabilizer;(b) from about 1 part to about 80 parts of lipid skin moisturizing agent;(c) from about 1 part to about 30 parts of surfactant having a combined CMC equilibrium surface tension value of from 15 to 50;(d) water.Such stress stable lathering skin cleansing liquid compositions have a Lipid Deposition Value (LDV) of from about 5 to about 100. Such compositions are also stable for at least two weeks at 100.degree. F.

Abstract: The present invention relates to a stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition:(a) from about 0.5 parts to 10 parts of a stabilizer; for example trihydroxystearin;(b) from about 1 part to about 80 parts of lipid skin moisturizing agent;(c) from about 1 part to about 30 parts of surfactant having a combined CMC equilibrium surface tension value of from 15 to 50;(d) water;wherein said stress stable lathering skin cleansing liquid composition has a Lipid Deposition Value (LDV) of from about 5 to about 100 and wherein said composition is stable for at least two weeks at 100 F.

Abstract: The liquid composition is a dual cleanser and moisturizer that is stable and on a macro scale is homogeneous. The dual cleansing and lipid moisturizing liquid composition of this invention comprises: by weight parts of the liquid composition:(a) from about 5 parts to about 30 parts of lipid skin moisturizing agent having a Vaughan Solubility Parameter (VSP) of between 5 and 10;(b) from about 0.

Abstract: A stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition:(a) from about 0.5 parts to 10 parts of a crystalline, hydroxy-containing stabilizer; for example trihydroxystearin;(b) from about 1 part to about 30 parts of lipid skin moisturizing agent;(c) from about 5 parts to about 30 parts of surfactant having a combined CMC equilibrium surface tension value of from 15 to 50;(d) water;wherein said stress stable lathering skin cleansing liquid composition has a Lipid Deposition Value (LDV) of from about 5 to about 100 and wherein the composition is stable for at least two weeks at 100.degree. F.

Abstract: The liquid composition is a dual cleanser and mosturizer that is stable and on a macro scale is homogeneous. The dual cleansing and lipid moisturizing liquid composition of this invention comprises: by weight parts of the liquid composition:(a) from about 5 parts to about 30 parts of lipid skin moisturizing agent having a Vaughan Solubility Parameter (VSP) of between 5 and 10;(b) from about 0.

Abstract: The liquid of the present invention can provide good cleansing, lather and good sensory feel and yet surprisingly provide a lipid moisturizing benefit via deposition of the lipid on the skin of the user. The liquid composition is stable and on a macro scale is homogeneous. The dual cleansing and lipid moisturizing liquid composition of this invention comprises: (1) about 5 parts to about 30 parts of a lipid skin moisturizing agent; (2) about 1 to about 15 parts of an ethylene glycol fatty acid ester; (3) from about 0.05 parts to about 3 parts of a selected water dispersible gel forming polymer (4) from about 5 parts to about 30 parts of a lathering synthetic surfactant, and; (5) water, and wherein said synthetic surfactant and any soap has a combined CMC equilibrium surface tension value of from 15 to 50, and wherein said lathering skin cleansing liquid composition has a Lipid Deposition Value (LDV) of from about 5 to about 1000 .mu.g of lipid per sq. cm of skin.