Patents by Inventor Robert REICHARDT

Robert REICHARDT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION
    Publication number: 20170158913
    Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Colloidal or fumed inorganic particles (A) or a mixture thereof in a total amount of from 0.0001 to 2.5 wt.-% based on the total weight of the respective CMP composition (B) at least one amino acid in a total amount of from 0.2 to 1 wt.-% based on the total weight of the respective CMP composition (C) at least one corrosion inhibitor in a total amount of from 0.001 to 0.02 wt.-% based on the total weight of the respective CMP composition (D) hydrogen peroxide as oxidizing agent in a total amount of from 0.0001 to 2 wt.-% based on the total amount of the respective CMP composition (E) aqueous medium wherein the CMP composition (Q) has a pH in the range of from 6 to 9.5.
    Type: Application
    Filed: July 14, 2015
    Publication date: June 8, 2017
    Applicant: BASF SE
    Inventors: Robert REICHARDT, Max SIEBERT, Yongqing LAN, Michael LAUTER, Haci Osman GUEVENC, Julian PROELSS, Sheik Ansar USMAN IBRAHIM, Reza GOLZARIAN
  • CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE DERIVATIVES AS CORROSION INHIBITORS
    Publication number: 20160200943
    Abstract: A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.
    Type: Application
    Filed: July 1, 2014
    Publication date: July 14, 2016
    Applicant: BASF SE
    Inventors: Robert REICHARDT, Martin KALLER, Michael LAUTER, Yuzhuo LI, Andreas KLIPP
  • CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA
    Publication number: 20160160083
    Abstract: Described is a chemical-mechanical polishing (CMP) composition comprising abrasive particles containing ceria.
    Type: Application
    Filed: July 8, 2014
    Publication date: June 9, 2016
    Applicant: BASF SE
    Inventors: Michael LAUTER, Yuzhuo Li, Bastian Marten NOLLER, Roland LANGE, Robert REICHARDT, Yongqing LAN, Volodymyr BOYKO, Alexander KRAUS, Joachim Von SEYERL, Sheik Ansar USMAN IBRAHIM, Aax SIEBERT, Kristine HARTNAGEL, Joachim DENGLER, Nina Susanne HILLESHEIM
  • Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt
    Patent number: 8980750
    Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Inorganic particles, organic particles, or a mixture or composite thereof, wherein the particles are cocoon-shaped (B) a non-ionic surfactant, (C) a carbonate or hydrogen carbonate salt, (D) an alcohol, and (M) an aqueous medium.
    Type: Grant
    Filed: July 2, 2013
    Date of Patent: March 17, 2015
    Assignee: BASF SE
    Inventors: Robert Reichardt, Yuzhuo Li, Michael Lauter, Wei Lan William Chiu
  • CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IONIC SURFACTANT AND AN AROMATIC COMPOUND COMPRISING AT LEAST ONE ACID GROUP
    Publication number: 20140011362
    Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Inorganic particles, organic particles, or a mixture or composite thereof, wherein the particles are cocoon-shaped (B) a non-ionic surfactant, (C) an aromatic compound comprising at least one acid group (Y), or a salt thereof, and (M) an aqueous medium.
    Type: Application
    Filed: July 5, 2013
    Publication date: January 9, 2014
    Applicant: BASF SE
    Inventors: Robert REICHARDT, Yuzhuo LI, Michael LAUTER
  • CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IONIC SURFACTANT AND A CARBONATE SALT
    Publication number: 20140011361
    Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Inorganic particles, organic particles, or a mixture or composite thereof, wherein the particles are cocoon-shaped (B) a non-ionic surfactant, (C) a carbonate or hydrogen carbonate salt, (D) an alcohol, and (M) an aqueous medium.
    Type: Application
    Filed: July 2, 2013
    Publication date: January 9, 2014
    Inventors: Robert REICHARDT, Yuzhou LI, Michael LAUTER, Wei Lan CHIU