Abstract: This invention relates to a device intended to perform various chemical determinations in several wet chemical processes commonly used in semiconductor applications, including, but not limited to, those referred to as front end of line (FEOL) cleans, back end of line (BEOL) cleans, and copper electroplating. The device provides continuous or near continuous sensing of critical parameters such as component concentrations and metallic impurity concentrations. The device is capable of storing data for transmission after completion of the process, or transmitting data in real time as it is acquired. The device makes use of ISFET's and ChemFET's coupled with reference electrodes to detect small variations in the chemical properties of various wet chemical processes. The device can further either store the data for later analyses or transmit the data in real or near real time for more temporal analysis and control.