Patents by Inventor Robert W. East

Robert W. East has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical vapor deposition reactor and process
    Patent number: 4232063
    Abstract: Apparatus and process for depositing materials such as Si.sub.3 N.sub.4 and SiO.sub.2 on semiconductor wafers in a hot-wall reactor. A perforated distribution tube is positioned in the reaction chamber, and the wafers are placed inside the tube. Reactant gases are introduced into the chamber outside the tube and pass to the wafers through the openings in the tube.
    Type: Grant
    Filed: November 14, 1978
    Date of Patent: November 4, 1980
    Assignee: Applied Materials, Inc.
    Inventors: Richard S. Rosler, Robert W. East