Abstract: A method for producing a unit having a three-dimensional surface patterning on a base layer. A photoresist is applied to a base layer and subjected to a masked exposure matched to a predetermined final surface patterning. Parts of the photoresist layer are removed by developing to provide an initial surface patterning, including photoresist sacrificial subregions. A coating which covers the initial surface patterning is then applied. Energy is then applied to the initial surface patterning to destabilize the sacrificial layer regions. The initial surface patterning is acted on by a high-pressure liquid jet at a predetermined treatment temperature such that at least part of the coating which covers the sacrificial layer regions are mechanically removed or at least broken open to produce the final surface patterning. The liquid has a negligible chemical reaction rate and/or physical dissolution rate with respect to materials of the unit and/or organic fluid-sealing means.

Abstract: A method of making a rotational optical arrangement and the arrangement made by the method, wherein the method includes providing a rotatable unit. The unit has a surface extending transverse to a center axis of the unit and at a predefined angle to an interface normal direction, and the unit having a pattern with at least two portions that each have a different optical characteristic. A mechanism is provided for rotating the unit around a mechanism-induced rotational axis. The center axis of the unit is separately aligned to the mechanism-induced rotational axis for radial offset correction. The interface normal direction is separately aligning to the mechanism-induced rotational axis for skew correction.

Abstract: In the method according to the invention (“lift-off method”) for producing a unit (I) which is to have a three-dimensional surface patterning on a base layer (3), in a first method step a photoresist is applied to the base layer (3) in order to produce a photoresist layer (9). In a second method step, the photoresist layer (9) is subjected to masked exposure (13) which is matched to a predetermined final surface patterning. In a third method step, parts of the photoresist layer (9) are removed by developing, so that an initial surface patterning which includes photoresist subregions (25) as sacrificial layer regions is obtained. In a fourth method step, a coating (29, 31) which covers the initial surface patterning which has now been obtained is applied, in particular by sputtering, preferably as an alternating layer system. In a fifth method step, energy is applied to the initial surface patterning in order to destabilize the sacrificial layer regions (25).

Abstract: A method of making a rotational optical arrangement and the arrangement made by the method, wherein the method includes providing a rotatable unit. The unit has a surface extending transverse to a center axis of the unit and at a predefined angle to an interface normal direction, and the unit having a pattern with at least two portions that each have a different optical characteristic. A mechanism is provided for rotating the unit around a mechanism-induced rotational axis. The center axis of the unit is separately aligned to the mechanism-induced rotational axis for radial offset correction. The interface normal direction is separately aligning to the mechanism-induced rotational axis for skew correction.