Patents by Inventor Roger Josef Maria JEURISSEN

Roger Josef Maria JEURISSEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for predicting resist deformation
    Patent number: 11914942
    Abstract: A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.
    Type: Grant
    Filed: June 5, 2023
    Date of Patent: February 27, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Chrysostomos Batistakis, Roger Josef Maria Jeurissen, Koen Gerhardus Winkels
  • METHOD FOR PREDICTING RESIST DEFORMATION
    Publication number: 20230334217
    Abstract: A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.
    Type: Application
    Filed: June 5, 2023
    Publication date: October 19, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Chrysostomos BATISTAKIS, Roger Josef Maria JEURISSEN, Koen Gerhardus WINKELS
  • Method for predicting resist deformation
    Patent number: 11709988
    Abstract: A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: July 25, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Chrysostomos Batistakis, Roger Josef Maria Jeurissen, Koen Gerhardus Winkels
  • METHOD FOR PREDICTING RESIST DEFORMATION
    Publication number: 20220075275
    Abstract: A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.
    Type: Application
    Filed: December 13, 2019
    Publication date: March 10, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Chrysostomos BATISTAKIS, Roger Josef Maria JEURISSEN, Koen Gerhardus WINKELS