Patents by Inventor Roger P. Fremgen
Roger P. Fremgen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10718052Abstract: A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shaft so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.Type: GrantFiled: December 16, 2016Date of Patent: July 21, 2020Assignee: Veeco Instruments, Inc.Inventors: Louise S. Barriss, Richard A. Comunale, Roger P. Fremgen, Alexander I. Gurary, Todd A. Luse, Robert White Milgate, John D. Pollock
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Publication number: 20170096734Abstract: A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shall so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.Type: ApplicationFiled: December 16, 2016Publication date: April 6, 2017Applicant: Veeco Instruments Inc.Inventors: Louise S. Barriss, Richard A. Comunale, Roger P. Fremgen, Alexander I. Gurary, Todd A. Luse, Robert White Milgate, John D. Pollock
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Publication number: 20160160387Abstract: A linear cluster deposition system includes a plurality of reaction chambers positioned in a linear horizontal arrangement. First and second reactant gas manifolds are coupled to respective process gas input port of each of the reaction chambers. An exhaust gas manifold having a plurality of exhaust gas inputs is coupled to the exhaust gas output port of each of the plurality of reaction chambers. A substrate transport vehicle transports at least one of a substrate and a substrate carrier that supports at least one substrate into and out of substrate transfer ports of each of the reaction chambers. At least one of a flow rate of process gas into the process gas input port of each of the reaction chambers and a pressure in each of the reaction chambers being chosen so that process conditions are substantially the same in at least two of the reaction chambers.Type: ApplicationFiled: January 15, 2016Publication date: June 9, 2016Applicant: Veeco Instruments IncInventors: William E. Quinn, Alexander Gurary, Ajit Paranjpe, Maria D. Ferreira, Roger P. Fremgen, Eric A. Armour
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Publication number: 20160071708Abstract: Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.Type: ApplicationFiled: November 16, 2015Publication date: March 10, 2016Applicant: Veeco Instruments, Inc.Inventors: Boris L. Druz, Piero Sferlazzo, Roger P. Fremgen, Alan V. Hayes, Viktor Kanarov, Robert Krause, Ira Reiss
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Publication number: 20150361582Abstract: A gas flow flange includes a first and a second section. The first section includes a plurality of first gas channels positioned inside and parallel to a top surface. A plurality of second gas input channels are positioned perpendicular to the top surface and extending from the top surface to the bottom surface. Each of the plurality of first gas input channels are aligned with an output of a corresponding one of the plurality of first gas input channels. The second section includes a plurality of second gas input channels that are positioned perpendicular to and extending from the top surface to the bottom surface of the second section. Each of the plurality of second gas input channels are aligned with a corresponding one of the plurality of second gas input channels. Fluid cooling conduits are positioned perpendicular to the top surface of the second section.Type: ApplicationFiled: June 17, 2014Publication date: December 17, 2015Applicant: VEECO INSTRUMENTS, INC.Inventors: Todd A. Luse, Roger P. Fremgen
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Patent number: 9206500Abstract: Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.Type: GrantFiled: September 18, 2008Date of Patent: December 8, 2015Inventors: Boris Druz, Roger P. Fremgen, Jr., Alan V. Hayes, Viktor Kanarov, Robert Krause, Ira Reiss, Piero Sferlazzo
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Publication number: 20150075431Abstract: A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shaft so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.Type: ApplicationFiled: May 9, 2013Publication date: March 19, 2015Applicant: VEECO INSTRUMENTS INC.Inventors: Louise S. Barriss, Richard A. Comunale, Roger P. Fremgen, Alexander I. Gurary, Todd A. Luse, Robert White Milgate, III, John D. Pollock
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Publication number: 20120223048Abstract: An inline processing system for patterning magnetic recording layers on hard discs for use in a hard disc drive. Discs are processed on both sides simultaneously in a vertical orientation, in round plate-like holders called MDCs. A plurality (as many as 10) discs are held in a dial carrier of the MDC, and transferred from one process station to another. The dial carrier of the MDC may be rotated and/or angled at up to 70° from normal in each process station, so that one or a plurality of process sources may treat the discs simultaneously. This configuration provides time savings and a reduction in the number and size of process sources needed. A mask enhancement process for patterning of magnetic media, and a filling and planarizing process used therewith, are also disclosed.Type: ApplicationFiled: August 26, 2010Publication date: September 6, 2012Applicant: VEECO PROCESS EQUIPMENT INC.Inventors: Ajit Paranjpe, Todd A. Luse, Roger P. Fremgen, Narasimhan Srinivasan, Boris L. Druz, Katrina Rook, Adrian Celaru
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Publication number: 20120058630Abstract: A linear cluster deposition system includes a plurality of reaction chambers positioned in a linear horizontal arrangement. First and second reactant gas manifolds are coupled to respective process gas input port of each of the reaction chambers. An exhaust gas manifold having a plurality of exhaust gas inputs is coupled to the exhaust gas output port of each of the plurality of reaction chambers. A substrate transport vehicle transports at least one of a substrate and a substrate carrier that supports at least one substrate into and out of substrate transfer ports of each of the reaction chambers. At least one of a flow rate of process gas into the process gas input port of each of the reaction chambers and a pressure in each of the reaction chambers being chosen so that process conditions are substantially the same in at least two of the reaction chambers.Type: ApplicationFiled: September 8, 2010Publication date: March 8, 2012Applicant: Veeco Instruments Inc.Inventors: William E. Quinn, Alexander Gurary, Ajit Paranjpe, Maria D. Ferreira, Roger P. Fremgen, JR., Eric A. Armour
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Publication number: 20090098306Abstract: Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.Type: ApplicationFiled: September 18, 2008Publication date: April 16, 2009Applicant: Veeco Instruments Inc.Inventors: Boris Druz, Roger P. Fremgen, JR., Alan V. Hayes, Viktor Kanarov, Robert Krause, Ira Reiss, Piero Sferlazzo
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Patent number: 7183716Abstract: A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.Type: GrantFiled: February 4, 2004Date of Patent: February 27, 2007Assignee: Veeco Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Ira Reiss, Roger P. Fremgen, Jr., Adrian Celaru, Kurt E. Williams, Carlos Fernando de Mello Borges, Boris L. Druz, Renga Rajan, Hari Hegde
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Publication number: 20040163766Abstract: A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.Type: ApplicationFiled: February 4, 2004Publication date: August 26, 2004Applicant: Veeco Instruments Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Ira Reiss, Roger P. Fremgen, Adrian Celaru, Kurt E. Williams, Carlos Fernando de Mello Borges, Boris L. Druz, Renga Rajan, Hari Hegde
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Patent number: 6545580Abstract: An electromagnetic field generator and method of operation for ion beam deposition of magnetic thin-film materials is presented. A combination of open frame electromagnetic field generator elements provides precise control of magnetic field directionality. This control enables deposition of oriented magnetic films with minimal directionality error. The magnetic field direction may be oriented to enable the deposition of alternating layers of directionally oriented magnetic films. An open frame element reduces the weight of the electromagnetic field generator while truncated corners reduce diagonal clearance that may be required in a vacuum chamber. An open frame design also enables the electromagnetic field generator to surround and thus remain clear of the active deposition area; the electromagnetic field generator can thus be shielded from accumulation of sputtered material. Shielding from accumulation of sputter material reduces maintenance requirements.Type: GrantFiled: September 9, 1998Date of Patent: April 8, 2003Assignee: VEECO Instruments, Inc.Inventors: Hari S. Hegde, Mihai S. Risca, Alan V. Hayes, Abraham J. Navy, Roger P. Fremgen
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Publication number: 20020047767Abstract: An electromagnetic field generator and method of operation for ion beam deposition of magnetic thin-film materials is presented. A combination of open frame electromagnetic field generator elements provides precise control of magnetic field directionality. This control enables deposition of oriented magnetic films with minimal directionality error. The magnetic field direction may be oriented to enable the deposition of alternating layers of directionally oriented magnetic films. An open frame element reduces the weight of the electromagnetic field generator while truncated corners reduce diagonal clearance that may be required in a vacuum chamber. An open frame design also enables the electromagnetic field generator to surround and thus remain clear of the active deposition area; the electromagnetic field generator can thus be shielded from accumulation of sputtered material. Shielding from accumulation of sputter material reduces maintenance requirements.Type: ApplicationFiled: September 9, 1998Publication date: April 25, 2002Inventors: HARI S. HEGDE, MIHAI S. RISCA, ALAN V. HAYES, ABRAHAM J. NAVY, ROGER P. FREMGEN
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Patent number: 6225747Abstract: A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam “on” and beam “off” states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.Type: GrantFiled: August 9, 1999Date of Patent: May 1, 2001Assignee: Veeco Instruments Inc.Inventors: Roger P. Fremgen, Jr., John Jacob, Alan V. Hayes, Victor Kanarov, Edward W. Ostan, Abraham J. Navy, Emmanuel N. Lakios, Genrikh Treyger
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Patent number: 5982101Abstract: A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.Type: GrantFiled: June 27, 1997Date of Patent: November 9, 1999Assignee: Veeco Instruments, Inc.Inventors: Roger P. Fremgen, Jr., John Jacob, Alan V. Hayes, Victor Kanarov, Edward W. Ostan, Abraham J. Navy, Emmanuel N. Lakios, Genrikh Treyger