Abstract: A reflector, with high total reflection, resisting mechanical stress and having a reflector body on which the following components are superimposed (a) a functional coating, e.g., a varnish, (b) a reflection layer structure composed of a reflecting metallic layer and a transparent ceramic layer, having for instance a geometric thickness of 3 nm or more or an optical depth of &lgr;2, applied on the top of the metallic layer. The layer arranged on the surface of the reflection layer structure is formed by the transparent layer which acts simultaneously as a protection layer. The protection layer is a silicon oxide of general formula SiOx, where x is a number from 1.1 to 2.0, or is an aluminum oxide of formula Al2O3. The protection layer protects the underlying layers from mechanical stresses. In the DIN 58196 wipe test, the protected layer shows no damage after 50 test cycles, each with 100 wiping strokes.

Abstract: Structured surface, having a support layer and, connected electrically to it, peak-shaped elements, each peak-shaped element exhibiting a cylindrical or conical shaped stem region adjacent to the support layer and at least two, preferably 2 to 4 peaks at the free end of the stem region. The structured surface is suitable in particular as electron emission source for ultra-flat image screens, for electron lithography or for scanning or transmission microscopy.

Abstract: Reflectors, for example, for lamps used for technical lighting purposes, having a surface which is resistant to mechanical and chemical attack and has high total reflectivity. The body (10) of the reflector, which is, for example, a rolled aluminum product such as a foil, a strip of a sheet, has a surface layer in the form of a layer system containing (a) a pretreatment layer (11), onto which is deposited (b) a functional layer (12) with silanes, having organo-functional groups, of a metal compound, and onto which is deposited (c) a metal-containing reflective layer (13). Layer (a) is deposited on the reflector body and increases the strength of bonding to the above lying layers (a) and (b). Layer (b) effects a flattening and increase in the mechanical strength of the above lying layer (c). The pretreatment layer can be a layer produced by anodic oxidation. The functional layer (b) can be a sol-gel layer.

Abstract: Interference layer which acts as a coloring surface layer on aluminum items, said layer containing an aluminum oxide layer and, deposited on this, a partially transparent layer. The aluminum oxide layer is a transparent, pore-free barrier layer produced by anodizing, of predetermined thickness d corresponding to the desired surface color of the interference layer; the thickness d of the barrier layer lies between 20 and 900 nm, and the partially transparent layer exhibits a wavelength dependent transmission .tau.(.lambda.) which is greater than 0.01 and smaller than 1. The side of the partially transparent layer facing away from the barrier layer is preferably protected from mechanical and chemical effects by an additional, transparent protective layer.

Abstract: Structured surface, having a support layer and, connected electrically to it, peak-shaped elements each peak-shaped element exhibiting a cylindrical or conical shaped stem region adjacent to the support layer and at least two, preferably 2 to 4 peaks at the free end of the stem region. The structured surface is suitable in particular as electron emission source for ultra-flat image screens, for electron lithography or for scanning or transmission microscopy.

Abstract: Articles of aluminum containing at least one unanodized surface or parts of at least one unanodized surface which are suitable for the deposition of layers or layer systems from the gas phase on said unanodized surfaces, the unanodized surfaces being of a refined aluminum with a degree of purity of equal to, or greater than, 98.3% by weight or aluminum alloys of said aluminum with at least one of the elements from the series comprising Si, Mg, Mn, Cu, Zn or Fe, and the surfaces have a peak-to-valley height Ra of equal to, or less than, 1 .mu.m, and the layer or the layer system is a reflective layer, in particular for radiations in the optical range.

Abstract: A process for forming a reflective surface, comprises the steps of: providing at least a part of at least one unanodized surface which has a peak-to-valley height Ra of equal to or less than 1 micron. The unanodized surface is selected from the group consisting of (1) refined aluminum with a degree of purity equal to or greater than 98.3% by weight aluminum and (2) aluminum alloys with at least one element selected from the group consisting of Si, Mg, Mn, Cu, Zn, Fe. The unanodized surface is in a form selected from the group consisting of rolled foil, rolled sheets, and rolled strips and said unanodized surface is used as a substrate. The process further includes depositing at least two layers from the gas phase on the unanodized surface, wherein the two layers include a ceramic adhesive layer from the gas phase and at least one reflecting layer from the gas phase on said adhesive layer for the reflection of radiation with wavelengths in the optical range.

Abstract: Articles of aluminum containing at least one unanodized surface or parts of at least one unanodized surface which are suitable for the deposition of layers or layer systems from the gas phase on said unanodized surfaces, the unanodized surfaces being of a refined aluminum with a degree of purity of equal to, or greater than, 98.3% by weight or aluminum alloys of said aluminum with at least one of the elements from the series comprising Si, Mg, Mn, Cu, Zn or Fe, and the surfaces have a peak-to-valley height Ra of equal to, or less than, 1 .mu.m, and the layer or the layer system is a reflective layer, in particular for radiations in the optical range.

Abstract: Articles of aluminum containing at least one unanodized surface or parts of at least one unanodized surface which are suitable for the deposition of layers or layer systems from the gas phase on said unanodized surfaces, the unanodized surfaces being of a refined aluminum with a degree of purity of equal to, or greater than, 98.3% by weight or aluminum alloys of said aluminum with at least one of the elements from the series comprising Si, Mg, Mn, Cu, Zn or Fe, and the surfaces have a peak-to-valley height Ra of equal to, or less than, 1 .mu.m, and the layer or the layer system is a reflective layer, in particular for radiations in the optical range.