Patents by Inventor Ronald Casper Kunst
Ronald Casper Kunst has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8885147Abstract: A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.Type: GrantFiled: February 3, 2010Date of Patent: November 11, 2014Assignee: ASML Netherlands B.V.Inventors: Michael Johannes Vervoordeldonk, Ronald Casper Kunst, Youssef Karel Maria De Vos, Johannes Hubertus Antonius Van De Rijdt, Robertus Jacobus Theodorus Van Kempen
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Patent number: 8830442Abstract: A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.Type: GrantFiled: October 8, 2008Date of Patent: September 9, 2014Assignee: AMSL Netherlands B.V.Inventors: Youssef Karel Maria De Vos, Dirk-Jan Bijvoet, Ronald Casper Kunst, Ramidin Izair Kamidi, Khalid Manssouri
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Patent number: 8786830Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.Type: GrantFiled: April 15, 2010Date of Patent: July 22, 2014Assignee: ASML Netherlands B.V.Inventors: Christophe De Metsenaere, Ronald Casper Kunst, Paul Petrus Joannes Berkvens, Mauritius Gerardus Elisabeth Schneiders, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran
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Patent number: 8279407Abstract: A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.Type: GrantFiled: March 23, 2009Date of Patent: October 2, 2012Assignee: ASML Netherlands B.V.Inventors: Ramidin Izair Kamidi, Henrikus Herman Marie Cox, Emiel Jozef Melanie Eussen, Ronald Casper Kunst, Engelbertus Antonius Fransiscus Van Der Pasch, Marcel François Heertjes, Mark Constant Johannes Baggen
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Publication number: 20100290013Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.Type: ApplicationFiled: April 15, 2010Publication date: November 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Christophe DE METSENAERE, Ronald Casper Kunst, Paul Petrus Joannes Berkvens, Mauritius Gerardus Elisabeth Schneiders, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran
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Publication number: 20100214548Abstract: A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate on a central area; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate in a first direction. The apparatus further includes a positioning device to position the substrate table, wherein the positioning device includes a plurality of actuators arranged to, in use, exert forces to position the substrate table, the forces substantially being directed in a plane substantially perpendicular to the first direction and wherein the plurality of actuators are arranged outside a central volume of the substrate table, the central volume being obtained by projecting the central area along the first direction.Type: ApplicationFiled: February 3, 2010Publication date: August 26, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Michael Johannes Vervoordeldonk, Ronald Casper Kunst, Youssef Karel Maria De Vos, Johannes Hubertus Antonius Van De Rijdt, Robertus Jacobus Theodorus Van Kempen
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Patent number: 7782446Abstract: A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respective position dependent parameters in a same degree of freedom. A controller is provided to provide a controller output signal to at least one of the actuators in response to a setpoint and the position dependent parameter as measured by at least one of the sensors. A further controller is provided with the position dependent parameters measured by the sensors. The further controller is configured to determine a difference between the position dependent parameters from the sensors and to provide a further controller output signal to at least one of the actuators in response to the determined difference.Type: GrantFiled: March 1, 2007Date of Patent: August 24, 2010Assignee: ASML Netherlands B.V.Inventors: Ramidin Izair Kamidi, Henrikus Herman Marie Cox, Ronald Casper Kunst, Youssef Karel Maria De Vos
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Patent number: 7742149Abstract: A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.Type: GrantFiled: May 29, 2008Date of Patent: June 22, 2010Assignee: ASML Netherlands B.V.Inventors: Youssef Karel Maria De Vos, Ronald Casper Kunst, Patricia Vreugdewater, Peter Paul Hempenius
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Patent number: 7657334Abstract: A lithographic apparatus includes a movable part and a controller to control a position quantity of the movable part. The controller includes a first controller transfer function and a second controller transfer function. A selector selects the first controller transfer function or the second controller transfer function depending on a state of the movable part. The first controller transfer function may be chosen in a substantially stationary state of the movable part, while in a substantially non-stationary state of the movable part, the second controller transfer function may be chosen.Type: GrantFiled: September 16, 2005Date of Patent: February 2, 2010Assignee: ASML Netherlands B.V.Inventors: Youssef Karel Maria De Vos, Ronald Casper Kunst, Yin Tim Tso, Ramidin Izair Kamidi
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Publication number: 20090279067Abstract: A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.Type: ApplicationFiled: March 23, 2009Publication date: November 12, 2009Applicant: ASML Netherlands B.V.Inventors: Ramidin Izair KAMIDI, Henrikus Herman Marie Cox, Emiel Jozef Melanie Eussen, Ronald Casper Kunst, Engelbertus Antonius Fransiscus Van Der Pasch, Marcel François Heertjes, Mark Constant Johannes Baggen
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Publication number: 20090147236Abstract: A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.Type: ApplicationFiled: October 8, 2008Publication date: June 11, 2009Applicant: ASML Netherlands B.V.Inventors: Youssef Karel Maria De Vos, Dirk-Jan Bijvoet, Ronald Casper Kunst, Ramidin Izair Kamidi, Khalid Manssouri
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Publication number: 20080309911Abstract: A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators arranged to act on the stage, and an electric power supply configured to provide a current to the actuators, wherein the current is supplied to a coil associated with a first actuator of the actuators and to a coil associated with a second actuator of the actuators.Type: ApplicationFiled: May 29, 2008Publication date: December 18, 2008Applicant: ASML Netherlands B.V.Inventors: Youssef Karel Maria De Vos, Ronald Casper Kunst, Patricia Vreugdewater, Peter Paul Hempenius
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Publication number: 20080212054Abstract: A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respective position dependent parameters in a same degree of freedom. A controller is provided to provide a controller output signal to at least one of the actuators in response to a setpoint and the position dependent parameter as measured by at least one of the sensors. A further controller is provided with the position dependent parameters measured by the sensors. The further controller is configured to determine a difference between the position dependent parameters from the sensors and to provide a further controller output signal to at least one of the actuators in response to the determined difference.Type: ApplicationFiled: March 1, 2007Publication date: September 4, 2008Applicant: ASML Netherlands B.V.Inventors: Ramidin Izair Kamidi, Henrikus Herman Marie Cox, Ronald Casper Kunst, Youssef Karel Maria De Vos
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Patent number: 7379156Abstract: A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table holds a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. A motion control system includes a controller having a transfer function. The controller controls a position of the support structure and or the substrate table along a series of positions. The transfer function consists of a sum of a plurality of positional transfer functions, each determined in one of the positions, and each multiplied by a weighing function.Type: GrantFiled: December 29, 2004Date of Patent: May 27, 2008Assignee: ASML Netherlands B.V.Inventors: Ronald Casper Kunst, Yin Tim Tso, Youssef Karel Maria De Vos, Ramidln Izair Kamidi
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Patent number: 7256866Abstract: To enable high acceleration and high moving speed of a pattern support or a substrate table of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively large displacements, whereas an actuator for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.Type: GrantFiled: October 12, 2004Date of Patent: August 14, 2007Assignee: ASML Netherlands B.V.Inventors: Henrikus Herman Marie Cox, Hans Butler, Ronald Casper Kunst, Harmen Klaas Van Der Schoot, Youssef Karel Maria De Vos