Patents by Inventor Ronald D. Voisin

Ronald D. Voisin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040008334
    Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
    Type: Application
    Filed: July 11, 2002
    Publication date: January 15, 2004
    Inventors: Sidlgata V. Sreenivasan, Michael P.C. Watts, Byung Jin Choi, Mario J. Meissl, Norman E. Schumaker, Ronald D. Voisin
  • Publication number: 20030205658
    Abstract: A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.
    Type: Application
    Filed: November 13, 2002
    Publication date: November 6, 2003
    Applicant: Molecular Imprints, Inc.
    Inventor: Ronald D. Voisin
  • Publication number: 20030205657
    Abstract: A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.
    Type: Application
    Filed: May 1, 2002
    Publication date: November 6, 2003
    Inventor: Ronald D. Voisin
  • Patent number: 5781346
    Abstract: Magnification correction for small field scanning of large blanks is provided by adding magnification adjusting elements (lenses) to a double pass Wynne-Dyson lens or other type of one-to-one projection lens. The magnification adjusting optical elements includes two pairs of low power lenses, one associated with each of the input and output prisms of a Wynne-Dyson lens. Movement of the magnification adjusting optics provides positive or negative magnification as needed to correct for any expansion or compaction of the blank relative to the reticle (mask) and hence maintain alignment. Further magnification correction is provided by a small velocity relative movement between the reticle and the blank by means of a secondary stage in the scan direction. This corrects for any alignment error in the scan direction and may be used independently of the optical correction technique with any type of projection lens.
    Type: Grant
    Filed: August 2, 1996
    Date of Patent: July 14, 1998
    Assignee: Etec System, Inc.
    Inventors: Paul C. Allen, Ronald D. Voisin