Abstract: A method for the removal and concentration of desired ions such as Sb.sup.3+, Zr.sup.4+, Zn.sup.2+, Pu.sup.4+, Hf.sup.4+, Cu.sup.2+, Ni.sup.2+, Fe.sup.3+, Cd.sup.2+, Ag.sup.+, and Hg.sup.2+ from a multiple ion source solution which may contain larger concentrations of other undesired ions including H.sup.+ comprises bringing the source solution into contact with a compound comprising an aminoalkylphosphonic acid containing ligand covalently bonded through an organic spacer silicon grouping to a solid inorganic support. The aminoalkylphosphonic acid containing ligand portion(s) of the compound has an affinity for the desired ions to form a complex thereby removing the desired ions from the source solution. The desired ions are removed from the compound by contacting the compound with a much smaller volume of a receiving solution having a greater affinity for the desired ions than does the aminoalkylphosphonic acid containing ligand portion of the compound.