Patents by Inventor Ronald L. DiCarlo, Jr.
Ronald L. DiCarlo, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11680318Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: May 31, 2022Date of Patent: June 20, 2023Assignee: Edwards Semiconductor Solutions LLCInventors: Egbert Woelk, Ronald L. Dicarlo, Jr.
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Publication number: 20220290299Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: May 31, 2022Publication date: September 15, 2022Applicant: Ceres Technologies, Inc.Inventors: Egbert WOELK, Ronald L. DICARLO, Jr.
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Patent number: 11345997Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: June 8, 2020Date of Patent: May 31, 2022Assignee: Ceres Technologies, Inc.Inventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
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Publication number: 20200299837Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: June 8, 2020Publication date: September 24, 2020Applicant: Ceres Technologies, Inc.Inventors: Egbert WOELK, Ronald L. DICARLO, JR.
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Patent number: 10676821Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: July 31, 2018Date of Patent: June 9, 2020Assignee: Ceres Technologies, Inc.Inventors: Egbert Woelk, Ronald L. Dicarlo, Jr.
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Publication number: 20190032207Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: July 31, 2018Publication date: January 31, 2019Applicant: Ceres Technologies, Inc.Inventors: Egbert WOELK, Ronald L. DICARLO, JR.
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Patent number: 10066296Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: January 8, 2016Date of Patent: September 4, 2018Assignee: Ceres Technologies, Inc.Inventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
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Patent number: 9243325Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: July 18, 2012Date of Patent: January 26, 2016Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
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Patent number: 8997775Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: May 24, 2011Date of Patent: April 7, 2015Assignee: Rohm and Haas Electronic Materials LLCInventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
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Publication number: 20140283917Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: June 9, 2014Publication date: September 25, 2014Inventors: Egbert Woelk, Ronald L. DiCarlo, JR.
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Patent number: 8776821Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: GrantFiled: May 24, 2011Date of Patent: July 15, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
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Publication number: 20140020764Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: July 18, 2012Publication date: January 23, 2014Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Egbert Woelk, Ronald L. DiCarlo, JR.
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Patent number: 8555809Abstract: Disclosed herein is a device comprising an evaporator; and a heat exchanger; the heat exchanger being in fluid communication with evaporator; evaporator comprising an outer casing; and an inner casing that is disposed within the outer casing; the inner casing contacting a plate; wherein the inner casing encloses a first conduit that is operative to introduce a carrier fluid into evaporator; and a second conduit that is operative to remove carrier fluid entrained with a precursor; wherein the outer casing is detachably attached to the plate; the plate contacting a first precursor conduit that is operative to introduce the precursor into evaporator from the heat exchanger; where the heat exchanger is disposed proximate to evaporator at a distance effective to maintain the precursor in evaporator at a substantially constant temperature when the ambient temperature around the heat exchanger and evaporator fluctuates by an amount of up to about ±35° C.Type: GrantFiled: January 14, 2010Date of Patent: October 15, 2013Assignee: Rohm and Haas Electronic Materials, LLCInventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
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Patent number: 8501266Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.Type: GrantFiled: March 29, 2010Date of Patent: August 6, 2013Assignee: Rohm and Haas Electronics Materials LLCInventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
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Publication number: 20120298040Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: May 24, 2011Publication date: November 29, 2012Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Egbert Woelk, Ronald L. DiCarlo, JR.
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Publication number: 20120298207Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a solid precursor compound. The first stream of carrier gas is at a temperature greater than or equal to 20° C. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream and the second stream are combined to form a third stream, such that the dewpoint of the vapor of the solid precursor compound in the third stream is lower than the ambient temperature. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.Type: ApplicationFiled: May 24, 2011Publication date: November 29, 2012Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Egbert Woelk, Ronald L. DiCarlo, JR.
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Publication number: 20120034378Abstract: A delivery device comprises an inlet port and an outlet port. The delivery device comprises an inlet chamber and an outlet chamber, with the outlet chamber being opposedly disposed to the inlet chamber and in fluid communication with the inlet chamber via a conical section. The outlet chamber comprises a labyrinth that is operative to prevent solid particles of a solid precursor compound contained in the delivery device from leaving the delivery device while at the same time permitting vapors of the solid precursor compound to leave the delivery device via the outlet port.Type: ApplicationFiled: August 9, 2010Publication date: February 9, 2012Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Egbert Woelk, Ronald L. DiCarlo, JR.
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Publication number: 20110171383Abstract: Disclosed herein is a device comprising an evaporator; and a heat exchanger; the heat exchanger being in fluid communication with evaporator; evaporator comprising an outer casing; and an inner casing that is disposed within the outer casing; the inner casing contacting a plate; wherein the inner casing encloses a first conduit that is operative to introduce a carrier fluid into evaporator; and a second conduit that is operative to remove carrier fluid entrained with a precursor; wherein the outer casing is detachably attached to the plate; the plate contacting a first precursor conduit that is operative to introduce the precursor into evaporator from the heat exchanger; where the heat exchanger is disposed proximate to evaporator at a distance effective to maintain the precursor in evaporator at a substantially constant temperature when the ambient temperature around the heat exchanger and evaporator fluctuates by an amount of up to about ±35° C.Type: ApplicationFiled: January 14, 2010Publication date: July 14, 2011Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Egbert Woelk, Ronald L. DiCarlo, JR.
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Publication number: 20100300361Abstract: Delivery devices for delivering solid precursor compounds in the vapor phase to reactors are provided. Such devices include a precursor composition of a solid precursor compound with a layer of packing material disposed thereon. Also provided are methods for transporting a carrier gas saturated with the precursor compound for delivery into such CVD reactors.Type: ApplicationFiled: May 25, 2010Publication date: December 2, 2010Applicant: Rohm and Haas Electronic Materials LLCInventors: Deodatta Vinayak SHENAI-KHATKHATE, Michael L. Timmons, Charles J. Marsman, Egbert Woelk, Ronald L. DiCarlo, JR.
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Publication number: 20100285206Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.Type: ApplicationFiled: March 29, 2010Publication date: November 11, 2010Applicant: Rohm and Haas Electronic Materials LLCInventors: Egbert Woelk, Ronald L. DiCarlo, JR.