Abstract: A mixture and a method comprising same for etching a dielectric material from a layered substrate are disclosed herein. Specifically, in one embodiment, there is provided a mixture for etching a dielectric material in a layered substrate comprising: a fluorocarbon gas, a fluorine-containing oxidizer gas selected from the group consisting of a hypofluorite, a fluoroperoxide, a fluorotrioxide, and combinations thereof; and optionally an inert diluent gas. The mixture of the present invention may be contacted with a layered substrate comprising a dielectric material under conditions sufficient to form active species that at least partially react with and remove at least a portion of the dielectric material.

Abstract: The invention relates to an improvement in apparatus and process for effecting storage and delivery of a gas. The storage and delivery apparatus is comprised of a storage and dispensing vessel containing a medium capable of storing a gas and permitting delivery of the gas stored in the medium from the vessel, the improvement comprising: (a) a reactive liquid having Lewis acidity or basicity; (b) a gas liquid complex in a reversible reacted state formed under conditions of pressure and temperature by contacting the gas having Lewis acidity with the reactive liquid having Lewis basicity or the gas having Lewis basicity with the reactive liquid having Lewis acidity; (c) a non-reactive wick medium holding and dispersing the reactive liquid and the gas liquid complex therein.

Abstract: The present invention provides an improved gas transfer apparatus designed for enhanced purging of a pigtail and a process for effecting such purging. The improvement in the apparatus resides in an integrated system of components comprising: a surge chamber having a first end, a body and a second end, said first end in communication with the pigtail conduit, said body section of said surge chamber having a cross-section larger than the cross-section of said pigtail conduit and a second end in communication with said vessel containing said gas source; and, a purge gas source for delivery of a purge gas to said pigtail conduit whereby during an alternating cycle of pressurization of said pigtail with said purge gas and depressurization, optionally with application of vacuum within said pigtail conduit, impurities can be removed from within the pigtail conduit.

Abstract: This invention relates to an improvement in a low-pressure storage and delivery system for gases having Lewis acidity, particularly hazardous specialty gases such as BF3 and diborane, which are utilized in the electronics industry. The improvement resides in storing the gases in a liquid incorporating a reactive compound having Lewis basicity capable of effecting a reversible reaction between a gas having Lewis acidity. The reactive compound comprises a reactive species that is dissolved, suspended, dispersed, or otherwise mixed with a nonvolatile liquid.

Abstract: A mixture and method for the storage and delivery of a gas are disclosed herein. In one aspect, there is provided a mixture comprising: an ionic liquid comprising an anion and a cation, at least a portion of the gas that is disposed within and reversibly chemically reacted with the ionic liquid, and optionally an unreacted gas. In another aspect, there is provided a method for delivering a gas from a mixture comprising an ionic liquid and one or more gases comprising: reacting at least a portion of the gas with the ionic liquid to provide the mixture comprising a chemically reacted gas and an ionic liquid and separating the chemically reacted gas from the mixture wherein the chemically reacted gas after the separating step has substantially the same chemical identity as the chemically reacted gas prior to the reacting step.

Abstract: This invention is directed to an improved method for preventing deposition residue buildup on the internal surfaces of an ALD reactor chamber. In an ALD deposition process, the surfaces of a substrate are treated with an initiating precursor generating a labile atom reactive with a deposition precursor. Excess initiating precursor is removed from the reactor and the substrate surface then is exposed to a deposition precursor reactive with the labile atom under conditions for generating a fugitive reaction product containing the labile atom and leaving a deposition product. The process is repeated generating alternate layers of initiation and deposition precursor reaction products. The improvement in the ALD process resides in passivating the internal surfaces of the reactor by removing labile atoms reactable with either the initiating or deposition precursors prior to effecting ALD deposition.

Abstract: The present invention is an apparatus for containing and dispensing a high purity fluid comprising an outer vessel capable of containing a quantity of high purity fluid in its interior; an outlet associated with the outer vessel for dispensing the high purity fluid; a valve capable of controlling high purity fluid flow out of the outer vessel through the outlet; an inner vessel at least partly situated in the outer vessel and communicating with the outlet and an inlet which communicates with the interior of the outer vessel; a purification media contained within the inner vessel for purifying the high purity fluid of undesired components; and fluid flow control device which prevents high purity fluid from flowing from the inner vessel to the interior of the outer vessel.

Abstract: A mixture and a method comprising same for etching a dielectric material from a layered substrate are disclosed herein. Specifically, in one embodiment, there is provided a mixture for etching a dielectric material in a layered substrate comprising an unsaturated oxygenated fluorocarbon. The mixture of the present invention may be contacted with a layered substrate comprising a dielectric material under conditions sufficient to at least partially react with and remove at least a portion of the dielectric material. In another embodiment of the present invention, there is provided a method for making an unsaturated oxygenated fluorocarbon.

Abstract: A mixture and a method comprising same for etching a dielectric material from a layered substrate are disclosed herein. Specifically, in one embodiment, there is provided a mixture for etching a dielectric material in a layered substrate comprising: a fluorocarbon gas, a fluorine-containing oxidizer gas selected from the group consisting of a hypofluorite, a fluoroperoxide, a fluorotrioxide, and combinations thereof; and optionally an inert diluent gas. The mixture of the present invention may be contacted with a layered substrate comprising a dielectric material under conditions sufficient to form active species that at least partially react with and remove at least a portion of the dielectric material.