Patents by Inventor Ronald Voisin
Ronald Voisin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20070122942Abstract: The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.Type: ApplicationFiled: January 31, 2007Publication date: May 31, 2007Applicant: Molecular Imprints, Inc.Inventors: Sidlgata Sreenivasan, Byung Choi, Ronald Voisin
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Publication number: 20070026542Abstract: The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.Type: ApplicationFiled: September 7, 2006Publication date: February 1, 2007Applicant: MOLECULAR IMPRINTS, INC.Inventors: Sidlgata Sreenivasan, Ian McMackin, Byung-Jin Choi, Ronald Voisin
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Publication number: 20060176466Abstract: The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.Type: ApplicationFiled: March 27, 2006Publication date: August 10, 2006Inventors: Byung Choi, Ronald Voisin, Sidlgata Sreenivasan, Michael Watts, Daniel Babbs, Mario Meissl, Hillman Bailey, Norman Schumaker
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Publication number: 20060096949Abstract: In an embodiment of the present invention, the template is formed by forming a masking layer on a substrate; forming a pattern in the masking layer such that a portion of the substrate is exposed; etching one or more of the exposed portions of the substrate such that a relief image is formed in the substrate; removing the masking layer; coating the relief image with a release agent; depositing a conformal layer upon the substrate such that a portion of the conformal layer is arranged within the relief image formed in the substrate; arranging an elastomer layer on the conformal layer; arranging a substrate such that the elastomer layer is bonded between the conformal layer and the rigid substrate; and removing from the substrate the lithography template, where the lithography template includes the elastomer layer bonded between the rigid substrate and the conformal layer.Type: ApplicationFiled: December 9, 2005Publication date: May 11, 2006Inventors: Michael Watts, Ronald Voisin, Sidlgata Sreenivasan
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Publication number: 20060076717Abstract: The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.Type: ApplicationFiled: May 11, 2005Publication date: April 13, 2006Applicant: Molecular Imprints, Inc.Inventors: Sidlgata Sreenivasan, Byung Choi, Norman Schumaker, Ronald Voisin, Michael Watts, Mario Meissl
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Publication number: 20060077374Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.Type: ApplicationFiled: May 11, 2005Publication date: April 13, 2006Applicant: Molecular Imprints, Inc.Inventors: Sidlgata Sreenivasan, Michael Watts, Byung Choi, Mario Meissl, Norman Schumaker, Ronald Voisin
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Publication number: 20060019183Abstract: An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where the intentional offset may vary in magnitude and direction from one subfield to the next. The system includes an imprint lithographic machine and first and second lithography templates where the templates are adapted to enable the machine to form first and second features, respectively, and where a second feature is configured to be deliberately offset from a corresponding first feature. The template set includes at least two templates, one having features which are deliberately offset from corresponding features of another template. Also, a method of manufacturing such a template set.Type: ApplicationFiled: July 20, 2004Publication date: January 26, 2006Applicant: MOLECULAR IMPRINTS, INC.Inventor: Ronald Voisin
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Publication number: 20050236360Abstract: A compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer, form the template.Type: ApplicationFiled: April 27, 2004Publication date: October 27, 2005Applicant: MOLECULAR IMPRINTS, INC.Inventors: Michael Watts, Ronald Voisin, Sidlgata Sreenivasan
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Publication number: 20050106321Abstract: The present invention is directed to a method for dispensing a plurality of spaced-apart droplets of liquid a substrate that features minimizing the distance liquid in the droplets must travel to reach an adjacent droplet to form a contiguous lay of the liquid on the substrate. As a result, when patterning the droplets with a patterned template, the time required to fill the features of the pattern and to cover the substrate is minimized. This increases the throughput of the imprinting process. To that end, the method includes disposing a plurality of spaced-apart droplets on the substrate, each of which has a unit volume associated therewith. A spacing between adjacent droplets of a subset of the plurality of droplets is selected to be a function of a smallest unit volume associated with the subset.Type: ApplicationFiled: November 14, 2003Publication date: May 19, 2005Applicant: MOLECULAR IMPRINTS, INC.Inventors: Ian McMackin, Byung-Jin Choi, Sidlgata Sreenivasan, Ronald Voisin
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Publication number: 20050098534Abstract: The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.Type: ApplicationFiled: November 12, 2003Publication date: May 12, 2005Applicant: MOLECULAR IMPRINTS, INC.Inventors: Sidlgata Sreenivasan, Ian McMackin, Byung-Jin Choi, Ronald Voisin
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Publication number: 20050084804Abstract: The present invention pertains to disposing a diamond-like composition on a template, wherein the diamond-like composition acts as a release layer. The diamond-like composition is substantially transparent to actinic radiation, e.g., ultraviolet (UV) light, and will also have a desired surface energy, wherein the desired surface energy minimizes adhesion between the template and an underlying material disposed on a substrate. The diamond-like composition is characterized with a low surface energy that exhibits desirable release characteristics.Type: ApplicationFiled: October 16, 2003Publication date: April 21, 2005Applicant: MOLECULAR IMPRINTS, INC.Inventors: Van Truskett, Christopher MacKay, Sreenivasan Sidlgata, Ronald Voisin
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Publication number: 20050072757Abstract: The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on a substrate and a template. To that end, the method further comprises the ingression and egression of the fluid through a first and second aperture, and in a further embodiment, a plurality of apertures, to create such a turbulent flow of the fluid.Type: ApplicationFiled: July 23, 2004Publication date: April 7, 2005Applicants: University of Texas System Board of Regents, MOLECULAR IMPRINTS, INC.Inventors: Ian McMackin, Nicholas Stacey, Daniel Babbs, Duane Voth, Michael Watts, Van Truskett, Frank Xu, Ronald Voisin, Pankaj Lad
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Publication number: 20050074512Abstract: The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.Type: ApplicationFiled: July 23, 2004Publication date: April 7, 2005Applicants: University of Texas System Board of Regents, MOLECULAR IMPRINTS, INC.Inventors: Ian McMackin, Nicholas Stacey, Daniel Babbs, Duane Voth, Michael Watts, Van Truskett, Frank Xu, Ronald Voisin, Pankaj Lad
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Publication number: 20050072755Abstract: The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.Type: ApplicationFiled: October 2, 2003Publication date: April 7, 2005Applicants: University of Texas System Board of Regents, MOLECULAR IMPRINTS, INC.Inventors: Ian McMackin, Nicholas Stacey, Daniel Babbs, Duane Voth, Michael Watts, Van Truskett, Frank Xu, Ronald Voisin, Pankaj Lad
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Publication number: 20050051698Abstract: The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.Type: ApplicationFiled: July 7, 2003Publication date: March 10, 2005Applicant: Molecular Imprints, Inc.Inventors: Sidlgata Sreenivasan, Byung Choi, Ronald Voisin